SCHEMBL4847607

SCHEMBL4847607

O=C1C2=C(C(=O)N1OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C1CCC2C1

nearest known ligand 0.38

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CA2 P00918 3/20 0.38
CA1 P00915 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5183079 1.00 CA2 (0.38) CA2CA1
SCHEMBL5929449 0.82 PTGS2 (0.33)
SCHEMBL12697165 0.81 CA2 (0.34) CA2CA1
SCHEMBL4834763 0.77 CA2 (0.42) CA2CA1
SCHEMBL4837339 0.74 CA2 (0.41) CA2CA1
SCHEMBL503740 0.74 CA2 (0.39) CA2CA1
SCHEMBL13179959 0.74 CA2 (0.35) CA2CA1
SCHEMBL28476420 0.74 CA2 (0.34) CA2CA1
SCHEMBL11951413 0.72 CA2 (0.33) CA2CA1
SCHEMBL2904034 0.72 KMT2A (0.48) CA2CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7381519-B2 Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same HYNIX SEMICONDUCTOR INC. (KR) 2008-06-03 US disclosed
US-7303858-B2 Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor device HYNIX SEMICONDUCTOR INC. (KR) 2007-12-04 US disclosed
US-20060127804-A1 Photoacid generating polymer, its preparation method and top anti-reflective coating composition comprising the same HYNIX SEMICONDUCTOR INC. (KR) 2006-06-15 US disclosed
US-20060127803-A1 Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same HYNIX SEMICONDUCTOR INC. (KR) 2006-06-15 US disclosed