SCHEMBL491196

SCHEMBL491196

COc1ccc(C2=NC(c3cccc4ccccc34)(C3(c4cccc5ccccc45)N=C(c4ccc(OC)cc4)C(c4ccc(OC)cc4)=N3)N=C2c2ccc(OC)cc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 4/20 0.43
KDM4E B2RXH2 5/20 0.43
ALDH1A1 P00352 5/20 0.43
NPC1 O15118 3/20 0.43
KMT2A Q03164 3/20 0.43
SMN1; SMN2 Q16637 3/20 0.43
MAPT P10636 3/20 0.43
HPGD P15428 3/20 0.43
LMNA P02545 3/20 0.43
MEN1 O00255 2/20 0.43
NFKB1 P19838 2/20 0.43
NFKB2 Q00653 2/20 0.43
RELA Q04206 2/20 0.43
TP53 P04637 1/20 0.43
ACACA Q13085 1/20 0.40
HTT P42858 1/20 0.40
ADORA2A P29274 1/20 0.40
EGFR P00533 2/20 0.40
ERBB2 P04626 2/20 0.40
ERBB3 P21860 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8663516 0.83 MAPT (0.38) RAB9AKDM4EALDH1A1NPC1KMT2A
SCHEMBL491310 0.83 KDM4E (0.44) RAB9AKDM4EALDH1A1NPC1KMT2A
SCHEMBL8666981 0.82 MAPT (0.39) RAB9AKDM4EALDH1A1NPC1KMT2A
SCHEMBL8667184 0.80 CYP1A2 (0.38) KDM4EKMT2AMAPTLMNAMEN1
SCHEMBL490794 0.79 RELA (0.40) RAB9AKDM4EALDH1A1NPC1KMT2A
SCHEMBL8667011 0.78 ABL1 (0.46) RAB9AKDM4EALDH1A1NPC1MAPT
SCHEMBL8665416 0.77 NPC1 (0.44) RAB9AKDM4EALDH1A1NPC1KMT2A
SCHEMBL11268438 0.77 ALDH1A1 (0.43) RAB9AKDM4EALDH1A1NPC1MAPT
SCHEMBL8665435 0.77 MAPT (0.42) RAB9AKDM4EALDH1A1NPC1KMT2A
SCHEMBL8668417 0.77 ALDH1A1 (0.43) RAB9AKDM4EALDH1A1KMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8652759-B2 Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer EASTMAN KODAK COMPANY (US) 2014-02-18 US disclosed
US-8632937-B2 UV-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer EASTMAN KODAK COMPANY (US) 2014-01-21 US disclosed
EP-1849600-B1 Bakeable radiation-sensitive elements with a high resistance to chemicals EASTMAN KODAK CO (US) 2013-12-11 EP disclosed
US-8507181-B2 Method for developing and sealing of lithographic printing plates KODAK (NEAR EAST) INC. 2013-08-13 US disclosed
US-8361701-B2 Method for making lithographic plates EASTMAN KODAK COMPANY (US) 2013-01-29 US disclosed
EP-2293144-B1 Method of drying lithographic printing plates after single-step-processing EASTMAN KODAK CO (US) 2012-11-07 EP disclosed
US-20120152139-A1 METHOD AND APPARATUS FOR DRYING AFTER SINGLE-STEP-PROCESSING OF LITHOGRAPHIC PRINTING PLATES QUALEX INC. 2012-06-21 US disclosed
US-8137891-B2 Bakeable lithographic printing plates with a high resistance to chemicals EASTMAN KODAK COMPANY (US) 2012-03-20 US disclosed
US-8119331-B2 Photopolymer composition usable for lithographic plates KODAK GRAPHIC COMMUNICATIONS GMBH (DE) 2012-02-21 US disclosed
US-8105755-B2 Method for processing of photopolymer printing plates with overcoat EASTMAN KODAK COMPANY (US) 2012-01-31 US disclosed
US-20070142490-A1 Radiation-sensitive compositions and imageable elements based thereon BAUMANN HARALD 2007-06-21 US disclosed
EP-1690138-A1 RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE ELEMENTS BASED THEREON Kodak Polychrome Graphics GmbH (DE) 2006-08-16 EP disclosed
US-20060154169-A1 Radiation-sensitive compositions comprising a 1,4-dihydropyridine sensitizer and imageable elements based thereon KODAK POLYCHROME GRAPHICS GMBH (DE) 2006-07-13 US disclosed
US-20060063101-A1 Radiation-sensitive elements KODAK POLYCHROME GRAPHICS LLC (US) 2006-03-23 US disclosed
EP-1586006-A1 RADIATION-SENSITIVE ELEMENTS Kodak Polychrome Graphics GmbH (DE) 2005-10-19 EP disclosed
WO-2005054952-A1 RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE ELEMENTS BASED THEREON KODAK POLYCHROME GRAPHICS GMBH (DE) 2005-06-16 WO disclosed
WO-2004111731-A1 RADIATION-SENSITIVE COMPOSITIONS COMPRISING A 1,4-DIHYDROPYRIDINE SENSITIZER AND IMAGEABLE ELEMENTS BASED THEREON KODAK POLYCHROME GRAPHICS GMBH (DE) 2004-12-23 WO disclosed
WO-2004049068-A1 RADIATION-SENSITIVE ELEMENTS KODAK POLYCHROME GRAPHICS GMBH (DE) 2004-06-10 WO disclosed
US-5792589-A ORGANIC BINDER; OPTICALLY CROSSLINKABLE COMPOUND; RADICAL-GENERATING AGENT: 2,4,5-TRIARYL IMIDAZOLE DIMER, AMINO-GROUP CONTAINING BENZOPHENONE PHOTOSENSITIZER, A THIOL COMPOUND JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-08-11 US disclosed
US-4017313-A Photosensitive composition containing a leuco dye, a photosensitizer, an aromatic aldehyde and a secondary or tertiary amine and the use thereof in a direct-print process E. I. DU PONT DE NEMOURS AND COMPANY (US) 1977-04-12 US disclosed