SCHEMBL490735

SCHEMBL490735

c1ccc(-c2ccc(C3=NC(c4ccccc4)(C4(c5ccccc5)N=C(c5ccc(-c6ccccc6)cc5)C(c5ccc(-c6ccccc6)cc5)=N4)N=C3c3ccc(-c4ccccc4)cc3)cc2)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.41
TAAR1 Q96RJ0 2/20 0.37
MAPK1 P28482 1/20 0.37
CYP1A2 P05177 1/20 0.37
CYP3A4 P08684 1/20 0.37
HSD17B10 Q99714 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
NOTUM Q6P988 1/20 0.37
MMP3 P08254 1/20 0.37
BCL2L1 Q07817 1/20 0.37
ATM Q13315 1/20 0.34
SMN1; SMN2 Q16637 2/20 0.33
TSHR P16473 1/20 0.33
NPY5R Q15761 1/20 0.33
NPC1 O15118 1/20 0.33
NFKB1 P19838 1/20 0.33
RAB9A P51151 1/20 0.33
NFKB2 Q00653 1/20 0.33
RELA Q04206 1/20 0.33
CA1 P00915 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL490734 0.95 ALDH1A1 (0.41) ALDH1A1TAAR1MAPK1CYP1A2CYP3A4
SCHEMBL491053 0.95 ALDH1A1 (0.39) ALDH1A1MAPK1NOTUMATMSMN1; SMN2
SCHEMBL5554839 0.81 ALDH1A1 (0.48) ALDH1A1MAPK1TDP1SMN1; SMN2NPC1
SCHEMBL490744 0.81 NPY5R (0.44) ALDH1A1SMN1; SMN2NPY5RNPC1KMT2A
SCHEMBL14973574 0.81 NPC1 (0.41) ALDH1A1TDP1SMN1; SMN2TSHRNPC1
SCHEMBL8664748 0.81 CYP1A2 (0.48) ALDH1A1CYP1A2HSD17B10SMN1; SMN2TSHR
SCHEMBL11595707 0.81 KDM4E (0.46) ALDH1A1TDP1NPC1RAB9A
SCHEMBL11594968 0.79 ALDH1A1 (0.34) ALDH1A1CYP1A2CYP3A4SMN1; SMN2TSHR
SCHEMBL8664760 0.79 NPC1 (0.49) ALDH1A1TDP1NPC1RAB9A
SCHEMBL2519476 0.78 MAOA (0.37) ALDH1A1HSD17B10SMN1; SMN2MGLL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8652759-B2 Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer EASTMAN KODAK COMPANY (US) 2014-02-18 US disclosed
US-8632937-B2 UV-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer EASTMAN KODAK COMPANY (US) 2014-01-21 US disclosed
EP-1849600-B1 Bakeable radiation-sensitive elements with a high resistance to chemicals EASTMAN KODAK CO (US) 2013-12-11 EP disclosed
US-8507181-B2 Method for developing and sealing of lithographic printing plates KODAK (NEAR EAST) INC. 2013-08-13 US disclosed
US-8361701-B2 Method for making lithographic plates EASTMAN KODAK COMPANY (US) 2013-01-29 US disclosed
EP-2293144-B1 Method of drying lithographic printing plates after single-step-processing EASTMAN KODAK CO (US) 2012-11-07 EP disclosed
US-20120152139-A1 METHOD AND APPARATUS FOR DRYING AFTER SINGLE-STEP-PROCESSING OF LITHOGRAPHIC PRINTING PLATES QUALEX INC. 2012-06-21 US disclosed
US-8137891-B2 Bakeable lithographic printing plates with a high resistance to chemicals EASTMAN KODAK COMPANY (US) 2012-03-20 US disclosed
US-8119331-B2 Photopolymer composition usable for lithographic plates KODAK GRAPHIC COMMUNICATIONS GMBH (DE) 2012-02-21 US disclosed
US-8105755-B2 Method for processing of photopolymer printing plates with overcoat EASTMAN KODAK COMPANY (US) 2012-01-31 US disclosed
WO-2007090550-A1 UV-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR WITH BENZOXAZOLE DERIVATIVE AND ANALOGUES THEREOF AS SENSITIZER KODAK GRAPHIC COMMUNICATIONS GMBH (DE) 2007-08-16 WO disclosed
WO-2007077207-A2 PHOTOPOLYMER COMPOSITION SUITABLE FOR LITHOGRAPHIC PRINTING PLATES KODAK GRAPHIC COMMUNICATIONS GMBH (DE) 2007-07-12 WO disclosed
US-20070142490-A1 Radiation-sensitive compositions and imageable elements based thereon BAUMANN HARALD 2007-06-21 US disclosed
WO-2007009580-A2 PHOTOPOLYMER COMPOSITION SUITABLE FOR LITHOGRAPHIC PRINTING PLATES EASTMAN KODAK COMPANY (US) 2007-01-25 WO disclosed
US-20060154169-A1 Radiation-sensitive compositions comprising a 1,4-dihydropyridine sensitizer and imageable elements based thereon KODAK POLYCHROME GRAPHICS GMBH (DE) 2006-07-13 US disclosed
WO-2006053689-A1 LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH OLIGOMERIC OR POLYMERIC SENSITIZERS KODAK POLYCHROME GRAPHICS GMBH (DE) 2006-05-26 WO disclosed
US-20060063101-A1 Radiation-sensitive elements KODAK POLYCHROME GRAPHICS LLC (US) 2006-03-23 US disclosed
EP-1586006-A1 RADIATION-SENSITIVE ELEMENTS Kodak Polychrome Graphics GmbH (DE) 2005-10-19 EP disclosed
WO-2004111731-A1 RADIATION-SENSITIVE COMPOSITIONS COMPRISING A 1,4-DIHYDROPYRIDINE SENSITIZER AND IMAGEABLE ELEMENTS BASED THEREON KODAK POLYCHROME GRAPHICS GMBH (DE) 2004-12-23 WO disclosed
WO-2004049068-A1 RADIATION-SENSITIVE ELEMENTS KODAK POLYCHROME GRAPHICS GMBH (DE) 2004-06-10 WO disclosed