Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 1/20 | 0.36 |
| ▸ | FDPS | P14324 | 5/20 | 0.34 |
| ▸ | GGPS1 | O95749 | 3/20 | 0.34 |
| ▸ | NAAA | Q02083 | 1/20 | 0.34 |
| ▸ | DGKA | P23743 | 1/20 | 0.34 |
| ▸ | SMPD1 | P17405 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4935899 | 0.94 | CA1 (0.33) | CES2FDPSNAAADGKA | |
| SCHEMBL4935949 | 0.86 | LMNA (0.35) | — | |
| SCHEMBL4934053 | 0.83 | CES2 (0.35) | CES2FDPSGGPS1NAAADGKA | |
| SCHEMBL27933280 | 0.82 | NAAA (0.48) | CES2FDPSGGPS1NAAADGKA | |
| SCHEMBL4742236 | 0.81 | LMNA (0.34) | CES2FDPSGGPS1NAAADGKA | |
| SCHEMBL8346418 | 0.81 | SMPD1 (0.44) | CES2FDPSGGPS1NAAADGKA | |
| SCHEMBL8041219 | 0.81 | DGKA (0.52) | CES2DGKAMEN1MAPTKMT2A | |
| SCHEMBL29227001 | 0.81 | DGKA (0.52) | CES2DGKAMEN1MAPTKMT2A | |
| SCHEMBL8343989 | 0.81 | SMPD1 (0.44) | CES2FDPSGGPS1NAAADGKA | |
| SCHEMBL20486101 | 0.81 | DGKA (0.42) | CES2DGKAMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6916543-B2 | Copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-07-12 | — | — | US | claimed |
| US-20040137362-A1 | Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. | 2004-07-15 | — | — | US | claimed |
| US-20080199805-A1 | PHOTOSENSITIVE COMPOSITIONS EMPLOYING SILICON-CONTAINING ADDITIVES | FUJIFILM ELECTRONIC MATERIALS. U.S.A., INC. | 2008-08-21 | — | — | US | disclosed |
| US-6916543-B2 | Copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-07-12 | — | — | US | disclosed |
| US-20040137362-A1 | Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. | 2004-07-15 | — | — | US | disclosed |