SCHEMBL4892470

SCHEMBL4892470

Brc1ccc(OCC2CO2)c(Br)c1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.49
GLA P06280 1/20 0.49
SMN1; SMN2 Q16637 5/20 0.47
TSHR P16473 4/20 0.47
TP53 P04637 3/20 0.47
HIF1A Q16665 2/20 0.47
CYP3A4 P08684 1/20 0.47
TDP1 Q9NUW8 2/20 0.47
MAPK1 P28482 2/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
MAPT P10636 5/20 0.42
NPC1 O15118 2/20 0.40
RAB9A P51151 2/20 0.40
HPGD P15428 3/20 0.39
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
LMNA P02545 2/20 0.39
CYP1A2 P05177 1/20 0.39
PPARG P37231 1/20 0.39
GAA P10253 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30524198 1.00 ALDH1A1 (0.49) ALDH1A1GLASMN1; SMN2TSHRTP53
SCHEMBL27809496 0.83 ALDH1A1 (0.54) ALDH1A1GLASMN1; SMN2TSHRTP53
SCHEMBL10407182 0.83 ALDH1A1 (0.46) ALDH1A1GLASMN1; SMN2TSHRTP53
SCHEMBL9774749 0.83 ALDH1A1 (0.50) ALDH1A1GLASMN1; SMN2TSHRTP53
SCHEMBL10407181 0.83 ALDH1A1 (0.49) ALDH1A1GLASMN1; SMN2TSHRTP53
SCHEMBL16585014 0.83 TSHR (0.47) ALDH1A1GLASMN1; SMN2TSHRTP53
SCHEMBL4363233 0.83 ALDH1A1 (0.46) ALDH1A1GLASMN1; SMN2TSHRTP53
SCHEMBL24767003 0.82 ALDH1A1 (0.49) ALDH1A1GLASMN1; SMN2TSHRTP53
SCHEMBL29847833 0.81 ALDH1A1 (0.60) ALDH1A1GLASMN1; SMN2TSHRTP53
SCHEMBL467256 0.81 ALDH1A1 (0.60) ALDH1A1GLASMN1; SMN2TSHRTP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117567973-B High Tg underfill and preparation method thereof 深圳先进电子材料国际创新研究院 2024-04-09 CN claimed
CN-117567973-A High Tg underfill and preparation method thereof 深圳先进电子材料国际创新研究院 2024-02-20 CN claimed
CN-116874979-A Epoxy resin with low linear thermal expansion coefficient, preparation method thereof and epoxy mortar 石家庄市长安育才建材有限公司 2023-10-13 CN claimed
US-11233225-B2 Organic light emitting diode display device LG DISPLAY CO., LTD. (KR) 2022-01-25 US claimed
EP-0605937-B1 Antistatic resin composition DAISO CO LTD (JP) 1997-06-11 EP claimed
EP-0605937-A1 Antistatic resin composition DAISO CO., LTD. (JP) 1994-07-13 EP claimed
JP-5078488-A None JP disclosed
JP-54133592-A None JP disclosed
WO-2026104405-A1 FLAME RETARDANT MATERIALS AVON POLYMER PRODUCTS LIMITED (GB) 2026-05-21 WO disclosed
US-20240191095-A1 CAN INNER SURFACE COATING MATERIAL AND CAN WITH COATED INNER SURFACE TOYO INK SC HOLDINGS CO., LTD. (JP) 2024-06-13 US disclosed
CN-117567973-B High Tg underfill and preparation method thereof 深圳先进电子材料国际创新研究院 2024-04-09 CN disclosed
CN-117567973-A High Tg underfill and preparation method thereof 深圳先进电子材料国际创新研究院 2024-02-20 CN disclosed
WO-2023248919-A1 OPTICAL FILM, POLARIZING PLATE AND IMAGE DISPLAY DEVICE 株式会社トッパンTOMOEGAWAオプティカルフィルム 2023-12-28 WO disclosed
EP-0257011-A2 Permeation modified asymmetric gas separation membranes having graded density skins PERMEA, Inc. (US) 1988-02-24 EP disclosed
US-4575385-A POLYSULFONES CONTACTED WITH BENZENE COMPOUND MONSANTO COMPANY (US) 1986-03-11 US disclosed
EP-0130559-A2 A method of producing a pattern-engraved article by sandblasting Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1985-01-09 EP disclosed
US-4407939-A GELATIN MODIFIED WITH SUCCINIC, PHTHALIC OR TRIMELLITIC ANHYDRIDE POSITIONED BETWEEN FUJI PHOTO FILM CO., LTD. (JP) 1983-10-04 US disclosed
JP-S54133592-A PREPARATION OF NOVOLAK-TYPE PHENOLIC RESIN MATSUSHITA ELECTRIC WORKS LTD 1979-10-17 JP disclosed
US-4048100-A Polyhalogenated polyols and foamed polyurethanes prepared from them THE DOW CHEMICAL COMPANY (US) 1977-09-13 US disclosed
US-4021245-A GELATION DERIVATIVE, SILICIC ACID ANHYDRIDE FUJI PHOTO FILM CO., LTD. (JA) 1977-05-03 US disclosed