Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.44 |
| ▸ | GSK3B | P49841 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 3/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | GLA | P06280 | 2/20 | 0.36 |
| ▸ | POLB | P06746 | 2/20 | 0.36 |
| ▸ | RAB9A | P51151 | 2/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.34 |
| ▸ | CA12 | O43570 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 1/20 | 0.34 |
| ▸ | CA9 | Q16790 | 1/20 | 0.34 |
| ▸ | RECQL | P46063 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6025476 | 0.87 | L3MBTL1 (0.38) | L3MBTL1GSK3BTSHRHSD17B10KDM4E | |
| SCHEMBL1194369 | 0.83 | TSHR (0.46) | L3MBTL1TSHRHSD17B10KDM4ELMNA | |
| SCHEMBL9162523 | 0.81 | L3MBTL1 (0.45) | L3MBTL1TSHRHSD17B10KDM4ELMNA | |
| SCHEMBL28534605 | 0.80 | ALDH1A1 (0.36) | L3MBTL1HSD17B10KDM4ELMNAALDH1A1 | |
| SCHEMBL8159185 | 0.79 | L3MBTL1 (0.39) | L3MBTL1TSHRHSD17B10KDM4ELMNA | |
| SCHEMBL14812491 | 0.79 | L3MBTL1 (0.39) | L3MBTL1TSHRHSD17B10KDM4ELMNA | |
| SCHEMBL9204997 | 0.79 | L3MBTL1 (0.39) | L3MBTL1TSHRHSD17B10KDM4ELMNA | |
| SCHEMBL27547929 | 0.79 | KDM4E (0.41) | L3MBTL1TSHRHSD17B10KDM4ELMNA | |
| SCHEMBL2963308 | 0.79 | TSHR (0.46) | L3MBTL1TSHRHSD17B10KDM4ELMNA | |
| Hydrochloric Acid SCHEMBL20599523 | 0.78 | TSHR (0.44) | L3MBTL1TSHRHSD17B10KDM4ELMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7351521-B2 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2008-04-01 | — | — | US | disclosed |
| US-20070172762-A1 | Photoresist composition for deep ultraviolet lithography | DAMMEL RALPH R | 2007-07-26 | — | — | US | disclosed |
| US-20070154841-A1 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. | 2007-07-05 | — | — | US | disclosed |
| US-7211366-B2 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2007-05-01 | — | — | US | disclosed |
| CN-1809789-A | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA (US) | 2006-07-26 | — | — | CN | disclosed |
| EP-1602011-A2 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | AZ Electronic Materials USA Corp. (US) | 2005-12-07 | — | — | EP | disclosed |
| WO-2004074928-A2 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-09-02 | — | — | WO | disclosed |
| US-20040166433-A1 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. | 2004-08-26 | — | — | US | disclosed |
| US-6210859-B1 | SENSITIVITY, RESOLUTION, HEAT-RESISTANCE AND STABILITY AFTER EXPOSURE, ULTRAFINE PATTERNS CAN BE FORMED IRRESPECTIVE OF ANY SUBSTRATE, LARGER SCOPE OF EXPOSURE CAN BE OBTAINED, A MODIFIEDPOLYHYDROXYSTYRENE COPOLYMER | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2001-04-03 | — | — | US | disclosed |