SCHEMBL490553

SCHEMBL490553

CCOC(=O)CCc1ccc(O)c(C(C)(C)C)c1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 2/20 0.55
CYP4A11 Q02928 2/20 0.55
APP P05067 2/20 0.52
CYP4Z1 Q86W10 1/20 0.45
IAPP P10997 3/20 0.44
PDE3B Q13370 1/20 0.44
PDE3A Q14432 1/20 0.44
P2RY12 Q9H244 1/20 0.44
HSP90AA1 P07900 1/20 0.43
HSP90AB1 P08238 1/20 0.43
GAA P10253 3/20 0.42
XBP1 P17861 1/20 0.42
ATM Q13315 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
EPHX2 P34913 1/20 0.42
HTT P42858 2/20 0.41
NR1I2 O75469 1/20 0.41
ALDH1A1 P00352 1/20 0.41
LMNA P02545 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9487932 0.89 APP (0.52) CYP4F2CYP4A11APPIAPPHSP90AA1
SCHEMBL30077234 0.87 APP (0.58) CYP4F2CYP4A11APPIAPPHSP90AA1
SCHEMBL2131066 0.87 APP (0.51) CYP4F2CYP4A11APPIAPPHSP90AA1
SCHEMBL7116001 0.87 APP (0.58) CYP4F2CYP4A11APPIAPPHSP90AA1
SCHEMBL30077254 0.86 APP (0.57) CYP4F2CYP4A11APPIAPPHSP90AA1
SCHEMBL7933753 0.86 APP (0.57) CYP4F2CYP4A11APPIAPPHSP90AA1
SCHEMBL5527871 0.86 APP (0.57) CYP4F2CYP4A11APPIAPPHSP90AA1
SCHEMBL490455 0.85 GAA (0.49) APPIAPPHSP90AA1HSP90AB1GAA
SCHEMBL30037371 0.85 APP (0.49) CYP4F2CYP4A11APPIAPPHSP90AA1
SCHEMBL3468016 0.84 APP (0.52) APPIAPPGAAXBP1ATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024150722-A1 LAMINATE, SEMICONDUCTOR ELEMENT, AND MEMS ELEMENT 東レ株式会社 2024-07-18 WO disclosed
US-20230350305-A1 MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND TREATMENT LIQUID FUJIFILM CORPORATION (JP) 2023-11-02 US disclosed
US-11802181-B2 Di-amine compound, and heat-resistant resin and resin composition using the same TORAY INDUSTRIES, INC. (JP) 2023-10-31 US disclosed
US-11802181-B2 Di-amine compound, and heat-resistant resin and resin composition using the same TORAY INDUSTRIES, INC. (JP) 2023-10-31 US disclosed
US-20230213858-A1 MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2023-07-06 US disclosed
US-20230213858-A1 MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2023-07-06 US disclosed
US-20220171285-A1 METHOD OF MANUFACTURING CURED FILM, PHOTOCURABLE RESIN COMPOSITION, METHOD OF MANUFACTURING LAMINATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2022-06-02 US disclosed
US-11347146-B2 Resin composition TORAY INDUSTRIES, INC. (JP) 2022-05-31 US disclosed
US-11174350-B2 Resin and photosensitive resin composition TORAY INDUSTRIES, INC. (JP) 2021-11-16 US disclosed
WO-2021157306-A1 RESIN COMPOSITION, CURED FILM, LAMINATE, PRODUCTION METHOD FOR CURED FILM, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2021-08-12 WO disclosed
US-20190004423-A1 CURED FILM AND METHOD FOR PRODUCING SAME TORAY INDUSTRIES, INC. (JP) 2019-01-03 US disclosed
US-20180203353-A1 CURED FILM AND METHOD FOR MANUFACTURING SAME TORAY INDUSTRIES, INC. (JP) 2018-07-19 US disclosed
US-20180203353-A1 CURED FILM AND METHOD FOR MANUFACTURING SAME TORAY INDUSTRIES, INC. (JP) 2018-07-19 US disclosed
US-8268293-B2 Using compounds which do not themselves exhibit significant UV absorption in the UV-A or UV-B region, but are reactive under use conditions, such as 4-hydroxyphenylpropionic acid, or 2-ethylhexyl 4-hydroxy-3,5-dimethoxycinnamate, or polysiloxanes which contain benzylidenemalonic acid derivatives MERCK PATENT GMBH (DE) 2012-09-18 US disclosed
CN-101163659-B Antioxidants MERCK PATENT GMBH 2012-09-05 CN disclosed
US-8106233-B2 Applying di-2-ethylhexyl 4-hydroxy-3,5-dimethoxy-benzylmalonate; protective action against UV rays, oxidative stress on body cells, counters skin ageing MERCK PATENT GMBH (DE) 2012-01-31 US disclosed
US-20080171004-A1 Using compounds which do not themselves exhibit significant UV absorption in the UV-A or UV-B region, but are reactive under use conditions, such as 4-hydroxyphenylpropionic acid, or 2-ethylhexyl 4-hydroxy-3,5-dimethoxycinnamate, or polysiloxanes which contain benzylidenemalonic acid derivatives MERCK PATENT GMBH (DE) 2008-07-17 US disclosed
US-20080152603-A1 Antioxidants SUSONITY Commercial GmbH (DE) 2008-06-26 US disclosed
CN-101203278-A Ultraviolet protection MERCK PATENT GMBH (DE) 2008-06-18 CN disclosed
CN-101163659-A Antioxidants MERCK PATENT GMBH (DE) 2008-04-16 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080152603-A1 Antioxidants GPX4, GPX1, CAT CYP4F2 287/4885CYP4A11 486/4885APP 1760/4885
US-20080171004-A1 Using compounds which do not themselves exhibit significant UV absorption in the UV-A or UV-B region, but are reactive under use conditions, such as 4-hydroxyphenylpropionic acid, or 2-ethylhexyl 4-hydroxy-3,5-dimethoxycinnamate, or polysiloxanes which contain benzylidenemalonic acid derivatives HPD, HAAO, UGT1A6 CYP4F2 1045/4885CYP4A11 256/4885APP 1846/4885
US-11802181-B2 Di-amine compound, and heat-resistant resin and resin composition using the same CAD, ARID2, SMC3 CYP4F2 3485/4885CYP4A11 4623/4885APP 4115/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.