SCHEMBL4869382

SCHEMBL4869382

C=Cc1ccc(CC(C)(C)OC(=O)C(O)Oc2ccc(C=CC=Cc3ccc(OC(C)OC4CCCCC4)cc3)cc2)cc1

nearest known ligand 0.34

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 2/20 0.34
CYP1A2 P05177 1/20 0.34
CYP2D6 P10635 1/20 0.34
CYP2C9 P11712 1/20 0.34
NFKB1 P19838 1/20 0.34
CYP2C19 P33261 1/20 0.34
LMNA P02545 1/20 0.33
PMP22 Q01453 1/20 0.33
NLRP3 Q96P20 1/20 0.33
POLB P06746 1/20 0.32
MAPT P10636 1/20 0.32
CACNA1B Q00975 1/20 0.31
NR1H4 Q96RI1 1/20 0.31
PPARG P37231 1/20 0.31
PPARD Q03181 1/20 0.31
PPARA Q07869 1/20 0.31
P2RX3 P56373 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3843851 0.84 CYP3A4 (0.37) CYP3A4CYP1A2CYP2D6CYP2C9NFKB1
SCHEMBL3844773 0.82 ACACB (0.32) CYP3A4CYP1A2CYP2D6CYP2C9NFKB1
SCHEMBL3837628 0.79 PPARG (0.30) PPARGPPARDPPARA
SCHEMBL6883650 0.78 POLB (0.32) CYP3A4CYP1A2CYP2D6CYP2C9NFKB1
SCHEMBL7271950 0.76 PPARG (0.32) CYP3A4LMNAMAPTNR1H4PPARG
SCHEMBL3844235 0.76 CYP3A4 (0.33) CYP3A4CYP1A2CYP2D6CYP2C9NFKB1
SCHEMBL685735 0.75 ALDH1A1 (0.35) POLBMAPT
SCHEMBL3839026 0.75 STAT3 (0.35) MAPTCACNA1BNR1H4
SCHEMBL5900974 0.74 ALDH1A1 (0.35) POLBMAPT
SCHEMBL6871803 0.74 POLB (0.30) POLBMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7374857-B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2008-05-20 US disclosed
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2005-02-17 US disclosed
EP-1449833-A1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2004-08-25 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition ASIC1, GAR1, RER1 CYP3A4 2399/4885CYP1A2 1744/4885CYP2D6 2559/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.