SCHEMBL4902282

SCHEMBL4902282

CCCCCCCCCCCCC(C(=O)[O-])(C(C)(CC)C(=O)O)[N+](C)(C)C

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 4/20 0.34
CA2 P00918 1/20 0.34
CES1 P23141 3/20 0.33
GGPS1 O95749 1/20 0.33
PPARG P37231 5/20 0.32
PPARD Q03181 5/20 0.32
PPARA Q07869 5/20 0.32
HDAC11 Q96DB2 4/20 0.32
TSHR P16473 3/20 0.32
GPR84 Q9NQS5 3/20 0.32
ALDH1A1 P00352 2/20 0.32
TLR2 O60603 2/20 0.32
TDP1 Q9NUW8 2/20 0.32
FABP4 P15090 2/20 0.32
PTPN1 P18031 2/20 0.32
SLC22A6 Q4U2R8 1/20 0.32
SLC22A8 Q8TCC7 1/20 0.32
MEN1 O00255 1/20 0.32
ESR1 P03372 1/20 0.32
ALOX15 P16050 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4609450 0.84 CES2 (0.36) CES2CA2CES1PPARGPPARD
SCHEMBL4611396 0.84 CES2 (0.36) CES2CA2CES1PPARGPPARD
SCHEMBL5051960 0.82 CES2 (0.37) CES2CA2CES1GGPS1
SCHEMBL14801394 0.80 FDPS (0.39) CES2CA2CES1GGPS1
SCHEMBL1833476 0.80 FDPS (0.39) CES2CA2CES1GGPS1
SCHEMBL5073914 0.80 FDPS (0.39) CES2CA2CES1GGPS1
SCHEMBL332249 0.80 FDPS (0.39) CES2CA2CES1GGPS1
SCHEMBL2586062 0.80 DNM1 (0.36) CES2CES1GGPS1PPARGPPARD
SCHEMBL515391 0.80 DNM1 (0.36) CES2CES1GGPS1PPARGPPARD
SCHEMBL663117 0.79 LMNA (0.38) CES2TSHRALDH1A1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117295811-A cleaning composition 恩特格里斯公司 2023-12-26 CN disclosed
CN-116794944-A Treatment liquid and method for cleaning substrate 日本化药株式会社 2023-09-22 CN disclosed
CN-116457447-A POST chemical mechanical polishing (POST CMP) cleaning compositions 恩特格里斯公司 2023-07-18 CN disclosed
CN-116438284-A Microelectronic device cleaning compositions 恩特格里斯公司 2023-07-14 CN disclosed
CN-113195698-A Compositions and methods for cleaning POST chemical mechanical polishing (POST-CMP) cobalt substrates 恩特格里斯公司 2021-07-30 CN disclosed
CN-112424327-A Cleaning compositions containing corrosion inhibitors 恩特格里斯公司 2021-02-26 CN disclosed
US-20080178899-A1 Foamable or sprayable hair styling product with polyalkoxylated silicone esters THE PROCTER & GAMBLE COMPANY (US) 2008-07-31 US disclosed