SCHEMBL4864684

SCHEMBL4864684

C=C(C)C(=O)OCN1C(=O)C2=C(CCCC2)C1=O

nearest known ligand 0.37

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.37
ALDH1A1 P00352 3/20 0.37
THRB P10828 1/20 0.35
KMT2A Q03164 1/20 0.34
ATM Q13315 1/20 0.34
KDM4E B2RXH2 1/20 0.33
LMNA P02545 1/20 0.33
CYP1A2 P05177 1/20 0.31
HPGD P15428 1/20 0.31
CYP2C19 P33261 1/20 0.31
BLM P54132 1/20 0.31
WRN Q14191 1/20 0.31
HIF1A Q16665 1/20 0.31
POLB P06746 1/20 0.30
APEX1 P27695 1/20 0.30
HTT P42858 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4820861 0.84 THRB (0.40) TSHRALDH1A1THRBKMT2AATM
SCHEMBL23060731 0.83 LMNA (0.37) TSHRALDH1A1KMT2AKDM4ELMNA
SCHEMBL4862484 0.82 TSHR (0.44) TSHRALDH1A1THRBKMT2AATM
SCHEMBL15871833 0.81 THRB (0.44) TSHRALDH1A1THRBKMT2AATM
SCHEMBL14377607 0.80 TSHR (0.49) TSHRALDH1A1THRBLMNAHPGD
SCHEMBL8898726 0.80 KMT2A (0.44) TSHRALDH1A1THRBKMT2AATM
SCHEMBL4865704 0.75 TSHR (0.36) TSHRALDH1A1THRBKDM4ELMNA
SCHEMBL761531 0.74 ALDH1A1 (0.56) TSHRALDH1A1KMT2ACYP1A2HPGD
SCHEMBL8747653 0.74 ALDH1A1 (0.56) TSHRALDH1A1THRBKMT2AATM
SCHEMBL12656022 0.72 KMT2A (0.42) TSHRALDH1A1KMT2AATMCYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7320854-B2 Mixture of oxide particles, polymerizable compound,radiation sensitive decomposer and releasing agent JSR CORPORATION (JP) 2008-01-22 US disclosed
EP-1494072-A2 Radiation sensitive refractive index changing composition, pattern forming method and optical material JSR Corporation (JP) 2005-01-05 EP disclosed
US-20040265737-A1 Radiation sensitive refractive index changing composition, pattern forming method and optical material JSR CORPORATION (JP) 2004-12-30 US disclosed