SCHEMBL4928641

SCHEMBL4928641

CC(=O)Oc1cccc2c1Nc1ccc(N(C)C)cc1N2C

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 6/20 0.37
▸ HSD17B10 Q99714 3/20 0.37
▸ RECQL P46063 2/20 0.37
▸ MAPK1 P28482 2/20 0.35
▸ P2RX4 Q99571 1/20 0.35
▸ BCHE P06276 1/20 0.35
▸ KDM4E B2RXH2 5/20 0.33
▸ KMT2A Q03164 3/20 0.33
▸ L3MBTL1 Q9Y468 2/20 0.33
▸ HTR1A P08908 4/20 0.32
▸ PTPN1 P18031 1/20 0.32
▸ ACHE P22303 1/20 0.32
▸ SMN1; SMN2 Q16637 3/20 0.32
▸ HPGD P15428 3/20 0.32
▸ GAA P10253 3/20 0.32
▸ BLM P54132 2/20 0.32
▸ TDP1 Q9NUW8 2/20 0.32
▸ ESR1 P03372 1/20 0.32
▸ ITGB3 P05106 1/20 0.32
▸ ITGA2B P08514 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16285343 0.74 ALDH1A1 (0.41) ALDH1A1HSD17B10MAPK1P2RX4KDM4E
SCHEMBL3899307 0.74 ALDH1A1 (0.47) ALDH1A1HSD17B10MAPK1P2RX4KDM4E
SCHEMBL16285334 0.64 ALDH1A1 (0.37) ALDH1A1HSD17B10P2RX4KDM4EHPGD
SCHEMBL30222706 0.63 CHEK1 (0.46) ALDH1A1HSD17B10KDM4EKMT2AHPGD
Sulfuric Acid SCHEMBL3823397 0.63 CHEK1 (0.44) ALDH1A1HSD17B10MAPK1KDM4EKMT2A
Sulfuric Acid SCHEMBL30513696 0.63 CHEK1 (0.44) ALDH1A1HSD17B10MAPK1KDM4EKMT2A
SCHEMBL11265429 0.62 ACHE (0.60) ALDH1A1BCHEKMT2AACHESMN1; SMN2
SCHEMBL22587845 0.62 ALDH1A1 (0.46) ALDH1A1KDM4EKMT2AL3MBTL1HPGD
SCHEMBL7506473 0.62 AKT1 (0.47) ALDH1A1HSD17B10MAPK1KDM4EKMT2A
SCHEMBL17241046 0.62 KDM4E (0.63) ALDH1A1HSD17B10MAPK1KDM4EKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080142370-A1 Aqueous, Acidic Solution and Method for Electrolytically Depositing Copper Coatings as Well as Use of Said Solution ATOTECH DEUTSCHLAND GMBH (DE) 2008-06-19 — — US claimed
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