Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30980356 | 0.82 | — | — | |
| SCHEMBL17899070 | 0.80 | ALDH1A1 (0.33) | ALDH1A1TDP1 | |
| SCHEMBL3271093 | 0.77 | ADH1A (0.32) | — | |
| SCHEMBL3276795 | 0.75 | ADH1A (0.36) | — | |
| SCHEMBL22388133 | 0.74 | CHRM2 (0.32) | — | |
| SCHEMBL10012993 | 0.73 | — | — | |
| SCHEMBL23328321 | 0.71 | LMNA (0.31) | CYP2D6 | |
| SCHEMBL20221606 | 0.71 | RIPK1 (0.31) | — | |
| SCHEMBL28143602 | 0.71 | — | — | |
| SCHEMBL24132476 | 0.71 | CYP1A2 (0.48) | ALDH1A1TDP1CYP1A2CYP2D6ALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160333215-A1 | ACTIVATING ENERGY BEAM-CURABLE COMPOSITION FOR FLOORING MATERIAL | DIC CORPORATION (JP) | 2016-11-17 | — | — | US | disclosed |
| US-20160333131-A1 | ACTIVE ENERGY RAY-CURABLE COMPOSITION FOR FLOORING MATERIALS AND INSTALLATION METHOD THEREFOR | DIC CORPORATION (JP) | 2016-11-17 | — | — | US | disclosed |
| EP-2007587-B1 | INKJET RECORDING METHOD | RICOH CO LTD (JP) | 2013-07-24 | — | — | EP | disclosed |
| US-8399541-B2 | Active energy ray-curable ink composition and printed matter | DIC CORPORATION (JP) | 2013-03-19 | — | — | US | disclosed |
| US-8142849-B2 | Recording media, recording media-ink set, inkjet recording method and inkjet recording apparatus | RICOH COMPANY, LTD. (JP) | 2012-03-27 | — | — | US | disclosed |
| US-8104884-B2 | Coating agent for UV curable inkjet printing | MIMAKI ENGINEERING CO., LTD. (JP) | 2012-01-31 | — | — | US | disclosed |
| US-20110221839-A1 | COATING AGENT FOR UV CURABLE INKJET PRINTING | MIMAKI ENGINEERING CO., LTD. (JP) | 2011-09-15 | — | — | US | disclosed |
| EP-2064067-B1 | INK JET RECORDING METHOD | RICOH CO LTD (JP) | 2011-06-08 | — | — | EP | disclosed |
| US-7938527-B2 | Ink, ink cartridge, ink jet recording apparatus, and ink jet recording method | RICOH COMPANY, LTD. (JP) | 2011-05-10 | — | — | US | disclosed |
| US-20110014438-A1 | ACTIVE ENERGY RAY-CURABLE INK COMPOSITION AND PRINTED MATTER | DIC CORPORATION (JP) | 2011-01-20 | — | — | US | disclosed |
| EP-1698647-A1 | POLYMER AND PROCESS FOR PRODUCING POLYMER | KANSAI PAINT CO., LTD. (JP) | 2006-09-06 | — | — | EP | disclosed |
| EP-1398360-B1 | RADIATION HARDENABLE ADHESIVE COMPOSITION CONTAINING DISPERSED NATURAL RUBBER FINE PARTICLES | TOPPAN FORMS CO LTD (JP) | 2006-08-16 | — | — | EP | disclosed |
| US-7081486-B2 | Method of producing polymer | SHIZUOKA UNIVERSITY (JP) | 2006-07-25 | — | — | US | disclosed |
| EP-1598374-A1 | METHOD OF PRODUCING POLYMER | Japan as represented by President of Shizuoka University (JP) | 2005-11-23 | — | — | EP | disclosed |
| US-20050143481-A1 | Method of producing polymer | KANSAI PAINT CO., LTD. (JP) | 2005-06-30 | — | — | US | disclosed |
| US-20050080181-A1 | Radiation hardenable adhesive composition containing dispersed natural rubber fine particles | TOPPAN FORMS CO., LTD. (JP) | 2005-04-14 | — | — | US | disclosed |
| EP-1398360-A1 | RADIATION HARDENABLE ADHESIVE COMPOSITION CONTAINING DISPERSED NATURAL RUBBER FINE PARTICLES | Toppan Forms Co., Ltd (JP) | 2004-03-17 | — | — | EP | disclosed |
| EP-0427950-B1 | A photosensitive resin composition for use in forming a relief structure | ASAHI CHEMICAL IND (JP) | 1996-07-17 | — | — | EP | disclosed |
| US-5336585-A | Free of tunnel voids | ASAHI KASEI KOGYO KABUSHIKI (JP) | 1994-08-09 | — | — | US | disclosed |
| EP-0427950-A2 | A photosensitive resin composition for use in forming a relief structure | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1991-05-22 | — | — | EP | disclosed |