Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | ATM | Q13315 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11064065 | 0.81 | TSHR (0.36) | KMT2AATMTSHRALDH1A1 | |
| SCHEMBL2036449 | 0.81 | KMT2A (0.43) | KMT2AATMTSHRALDH1A1 | |
| SCHEMBL1147828 | 0.77 | TSHR (0.33) | TSHR | |
| SCHEMBL2030887 | 0.76 | LMNA (0.46) | KMT2AALDH1A1 | |
| SCHEMBL19145906 | 0.75 | LMNA (0.39) | KMT2AATMTSHR | |
| SCHEMBL4154528 | 0.74 | LMNA (0.44) | KMT2AATMTSHRALDH1A1 | |
| SCHEMBL12098030 | 0.73 | SMN1; SMN2 (0.36) | KMT2ATSHRALDH1A1 | |
| SCHEMBL8578110 | 0.72 | TSHR (0.39) | KMT2AATMTSHRALDH1A1 | |
| SCHEMBL5849387 | 0.71 | CSNK2A2 (0.36) | KMT2ATSHRALDH1A1 | |
| SCHEMBL4864684 | 0.71 | TSHR (0.37) | KMT2AATMTSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7320854-B2 | Mixture of oxide particles, polymerizable compound,radiation sensitive decomposer and releasing agent | JSR CORPORATION (JP) | 2008-01-22 | — | — | US | disclosed |
| EP-1494072-A2 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR Corporation (JP) | 2005-01-05 | — | — | EP | disclosed |
| US-20040265737-A1 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR CORPORATION (JP) | 2004-12-30 | — | — | US | disclosed |