SCHEMBL4868427

SCHEMBL4868427

CCOC(=O)C(C)Oc1ncc[nH]1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.43
LMNA P02545 1/20 0.43
KDM4E B2RXH2 5/20 0.40
TSHR P16473 4/20 0.39
KMT2A Q03164 4/20 0.38
NUDT1 P36639 1/20 0.38
SMN1; SMN2 Q16637 3/20 0.37
ALDH1A1 P00352 3/20 0.37
MEN1 O00255 2/20 0.37
TP53 P04637 2/20 0.36
HPGD P15428 2/20 0.35
NLRP3 Q96P20 1/20 0.35
GAA P10253 3/20 0.35
NPC1 O15118 2/20 0.34
POLB P06746 1/20 0.34
MAPT P10636 1/20 0.34
MAPK1 P28482 1/20 0.34
HTT P42858 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
RAB9A P51151 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28891951 0.76 NPC1 (0.41) L3MBTL1LMNAKDM4EKMT2ANUDT1
SCHEMBL2565429 0.76 ALDH1A1 (0.40) KDM4ETSHRKMT2ANUDT1SMN1; SMN2
SCHEMBL6171373 0.74 ALDH1A1 (0.42) LMNAKDM4ETSHRKMT2ANUDT1
SCHEMBL15528122 0.73 TXN (0.37) KDM4ENUDT1SMN1; SMN2ALDH1A1NPC1
SCHEMBL10849537 0.73 TAAR1 (0.47) L3MBTL1LMNAKDM4ETSHRKMT2A
SCHEMBL1487897 0.71 ELANE (0.42) KDM4ESMN1; SMN2ALDH1A1NPC1RAB9A
SCHEMBL3082586 0.71 NPC1 (0.49) KDM4ETSHRKMT2ANUDT1SMN1; SMN2
SCHEMBL3734749 0.70 ALDH1A1 (0.38) KDM4ESMN1; SMN2ALDH1A1NPC1RAB9A
SCHEMBL3454835 0.69
SCHEMBL10666291 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7314701-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2008-01-01 US claimed
US-7314701-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2008-01-01 US disclosed
US-20050095527-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-05 US disclosed