SCHEMBL490794

SCHEMBL490794

COc1ccc(C2=NC(c3ccccc3Cl)(C3(c4ccccc4Cl)N=C(c4ccc(OC)cc4)C(c4ccc(OC)cc4)=N3)N=C2c2ccc(OC)cc2)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RELA Q04206 2/20 0.40
NFE2L2 Q16236 1/20 0.40
KMT2A Q03164 3/20 0.39
TDP1 Q9NUW8 2/20 0.39
L3MBTL1 Q9Y468 2/20 0.39
MAPT P10636 1/20 0.39
CLK4 Q9HAZ1 1/20 0.39
NPC1 O15118 3/20 0.38
RAB9A P51151 3/20 0.38
ALDH1A1 P00352 3/20 0.38
KDM4E B2RXH2 2/20 0.38
LMNA P02545 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
GLA P06280 1/20 0.38
MEN1 O00255 1/20 0.37
TAAR1 Q96RJ0 1/20 0.37
BACE1 P56817 2/20 0.37
GAA P10253 1/20 0.37
PKM P14618 1/20 0.37
APP P05067 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11268438 0.97 ALDH1A1 (0.43) RELANFE2L2TDP1L3MBTL1MAPT
SCHEMBL82380 0.84 DYRK1A (0.43) RELATDP1MAPTCLK4NPC1
SCHEMBL29660677 0.84 DYRK1A (0.43) RELATDP1MAPTCLK4NPC1
SCHEMBL1877506 0.82 TAAR1 (0.40) RELAKMT2ATDP1L3MBTL1MAPT
SCHEMBL11269310 0.82 KDM4E (0.40) RELAKMT2ATDP1L3MBTL1MAPT
SCHEMBL11278246 0.82 ALDH1A1 (0.45) KMT2ATDP1L3MBTL1MAPTNPC1
SCHEMBL491288 0.82 CYP1A2 (0.40) RELAL3MBTL1MAPTNPC1RAB9A
SCHEMBL82274 0.81 TAAR1 (0.40) KMT2AL3MBTL1NPC1RAB9AALDH1A1
SCHEMBL16650695 0.81 ALDH1A1 (0.47) KMT2AL3MBTL1MAPTNPC1RAB9A
SCHEMBL8667011 0.80 ABL1 (0.46) TDP1L3MBTL1MAPTNPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 110 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10113907-B2 Ultraviolet-sensing sheet, ultraviolet-sensing set, and ultraviolet-sensing method FUJIFILM CORPORATION (JP) 2018-10-30 US disclosed
US-10012904-B2 Lithographic printing plate precursors and coating Mark'Andy Inc. (US) 2018-07-03 US disclosed
EP-3063591-B1 LITHOGRAPHIC PRINTING PLATE PRECURSORS AND COATING ANOCOIL CORP (US) 2018-04-04 EP disclosed
US-20170131144-A1 ULTRAVIOLET-SENSING SHEET, ULTRAVIOLET-SENSING SET, AND ULTRAVIOLET-SENSING METHOD FUJIFILM CORPORATION (JP) 2017-05-11 US disclosed
EP-3063591-A1 LITHOGRAPHIC PRINTING PLATE PRECURSORS AND COATING Anocoil Corporation (US) 2016-09-07 EP disclosed
US-20160252813-A1 Lithographic Printing Plate Precursors and Coating VERICO TECHNOLOGY LLC 2016-09-01 US disclosed
US-8652759-B2 Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer EASTMAN KODAK COMPANY (US) 2014-02-18 US disclosed
US-8632937-B2 UV-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer EASTMAN KODAK COMPANY (US) 2014-01-21 US disclosed
EP-1849600-B1 Bakeable radiation-sensitive elements with a high resistance to chemicals EASTMAN KODAK CO (US) 2013-12-11 EP disclosed
US-8507181-B2 Method for developing and sealing of lithographic printing plates KODAK (NEAR EAST) INC. 2013-08-13 US disclosed
US-20050025946-A1 Light-sensitive sheet comprising support, first light-sensitive layer and second light-sensitive layer FUJI PHOTO FILM CO., LTD. 2005-02-03 US disclosed
WO-2004111731-A1 RADIATION-SENSITIVE COMPOSITIONS COMPRISING A 1,4-DIHYDROPYRIDINE SENSITIZER AND IMAGEABLE ELEMENTS BASED THEREON KODAK POLYCHROME GRAPHICS GMBH (DE) 2004-12-23 WO disclosed
EP-1489460-A2 Light-sensitive sheet comprising support, first light-sensitive layer and second light-sensitive layer Fuji Photo Film Co., Ltd. (JP) 2004-12-22 EP disclosed
US-20040131975-A1 Photosensitive lithographic printing plate and method for making a printing plate LASTRA S.P.A. (IT) 2004-07-08 US disclosed
WO-2004049068-A1 RADIATION-SENSITIVE ELEMENTS KODAK POLYCHROME GRAPHICS GMBH (DE) 2004-06-10 WO disclosed
EP-1287986-A1 METHOD AND DEVICE FOR REGENERATIVE PROCESSING AND PRINTING MITSUBISHI CHEMICAL CORPORATION (JP) 2003-03-05 EP disclosed
EP-1148387-A1 Photosensitive lithographic printing plate and method for making the printing plate MITSUBISHI CHEMICAL CORPORATION (JP) 2001-10-24 EP disclosed
US-5792589-A ORGANIC BINDER; OPTICALLY CROSSLINKABLE COMPOUND; RADICAL-GENERATING AGENT: 2,4,5-TRIARYL IMIDAZOLE DIMER, AMINO-GROUP CONTAINING BENZOPHENONE PHOTOSENSITIZER, A THIOL COMPOUND JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-08-11 US disclosed
US-4090877-A COLOR PHOTOGRAPHY MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1978-05-23 US disclosed
US-4017313-A Photosensitive composition containing a leuco dye, a photosensitizer, an aromatic aldehyde and a secondary or tertiary amine and the use thereof in a direct-print process E. I. DU PONT DE NEMOURS AND COMPANY (US) 1977-04-12 US disclosed