SCHEMBL4912906

SCHEMBL4912906

OCc1c(Cl)cc(-c2cc(Cl)c(CO)c(Cl)c2)cc1Cl

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TTR P02766 1/20 0.48
AHR P35869 4/20 0.35
CYP1B1 Q16678 1/20 0.35
PDXK O00764 1/20 0.32
ESR2 Q92731 3/20 0.32
ESR1 P03372 2/20 0.32
RECQL P46063 2/20 0.32
MEN1 O00255 1/20 0.32
NPC1 O15118 1/20 0.32
USP2 O75604 1/20 0.32
EGFR P00533 1/20 0.32
LMNA P02545 1/20 0.32
ERBB2 P04626 1/20 0.32
CYP1A2 P05177 1/20 0.32
LCK P06239 1/20 0.32
FYN P06241 1/20 0.32
PGR P06401 1/20 0.32
POLB P06746 1/20 0.32
HSP90AA1 P07900 1/20 0.32
CYP3A4 P08684 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL320021 0.82 TSHR (0.48) TTRAHRESR2ESR1RECQL
SCHEMBL522619 0.80 ACHE (0.43) TTRPDXKESR2ESR1RECQL
SCHEMBL5940300 0.80 HSD17B10 (0.52) TTRPDXKESR2ESR1RECQL
SCHEMBL3047156 0.78 NMT1 (0.38) PDXKESR2ESR1RECQLMEN1
SCHEMBL320942 0.78 IDO1 (0.32) TTRPDXKESR2ESR1RECQL
SCHEMBL25370371 0.78 IDO1 (0.33) PDXKESR2ESR1RECQLMEN1
SCHEMBL320641 0.78 TSHR (0.37) MEN1NPC1LMNAPOLBMAPT
SCHEMBL19130902 0.78 THRB (0.52) PDXKESR2ESR1RECQLMEN1
SCHEMBL31522467 0.74 TTR (0.47) TTRESR2ESR1RECQLMEN1
SCHEMBL17048731 0.72 TRPV4 (0.37) CYP1A2ALOX15ALOX12CYP2C19SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080286688-A1 Photosensitive Resin Composition and Cured Product Thereof NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2008-11-20 US disclosed
EP-1710626-A1 PHOTOSENSITIVE RESIN COMPOSITION AND CURED PRODUCT THEREOF Nippon Kayaku Kabushiki Kaisha (JP) 2006-10-11 EP disclosed