SCHEMBL4889217

SCHEMBL4889217

C=CC(=O)N(C)Cc1ccc(O)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MTOR P42345 1/20 0.50
EGFR P00533 4/20 0.46
ITK Q08881 3/20 0.46
RAB9A P51151 3/20 0.44
NPC1 O15118 2/20 0.44
CA12 O43570 1/20 0.44
CA9 Q16790 1/20 0.44
ALDH5A1 P51649 1/20 0.41
ABAT P80404 1/20 0.41
ALDH1A1 P00352 2/20 0.41
HTT P42858 1/20 0.41
BCL2A1 Q16548 4/20 0.40
ESR1 P03372 1/20 0.40
ESR2 Q92731 1/20 0.40
BCHE P06276 1/20 0.39
ACHE P22303 1/20 0.39
POLB P06746 1/20 0.39
MAPT P10636 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
PYCR1 P32322 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19472466 0.93 EGFR (0.50) EGFRITKRAB9ANPC1CA12
SCHEMBL19481325 0.86 EGFR (0.46) EGFRITKRAB9ANPC1CA12
SCHEMBL23227079 0.86 ALDH1A1 (0.54) EGFRITKRAB9ANPC1CA12
SCHEMBL16257002 0.84 BCL2A1 (0.56) EGFRITKRAB9ANPC1ALDH1A1
SCHEMBL491378 0.84 NPC1 (0.65) EGFRITKRAB9ANPC1CA12
SCHEMBL10194674 0.80 NSD2 (0.56) EGFRITKRAB9ANPC1CA12
SCHEMBL13114706 0.77 ALDH1A1 (0.61) MTORRAB9ANPC1CA12CA9
SCHEMBL4089366 0.76 PSMB5 (0.57) EGFRITKRAB9ANPC1ALDH1A1
SCHEMBL27822290 0.76 MTOR (0.55) MTORRAB9ANPC1CA12CA9
SCHEMBL19855899 0.76 THRB (0.55) MTORALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2866093-A1 Anti-reflective coating forming composition containing vinyl ether compound and polyimide NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) 2015-04-29 EP disclosed
US-8501393-B2 Lithography; photoresists; semiconductors NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2013-08-06 US disclosed
EP-2592476-A1 Antireflective coating forming composition containing vinyl ether compound and polyimide Nissan Chemical Industries, Ltd. (JP) 2013-05-15 EP disclosed
US-20080138744-A1 Anti-Reflective Coating Forming Composition Containing Vinyl Ether Compound NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2008-06-12 US disclosed
EP-1757987-A1 ANTIREFLECTIVE FILM-FORMING COMPOSITION CONTAINING VINYL ETHER COMPOUND Nissan Chemical Industries, Ltd. (JP) 2007-02-28 EP disclosed