Phosphoric Acid

Phosphoric Acid

SCHEMBL4933641

CCCCCCCCCCCCCCOCCCCCCCCCCCCCC.O=P(O)(O)O

nearest known ligand 0.64

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Known targets — ChEMBL curated mechanism

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

The experimentally established mechanism targets of Phosphoric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
LPAR3 Q9UBY5 11/20 0.64
LPAR2 Q9HBW0 6/20 0.64
LPAR1 Q92633 4/20 0.64
MEN1 O00255 1/20 0.60
THRB P10828 1/20 0.60
HTT P42858 1/20 0.60
KMT2A Q03164 1/20 0.60
MAPT P10636 1/20 0.60
LPAR5 Q9H1C0 1/20 0.56
CES2 O00748 2/20 0.56
TSHR P16473 2/20 0.52
CYP3A4 P08684 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phosphoric Acid SCHEMBL29448223 1.00 LPAR3 (0.64) LPAR3LPAR2LPAR1MEN1THRB
Phosphoric Acid SCHEMBL571233 1.00 LPAR3 (0.64) LPAR3LPAR2LPAR1MEN1THRB
Phosphoric Acid SCHEMBL28649671 1.00 LPAR3 (0.64) LPAR3LPAR2LPAR1MEN1THRB
Phosphoric Acid SCHEMBL2834959 1.00 LPAR3 (0.64) LPAR3LPAR2LPAR1MEN1THRB
Phosphoric Acid SCHEMBL2836099 1.00 LPAR3 (0.64) LPAR3LPAR2LPAR1MEN1THRB
Phosphoric Acid SCHEMBL30585176 1.00 LPAR3 (0.64) LPAR3LPAR2LPAR1MEN1THRB
Phosphoric Acid SCHEMBL350762 1.00 LPAR3 (0.64) LPAR3LPAR2LPAR1MEN1THRB
Phosphoric Acid SCHEMBL11362386 1.00 LPAR3 (0.64) LPAR3LPAR2LPAR1MEN1THRB
Phosphoric Acid SCHEMBL8707171 1.00 LPAR3 (0.64) LPAR3LPAR2LPAR1MEN1THRB
Phosphoric Acid SCHEMBL29977560 1.00 LPAR3 (0.64) LPAR3LPAR2LPAR1MEN1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114144438-B Method for producing acrylate rubber 株式会社大阪曹達 2024-08-02 CN disclosed
CN-116891655-A Inkjet ink composition and ink container 精工爱普生株式会社 2023-10-17 CN disclosed
CN-115485431-B Treatment agent for synthetic fibers, and method for treating synthetic fibers 竹本油脂株式会社 2023-09-26 CN disclosed
CN-114207210-B Fiber treating agent for nonwoven fabric 三吉油脂株式会社 2023-09-19 CN disclosed
CN-114072552-B Treatment agent for sewing thread and sewing thread 竹本油脂株式会社 2023-08-29 CN disclosed
EP-4177056-A1 POWDER FOR POWDER LAMINATE MOLDING METHOD, POWDER LAMINATE MOLDING METHOD, AND MOLDED ARTICLE Mitsubishi Chemical Corporation (JP) 2023-05-10 EP disclosed
CN-110892108-B Fiber treatment agent for nonwoven fabric and nonwoven fabric using same 三吉油脂株式会社 2022-10-25 CN disclosed
CN-114207210-A Fiber treatment agent for nonwoven fabric 三吉油脂株式会社 2022-03-18 CN disclosed
CN-109196163-B Long fiber nonwoven fabric 花王株式会社 2022-03-11 CN disclosed
CN-114144438-A Method for producing acrylate rubber 株式会社大阪曹達 2022-03-04 CN disclosed
US-20080119551-A1 SKIN COSMETICS COMPRISING A CYSTINE DERIVATIVE AND A CHEMICAL PEELING AGENT, A BACTERICIDE, AN ANIONIC SUFACTANT, OR A CATIONIC SURFACTANT AJINOMOTO CO. INC (JP) 2008-05-22 US disclosed
CN-100386399-C Polishing composition KAO CORP (JP) 2008-05-07 CN disclosed
CN-101173160-A Roll-off reducing agent KAO CORP (JP) 2008-05-07 CN disclosed
CN-1200667-C Gel composition and nail-beautifying cosmetic SHISEIDO CO LTD (JP) 2005-05-11 CN disclosed
US-20040156802-A1 Cosmetics or external preparations for skin AJINOMOTO CO., INC. (JP) 2004-08-12 US disclosed
CN-1144848-C Preparation method for shear-thinning water-based ball-point pen inks shear-thinning water-based ball-point pen ink compositions, and ball-point pens employing the same ����Ī�����ɷ����޹�˾ 2004-04-07 CN disclosed
CN-1475541-A Polishing composition ������������ʽ���� 2004-02-18 CN disclosed
EP-1374831-A1 COMSETICS OR EXTERNAL PREPARAIOTNS FOR SKIN Ajinomoto Co., Inc. (JP) 2004-01-02 EP disclosed
CN-1386062-A Gel composition and nail beautifier SHISEIDO CO LTD (JP) 2002-12-18 CN disclosed
CN-1162610-A Preparation method for shear-thinning water-based ball-point pen inks shear-thinning water-based ball-point pen ink compositions, and ball-point pens employing the same PILOT INK CO LTD (JP) 1997-10-22 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040156802-A1 Cosmetics or external preparations for skin CUTA, PSAP, CTH LPAR3 1024/4885LPAR2 1133/4885LPAR1 843/4885
US-20080119551-A1 SKIN COSMETICS COMPRISING A CYSTINE DERIVATIVE AND A CHEMICAL PEELING AGENT, A BACTERICIDE, AN ANIONIC SUFACTANT, OR A CATIONIC SURFACTANT CUTA, CTH, SRM LPAR3 1638/4885LPAR2 1883/4885LPAR1 951/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.