SCHEMBL487271

SCHEMBL487271

CO[Si](OC)(OC(C)=O)OC(C)=O

nearest known ligand 0.44

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.44
TSHR P16473 2/20 0.37
HSD17B10 Q99714 2/20 0.30
LMNA P02545 2/20 0.30
TDP1 Q9NUW8 1/20 0.30
KDM4E B2RXH2 1/20 0.30
CA2 P00918 1/20 0.30
PTGS1 P23219 1/20 0.30
MMP12 P39900 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL487443 0.94 ALDH1A1 (0.44) ALDH1A1TSHRHSD17B10LMNATDP1
SCHEMBL3912403 0.94 ALDH1A1 (0.44) ALDH1A1TSHRHSD17B10LMNATDP1
SCHEMBL3912674 0.91 ALDH1A1 (0.42) ALDH1A1TSHR
SCHEMBL3909306 0.91 ALDH1A1 (0.42) ALDH1A1TSHR
SCHEMBL49515 0.83 ALDH1A1 (0.44) ALDH1A1TSHRHSD17B10LMNATDP1
SCHEMBL15828933 0.82 HSD17B10 (0.40) ALDH1A1HSD17B10TDP1
SCHEMBL7840079 0.80 ALDH1A1 (0.39) ALDH1A1TSHRHSD17B10LMNA
SCHEMBL9664185 0.78 ALDH1A1 (0.39) ALDH1A1TSHRHSD17B10LMNATDP1
SCHEMBL3109729 0.75 ALDH1A1 (0.55) ALDH1A1TSHRHSD17B10TDP1
SCHEMBL838347 0.73 ALDH1A1 (0.42) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 223 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12505999-B2 Precursors and flowable CVD methods for making low-K films to fill surface features VERSUM MATERIALS US, LLC (US) 2025-12-23 US claimed
WO-2025055600-A1 SURFACE TREATMENT METHOD FOR METAL OR ALLOY, AND METAL OR ALLOY PRODUCT 福耀玻璃工业集团股份有限公司 2025-03-20 WO claimed
WO-2025055601-A1 SURFACE TREATMENT METHOD FOR METAL OR ALLOY, AND METAL OR ALLOY PRODUCT 福耀玻璃工业集团股份有限公司 2025-03-20 WO claimed
CN-117244767-A Surface treatment method for metal or alloy and metal or alloy product 福耀玻璃工业集团股份有限公司 2023-12-19 CN claimed
CN-117225670-A Surface treatment method for metal or alloy and metal or alloy product 福耀玻璃工业集团股份有限公司 2023-12-15 CN claimed
CN-115584263-A Chemical etching composition and application thereof 安集微电子(上海)有限公司 2023-01-10 CN claimed
US-11270880-B2 Precursors and flowable CVD methods for making low-k films to fill surface features VERSUM MATERIALS US, LLC (US) 2022-03-08 US claimed
US-8716417-B2 Olefin polymerization catalyst and preparation method and use thereof PETROCHINA COMPANY LIMITED (CN) 2014-05-06 US claimed
US-8524441-B2 Silicon-based antireflective coating compositions AZ ELECTRONIC MATERIALS USA CORP. (US) 2013-09-03 US claimed
EP-1661960-B1 COATING COMPOSITION AND LOW DIELECTRIC SILICEOUS MATERIAL PRODUCED BY USING SAME AZ ELECTRONIC MATERIALS USA (US) 2012-07-25 EP claimed
US-7754003-B2 Coating composition and low dielectric siliceous material produced by using same AZ ELECTRONIC MATERIALS USA CORP. (US) 2010-07-13 US claimed
US-7736735-B2 Coating composition, undercoating composition, multilayer body having coating film made of such composition, photocatalyst coating film, and molded body JSR CORPORATION (JP) 2010-06-15 US claimed
US-20100092895-A1 SILICON-BASED ANTIREFLECTIVE COATING COMPOSITIONS BRAGGONE OY (FI) 2010-04-15 US claimed
US-7446055-B2 Aerosol misted deposition of low dielectric organosilicate films AIR PRODUCTS AND CHEMICALS, INC. (US) 2008-11-04 US claimed
US-20070202267-A1 Sizing compositions for glass and polyolefin surfaces and methods of use MARTIN EMIL 2007-08-30 US claimed
US-20060211271-A1 Aerosol misted deposition of low dielectric organosilicate films VERSUM MATERIALS US, LLC 2006-09-21 US claimed
US-20260130142-A1 Precursors and Flowable CVD Methods for Making Low-K Films to Fill Surface Features VERSUM MAT US LLC (US) 2026-05-07 US disclosed
US-12505999-B2 Precursors and flowable CVD methods for making low-K films to fill surface features VERSUM MATERIALS US, LLC (US) 2025-12-23 US disclosed
US-5945172-A POLYSILOXANE COATINGS WHICH ALSO CONTAIN (METH)ACRYLIC GROUPS AND ARE FIRST CURED THROUGH THE ACRYLIC GROUPS, THEN CONDENSATION OF THE SILANOL GROUPS FORMS HARD PROTECTIVE FILMS RESISTANT TO WEATHER, FLAMES, SCRATCHING SHIN-ETSU CHEMICAL CO., LTD. (JP) 1999-08-31 US disclosed
EP-0931820-A1 Coating composition and its cured product JSR Corporation (JP) 1999-07-28 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260130142-A1 Precursors and Flowable CVD Methods for Making Low-K Films to Fill Surface Features VCAM1, LDLR, KDR ALDH1A1 3091/4885TSHR 4505/4885HSD17B10 279/4885
US-11270880-B2 Precursors and flowable CVD methods for making low-k films to fill surface features KDR, LDLR, SIK1 ALDH1A1 3547/4885TSHR 4866/4885HSD17B10 391/4885
US-12505999-B2 Precursors and flowable CVD methods for making low-K films to fill surface features KDR, VCL, SIK1 ALDH1A1 3659/4885TSHR 4874/4885HSD17B10 417/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.