SCHEMBL2963308

SCHEMBL2963308

CCC(=O)ON1CCOCC1

nearest known ligand 0.46

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.46
LMNA P02545 3/20 0.43
POLB P06746 3/20 0.43
ALDH1A1 P00352 2/20 0.43
RAB9A P51151 2/20 0.43
MAPT P10636 1/20 0.43
HPGD P15428 1/20 0.43
KMT2A Q03164 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43
RECQL P46063 1/20 0.42
HTT P42858 1/20 0.41
L3MBTL1 Q9Y468 2/20 0.40
SMN1; SMN2 Q16637 3/20 0.40
GLA P06280 1/20 0.40
CYP3A4 P08684 1/20 0.37
CYP2C19 P33261 1/20 0.37
HSD17B10 Q99714 1/20 0.36
KDM4E B2RXH2 1/20 0.36
USP2 O75604 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL20599523 0.98 TSHR (0.44) TSHRLMNAPOLBALDH1A1RAB9A
Butyric Acid SCHEMBL27523718 0.88 GLA (0.42) TSHRLMNAPOLBALDH1A1RAB9A
SCHEMBL3790152 0.84
SCHEMBL465226 0.84 LMNA (0.45) TSHRLMNAPOLBALDH1A1RAB9A
SCHEMBL1194369 0.83 TSHR (0.46) TSHRLMNAPOLBALDH1A1RAB9A
SCHEMBL27723070 0.82 LMNA (0.44) TSHRLMNAPOLBALDH1A1RAB9A
Propionic Acid SCHEMBL10343203 0.82 ALDH1A1 (0.41) TSHRLMNAPOLBALDH1A1RAB9A
SCHEMBL8526268 0.81 RAB9A (0.46) TSHRLMNAPOLBALDH1A1RAB9A
SCHEMBL9162523 0.81 L3MBTL1 (0.45) TSHRLMNAPOLBALDH1A1RAB9A
SCHEMBL761683 0.80 P2RY12 (0.34) ALDH1A1MAPTHPGDKMT2ANPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113786711-A Method for recovering chlorine-containing volatile organic compounds in organic waste gas by using ionic liquid 郑州中科新兴产业技术研究院 2021-12-14 CN claimed
CN-103130705-A Benzo five-membered unsaturated heterocyclic compound or pharmaceutically acceptable salt thereof, and preparation method, pharmaceutical composition and application thereof INST MEDICINAL BIOTECHNOLOGY 2013-06-05 CN claimed
US-20240424007-A1 REMOTE LOADING OF SPARINGLY WATER-SOLUBLE DRUGS INTO LIPID VESICLES Jazz Pharmaceuticals Therapeutics, Inc. 2024-12-26 US disclosed
US-12070471-B2 Remote loading of sparingly water-soluble drugs into lipid vesicles CELATOR PHARMACEUTICALS, INC. (US) 2024-08-27 US disclosed
US-20230390317-A1 Remote Loading of Sparingly Water-Soluble Drugs Into Lipid Vesicles Jazz Pharmaceuticals Therapeutics, Inc. 2023-12-07 US disclosed
US-11583544-B2 Remote loading of sparingly water-soluble drugs into lipid vesicles CELATOR PHARMACEUTICALS, INC. (US) 2023-02-21 US disclosed
CN-113786711-A Method for recovering chlorine-containing volatile organic compounds in organic waste gas by using ionic liquid 郑州中科新兴产业技术研究院 2021-12-14 CN disclosed
CN-113474388-A Phenyl isocyanate conversion process 陶氏环球技术有限责任公司 2021-10-01 CN disclosed
CN-113321269-A Method for effectively separating organic matters in high-salinity wastewater 中国科学院过程工程研究所 2021-08-31 CN disclosed
US-20210008091-A1 REMOTE LOADING OF SPARINGLY WATER-SOLUBLE DRUGS INTO LIPID VESICLES Jazz Pharmaceuticals Therapeutics, Inc. 2021-01-14 US disclosed
WO-2020118178-A1 MONOMETHYL FUMARATE-CARRIER CONJUGATES AND METHODS OF THEIR USE FLAGSHIP PIONEERING INNOVATIONS V, INC. (US) 2020-06-11 WO disclosed
US-7169541-B2 Compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-01-30 US disclosed
CN-1886114-A Parakeratosis inhibitor and composition for external use on skin SHISEIDO CO LTD (JP) 2006-12-27 CN disclosed
CN-1280110-C Primed substrates comprising radiation cured ink jetted images 3M INNOVATIVE PROPERTIES CO (US) 2006-10-18 CN disclosed
US-20060147836-A1 Resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-07-06 US disclosed
CN-1607461-A Resist polymer, resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2005-04-20 CN disclosed
US-20050079446-A1 Novel polymerizable compound, polymer, positive-resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-04-14 US disclosed
US-20050079440-A1 Novel polymer, positive resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-04-14 US disclosed
US-20050014092-A1 Novel compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-01-20 US disclosed
CN-1518504-A Primed substrates having radiation cured inkjet images 3M 2004-08-04 CN disclosed