⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9160703 | 0.77 | — | — | |
| Lindane SCHEMBL4466086 | 0.74 | LMNA (0.46) | — | |
| SCHEMBL15611834 | 0.72 | — | — | |
| SCHEMBL874375 | 0.72 | — | — | |
| SCHEMBL512265 | 0.67 | — | — | |
| SCHEMBL385215 | 0.61 | — | — | |
| SCHEMBL58777 | 0.61 | — | — | |
| SCHEMBL9223839 | 0.58 | — | — | |
| Methane SCHEMBL23070747 | 0.55 | — | — | |
| SCHEMBL17202621 | 0.55 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2254 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260090068-A1 | SEMICONDUCTOR DEVICE AND METHODS OF FORMATION | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2026-03-26 | — | — | US | claimed |
| US-20250372373-A1 | GATE-ALL-AROUND (GAA) INTERFACE MODIFICATIONS TO IMPROVE ABRUPTNESS | APPLIED MATERIALS INC (US) | 2025-12-04 | — | — | US | claimed |
| US-20250338599-A1 | SEMICONDUCTOR GATE STRUCTURE AND METHODS OF FORMING THE SAME | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2025-10-30 | — | — | US | claimed |
| CN-116217934-B | Chelated organotin catalyst and application thereof in storage-resistant dealcoholization type RTV-1 silicone rubber | 湖北环宇化工有限公司 | 2024-11-29 | — | — | CN | claimed |
| CN-116254001-B | Dealcoholized RTV-1 silicone rubber with good storage stability and preparation method thereof | 湖北环宇化工有限公司 | 2024-06-07 | — | — | CN | claimed |
| CN-116162438-B | Dealcoholized RTV-1 silicone rubber with improved storage life and preparation method thereof | 湖北环宇化工有限公司 | 2024-06-07 | — | — | CN | claimed |
| CN-118073199-A | Semiconductor device and method for manufacturing the same | 台湾积体电路制造股份有限公司 | 2024-05-24 | — | — | CN | claimed |
| CN-116716600-A | Corrosion-resistant magnesium alloy chromium-free passivation solution and preparation method thereof | 深圳市钝化技术有限公司 | 2023-09-08 | — | — | CN | claimed |
| CN-116581282-A | Alloyed negative electrode material, preparation method and application thereof | 北京壹金新能源科技有限公司 | 2023-08-11 | — | — | CN | claimed |
| CN-116254001-A | Dealcoholized RTV-1 silicone rubber with good storage stability and preparation method thereof | 湖北环宇化工有限公司 | 2023-06-13 | — | — | CN | claimed |
| EP-1262233-B1 | PROCESS FOR PRODUCING TITANIUM-CONTAINING SILICON OXIDE CATALYST, THE CATALYST, AND PROCESS FOR PRODUCING OXIRANE COMPOUND WITH THE CATALYST | SUMITOMO CHEMICAL CO (JP) | 2006-07-19 | — | — | EP | claimed |
| US-6936537-B2 | Methods for forming low-k dielectric films | THE BOC GROUP, INC. (US) | 2005-08-30 | — | — | US | claimed |
| US-6881697-B1 | Process for producing titanium-containing silicon oxide catalyst, the catalyst, and process for producing oxirane compound with the catalyst | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-04-19 | — | — | US | claimed |
| EP-1271634-A2 | Methods for forming low-K dielectric films | THE BOC GROUP, INC. (US) | 2003-01-02 | — | — | EP | claimed |
| US-20020192980-A1 | Methods for forming low-k dielectric films | BOC GROUP, INC., THE | 2002-12-19 | — | — | US | claimed |
| EP-1262233-A1 | PROCESS FOR PRODUCING TITANIUM-CONTAINING SILICON OXIDE CATALYST, THE CATALYST, AND PROCESS FOR PRODUCING OXIRANE COMPOUND WITH THE CATALYST | Sumitomo Chemical Company, Limited (JP) | 2002-12-04 | — | — | EP | claimed |
| EP-0537740-B1 | Process for the preparation of methylchlorosilanes | WACKER CHEMIE GMBH (DE) | 1995-01-04 | — | — | EP | claimed |
| EP-0175614-B1 | MAGNETIC RECORDING MEDIUM AND MANUFACTURING METHOD THEREOF | Shin-Etsu Chemical Co., Ltd. (JP) | 1989-03-08 | — | — | EP | claimed |
| US-4377677-A | Method of preparing polycarbosilanes | UBE INDUSTRIES, LTD. (JP) | 1983-03-22 | — | — | US | claimed |
| US-4206252-A | CONTINUOUS PROCESSING, VAPOR DEPOSITION | GORDON ROY G | 1980-06-03 | — | — | US | claimed |