SCHEMBL490744

SCHEMBL490744

Fc1ccc(C2(C3(c4ccc(F)cc4)N=C(c4ccccc4)C(c4ccccc4)=N3)N=C(c3ccccc3)C(c3ccccc3)=N2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPY5R Q15761 2/20 0.44
NPC1 O15118 1/20 0.35
NFE2L2 Q16236 1/20 0.34
ALDH1A1 P00352 3/20 0.34
ALOX5 P09917 1/20 0.34
MEN1 O00255 1/20 0.34
MITF O75030 1/20 0.34
LMNA P02545 1/20 0.34
MAPT P10636 1/20 0.34
HTT P42858 1/20 0.34
CASP6 P55212 1/20 0.34
KMT2A Q03164 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
NR3C1 P04150 1/20 0.34
KDM4E B2RXH2 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
POLB P06746 2/20 0.33
ADORA1 P30542 2/20 0.33
ADORA2A P29274 1/20 0.33
CYP11B1 P15538 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL490734 0.85 ALDH1A1 (0.41) ALDH1A1
SCHEMBL491053 0.85 ALDH1A1 (0.39) NPY5RNPC1ALDH1A1MEN1LMNA
SCHEMBL490735 0.81 ALDH1A1 (0.41) NPY5RNPC1ALDH1A1KMT2ASMN1; SMN2
SCHEMBL8664748 0.80 CYP1A2 (0.48) NPC1ALDH1A1LMNAMAPTHTT
SCHEMBL5554839 0.80 ALDH1A1 (0.48) NPC1ALDH1A1SMN1; SMN2ADORA1ADORA2A
SCHEMBL14973574 0.80 NPC1 (0.41) NPC1ALDH1A1MEN1LMNAMAPT
SCHEMBL491016 0.79 BACE1 (0.41) NFE2L2ADORA1ADORA2A
SCHEMBL491028 0.76 HTR6 (0.50) ALDH1A1ALOX5MEN1MAPTKMT2A
SCHEMBL150156 0.76 ALDH1A1 (0.46) NPC1ALDH1A1LMNAMAPTKDM4E
SCHEMBL8664760 0.74 NPC1 (0.49) NPC1ALDH1A1LMNAMAPTKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8652759-B2 Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer EASTMAN KODAK COMPANY (US) 2014-02-18 US disclosed
US-8632937-B2 UV-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer EASTMAN KODAK COMPANY (US) 2014-01-21 US disclosed
EP-1849600-B1 Bakeable radiation-sensitive elements with a high resistance to chemicals EASTMAN KODAK CO (US) 2013-12-11 EP disclosed
US-8507181-B2 Method for developing and sealing of lithographic printing plates KODAK (NEAR EAST) INC. 2013-08-13 US disclosed
US-8361701-B2 Method for making lithographic plates EASTMAN KODAK COMPANY (US) 2013-01-29 US disclosed
EP-2293144-B1 Method of drying lithographic printing plates after single-step-processing EASTMAN KODAK CO (US) 2012-11-07 EP disclosed
US-20120152139-A1 METHOD AND APPARATUS FOR DRYING AFTER SINGLE-STEP-PROCESSING OF LITHOGRAPHIC PRINTING PLATES QUALEX INC. 2012-06-21 US disclosed
US-8137891-B2 Bakeable lithographic printing plates with a high resistance to chemicals EASTMAN KODAK COMPANY (US) 2012-03-20 US disclosed
US-8119331-B2 Photopolymer composition usable for lithographic plates KODAK GRAPHIC COMMUNICATIONS GMBH (DE) 2012-02-21 US disclosed
US-8105755-B2 Method for processing of photopolymer printing plates with overcoat EASTMAN KODAK COMPANY (US) 2012-01-31 US disclosed
US-20060154169-A1 Radiation-sensitive compositions comprising a 1,4-dihydropyridine sensitizer and imageable elements based thereon KODAK POLYCHROME GRAPHICS GMBH (DE) 2006-07-13 US disclosed
WO-2006053689-A1 LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH OLIGOMERIC OR POLYMERIC SENSITIZERS KODAK POLYCHROME GRAPHICS GMBH (DE) 2006-05-26 WO disclosed
WO-2006044243-A2 HOLOGRAPHIC STORAGE MEDIUM GENERAL ELECTRIC COMPANY A CORPORATION OF THE STATE OF NEW YORK (US) 2006-04-27 WO disclosed
US-20060078802-A1 Holographic storage medium SABIC INNOVATIVE PLASTICS IP B.V. 2006-04-13 US disclosed
US-20060063101-A1 Radiation-sensitive elements KODAK POLYCHROME GRAPHICS LLC (US) 2006-03-23 US disclosed
EP-1586006-A1 RADIATION-SENSITIVE ELEMENTS Kodak Polychrome Graphics GmbH (DE) 2005-10-19 EP disclosed
WO-2005054952-A1 RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE ELEMENTS BASED THEREON KODAK POLYCHROME GRAPHICS GMBH (DE) 2005-06-16 WO disclosed
WO-2004111731-A1 RADIATION-SENSITIVE COMPOSITIONS COMPRISING A 1,4-DIHYDROPYRIDINE SENSITIZER AND IMAGEABLE ELEMENTS BASED THEREON KODAK POLYCHROME GRAPHICS GMBH (DE) 2004-12-23 WO disclosed
WO-2004049068-A1 RADIATION-SENSITIVE ELEMENTS KODAK POLYCHROME GRAPHICS GMBH (DE) 2004-06-10 WO disclosed
US-4017313-A Photosensitive composition containing a leuco dye, a photosensitizer, an aromatic aldehyde and a secondary or tertiary amine and the use thereof in a direct-print process E. I. DU PONT DE NEMOURS AND COMPANY (US) 1977-04-12 US disclosed