⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5238525 | 0.84 | TPMT (0.35) | — | |
| SCHEMBL11039343 | 0.84 | ALDH1A1 (0.31) | — | |
| SCHEMBL5071806 | 0.78 | — | — | |
| SCHEMBL5697079 | 0.75 | CA1 (0.31) | — | |
| SCHEMBL5235288 | 0.69 | KDM4E (0.36) | — | |
| SCHEMBL176317 | 0.69 | CA1 (0.35) | — | |
| Water SCHEMBL6206189 | 0.67 | KDM4E (0.35) | — | |
| SCHEMBL10596179 | 0.67 | POLB (0.40) | — | |
| SCHEMBL11570980 | 0.66 | ALDH1A1 (0.32) | — | |
| SCHEMBL6207825 | 0.65 | HSD17B10 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3143067-B1 | MULTIFUNCTIONAL POLYAMIDES FOR PROTECTIVE COATINGS | HUNTSMAN ADVANCED MAT AMERICAS LLC (US) | 2023-09-13 | — | — | EP | claimed |
| EP-1092745-B1 | Film having a good adhesive property and process for producing it | TORAY INDUSTRIES (JP) | 2004-12-08 | — | — | EP | claimed |
| EP-0362649-B1 | Radiation-sensitive compositions and their use | BASF AG (DE) | 1994-03-02 | — | — | EP | claimed |
| US-7471360-B2 | Liquid crystal display device | KONICA MINOLTA OPTO, INC. (JP) | 2008-12-30 | — | — | US | disclosed |
| US-20070046870-A1 | Liquid crystal display device | KONICA MINOLTA OPTO, INC. | 2007-03-01 | — | — | US | disclosed |
| EP-0982336-A1 | Mixture containing isocyanates as well as organic and/ or inorganic acids or acid derivatives | BASF AKTIENGESELLSCHAFT (DE) | 2000-03-01 | — | — | EP | disclosed |
| EP-0648796-B1 | Solutions of polyimide-forming substances and their use | SCHENECTADY INT INC (US) | 1998-08-26 | — | — | EP | disclosed |
| EP-0648796-A1 | Solutions of polyimide-forming substances and their use | BASF Lacke + Farben AG (DE) | 1995-04-19 | — | — | EP | disclosed |
| EP-0648795-A1 | Solutions of polyimide-forming substances and their use as coating material | BASF Lacke + Farben AG (DE) | 1995-04-19 | — | — | EP | disclosed |
| EP-0571899-B1 | Radiation-curable mixture and its' use for producing high temperature-resistant relief structures | BASF LACKE & FARBEN (DE) | 1994-11-02 | — | — | EP | disclosed |
| EP-0573866-B1 | Method for forming patterned layers of heat-resistant polycondensates | BASF LACKE & FARBEN (DE) | 1994-11-02 | — | — | EP | disclosed |
| EP-0362649-B1 | Radiation-sensitive compositions and their use | BASF AG (DE) | 1994-03-02 | — | — | EP | disclosed |
| EP-0573866-A1 | Method for forming patterned layers of heat-resistant polycondensates | BASF Lacke + Farben Aktiengesellschaft (DE) | 1993-12-15 | — | — | EP | disclosed |
| EP-0571899-A1 | Radiation-curable mixture and its' use for producing high temperature-resistant relief structures | BASF Lacke + Farben Aktiengesellschaft (DE) | 1993-12-01 | — | — | EP | disclosed |
| EP-0362644-B1 | RADIATION-SENSITIVE COMPOSITIONS AND THEIR USE | BASF Aktiengesellschaft (DE) | 1993-05-26 | — | — | EP | disclosed |
| EP-0362649-A2 | Radiation-sensitive compositions and their use | BASF Aktiengesellschaft (DE) | 1990-04-11 | — | — | EP | disclosed |
| EP-0362644-A1 | Radiation-sensitive compositions and their use | BASF Aktiengesellschaft (DE) | 1990-04-11 | — | — | EP | disclosed |