SCHEMBL4941100

SCHEMBL4941100

CCCC(N)OC(=O)C(C)O

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
METAP1 P53582 2/20 0.35
GRIK1 P39086 1/20 0.34
SLC1A3 P43003 1/20 0.34
SLC1A2 P43004 1/20 0.34
SLC1A1 P43005 1/20 0.34
GRIK2 Q13002 1/20 0.34
CHRM1 P11229 1/20 0.33
AKR1A1 P14550 1/20 0.33
CHRM3 P20309 1/20 0.33
HTR2A P28223 1/20 0.33
HTR2C P28335 1/20 0.33
ADRA1A P35348 1/20 0.33
HRH1 P35367 1/20 0.33
DRD3 P35462 1/20 0.33
SLC6A3 Q01959 1/20 0.33
HDAC1 Q13547 1/20 0.33
HDAC2 Q92769 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
CA1 P00915 2/20 0.32
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11111710 0.85 GRIK1 (0.35) METAP1GRIK1SLC1A3SLC1A2SLC1A1
SCHEMBL5596114 0.85 SPHK1 (0.48) GRIK1SLC1A2SLC1A1GRIK2CA1
SCHEMBL10968809 0.85 SPHK1 (0.48) GRIK1SLC1A2SLC1A1GRIK2CA1
SCHEMBL28115952 0.85 SPHK1 (0.48) GRIK1SLC1A2SLC1A1GRIK2CA1
SCHEMBL9569085 0.82 GABRP (0.34) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL9013592 0.78 CHRM1 (0.36) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL4530794 0.78 FAAH (0.44) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL4530674 0.78 CTSK (0.40) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL3626496 0.78 HTT (0.41) SPHK1CYP3A4FAAHMAPT
SCHEMBL9480412 0.78 SLC1A2 (0.39) METAP1GRIK1SLC1A3SLC1A2SLC1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080242091-A1 METAL-POLISHING LIQUID AND POLISHING METHOD FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080206995-A1 METAL-POLISHING LIQUID AND POLISHING METHOD THEREWITH FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
CN-1055681-C Novel 1,3-dialkylurea derivativa having hydroxyl group SANTAN PHARMACEUTICAL CO LTD (JP) 2000-08-23 CN disclosed