SCHEMBL4906419

SCHEMBL4906419

C=C(C)C(=O)Oc1cccc(S(=O)(=O)Nc2ccc3ccccc3c2)c1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 1/20 0.58
SMN1; SMN2 Q16637 3/20 0.56
LMNA P02545 2/20 0.56
ALDH1A1 P00352 2/20 0.56
GAA P10253 1/20 0.56
PGR P06401 2/20 0.52
PKM P14618 1/20 0.52
PKLR P30613 1/20 0.52
MEN1 O00255 3/20 0.51
KMT2A Q03164 3/20 0.51
ATM Q13315 1/20 0.51
PLAU P00749 3/20 0.51
MAPT P10636 1/20 0.50
HTT P42858 1/20 0.50
HDAC1 Q13547 2/20 0.49
HDAC3 O15379 1/20 0.49
HDAC4 P56524 1/20 0.49
HDAC7 Q8WUI4 1/20 0.49
HDAC2 Q92769 1/20 0.49
HDAC10 Q969S8 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3242895 0.88 SMN1; SMN2 (0.58) AKR1C3SMN1; SMN2LMNAALDH1A1GAA
SCHEMBL3254798 0.88 SMN1; SMN2 (0.65) AKR1C3SMN1; SMN2LMNAALDH1A1GAA
SCHEMBL3248714 0.88 PGR (0.54) LMNAALDH1A1GAAPGRMAPT
SCHEMBL3248098 0.85 GAA (0.49) SMN1; SMN2LMNAGAAPGRMEN1
SCHEMBL3251473 0.83 KMT2A (0.57) LMNAALDH1A1MEN1KMT2AMAPT
SCHEMBL7782512 0.80 ELANE (0.47) LMNAPGR
SCHEMBL397572 0.80 AKR1C3 (0.59) AKR1C3SMN1; SMN2LMNAALDH1A1GAA
SCHEMBL3255441 0.80 POLB (0.44) SMN1; SMN2LMNAALDH1A1PKMMAPT
SCHEMBL3253038 0.79 PGR (0.57) ALDH1A1GAAPGRPKMMEN1
SCHEMBL3250077 0.79 TCF4 (0.57) SMN1; SMN2LMNAALDH1A1PKMMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5141838-A Lithography printing plates FUJI PHOTO FILM CO., LTD. (JP) 1992-08-25 US claimed
US-20120146264-A1 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND PROCESS FOR MAKING RELIEF PRINTING PLATE FUJIFILM CORPORATION (JP) 2012-06-14 US disclosed
US-20080233516-A1 NEGATIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND LITHOGRAPHIC PRINTING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-09-25 US disclosed
EP-1972440-A2 Negative lithographic printing plate precursor and lithographic printing method using the same FUJIFILM Corporation (JP) 2008-09-24 EP disclosed
US-6517987-B2 Mixture of 1,2-naphthoquinone-2-diazide-5-sulfonic acid and polymer FUJI PHOTO FILM CO., LTD. (JP) 2003-02-11 US disclosed
US-20010041299-A1 Positive-working presensitized plate useful for preparing a lithographic printing plate FUJIFILM CORPORATION (JP) 2001-11-15 US disclosed
EP-0671660-B1 Lead-frame forming material FUJI PHOTO FILM CO LTD (JP) 2001-10-17 EP disclosed
EP-1136886-A1 Positive-working presensitized plate useful for preparing a lithographic printing plate Fuji Photo Film Co., Ltd. (JP) 2001-09-26 EP disclosed
EP-1077392-A1 Photosensitive lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2001-02-21 EP disclosed
US-5670293-A LIGHT SENSITIVE MATERIAL WITH COPPER OR NICKEL ALLOYS, DRYING A PHOTOSENSITIVE LAYER AND WINDING THE COATED WEB INTO STRIPS AND STACKING FUJI PHOTO FILM CO., LTD. (JP) 1997-09-23 US disclosed
EP-0330239-B1 Photosensitive composition FUJI PHOTO FILM CO LTD (JP) 1996-05-22 EP disclosed
EP-0671660-A2 Lead-frame forming material FUJI PHOTO FILM CO., LTD. (JP) 1995-09-13 EP disclosed
US-5141838-A Lithography printing plates FUJI PHOTO FILM CO., LTD. (JP) 1992-08-25 US disclosed
EP-0330239-A2 Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1989-08-30 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120146264-A1 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND PROCESS FOR MAKING RELIEF PRINTING PLATE EIF3L, EIF2B1, EIF2B5 AKR1C3 2527/4885SMN1; SMN2 815/4885LMNA 780/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.