Known targets — ChEMBL curated mechanism
ADORA1ADORA2AADORA2BADORA3PDE3APDE3BPDE4APDE4BPDE4CPDE4D
The experimentally established mechanism targets of Ethylenediamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRR1 | P24046 | 2/20 | 0.40 |
| ▸ | GABBR2 | O75899 | 2/20 | 0.33 |
| ▸ | GABBR1 | Q9UBS5 | 2/20 | 0.33 |
| ▸ | RNPEP | Q9H4A4 | 1/20 | 0.31 |
| ▸ | CACNA2D1 | P54289 | 2/20 | 0.30 |
| ▸ | CACNB3 | P54284 | 1/20 | 0.30 |
| ▸ | CACNA1C | Q13936 | 1/20 | 0.30 |
| ▸ | PGR | P06401 | 1/20 | 0.30 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.30 |
| ▸ | HTR2B | P41595 | 1/20 | 0.30 |
| ▸ | CACNA2D2 | Q9NY47 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1066789 | 0.84 | — | — | |
| SCHEMBL363514 | 0.84 | — | — | |
| SCHEMBL1065279 | 0.84 | — | — | |
| SCHEMBL4650548 | 0.84 | — | — | |
| Ethylenediamine SCHEMBL27548274 | 0.82 | GABRR1 (0.52) | GABRR1RNPEP | |
| SCHEMBL16098247 | 0.81 | — | — | |
| Acetone SCHEMBL27831020 | 0.78 | LMNA (0.43) | — | |
| Thiourea SCHEMBL7105732 | 0.77 | TSHR (0.35) | — | |
| Monoethanolamine SCHEMBL28934046 | 0.74 | ALDH1A1 (0.44) | GABRR1GABBR2GABBR1 | |
| SCHEMBL10800909 | 0.74 | TRPA1 (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2006039090-A2 | SOLUTIONS FOR CLEANING SILICON SEMICONDUCTORS OR SILICON OXIDES | LAM RESEARCH CORPORATION (US) | 2006-04-13 | — | — | WO | claimed |
| US-20060073997-A1 | Solutions for cleaning silicon semiconductors or silicon oxides | LAM RESEARCH CORPORATION (US) | 2006-04-06 | — | — | US | claimed |
| US-7375066-B2 | For cleaning after chemical mechanical polishing to remove copper oxide particles without corroding copper wiring or harming silicon dioxide layer; specified number of cleaning agents such as 2,2'-dipyridyl | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2008-05-20 | — | — | US | disclosed |
| WO-2006039090-A2 | SOLUTIONS FOR CLEANING SILICON SEMICONDUCTORS OR SILICON OXIDES | LAM RESEARCH CORPORATION (US) | 2006-04-13 | — | — | WO | disclosed |
| US-20060073997-A1 | Solutions for cleaning silicon semiconductors or silicon oxides | LAM RESEARCH CORPORATION (US) | 2006-04-06 | — | — | US | disclosed |
| US-20030083214-A1 | Semiconductor wafer cleaning agent and cleaning method | FUJIFILM ELECTRONIC MATERIALS CO., LTD. (JP) | 2003-05-01 | — | — | US | disclosed |