⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1069898 | 0.74 | — | — | |
| SCHEMBL8306444 | 0.74 | — | — | |
| SCHEMBL31393398 | 0.72 | — | — | |
| SCHEMBL18262323 | 0.62 | CHRNB2 (0.30) | — | |
| SCHEMBL9843327 | 0.61 | — | — | |
| SCHEMBL5595562 | 0.58 | SIGMAR1 (0.33) | — | |
| SCHEMBL26638 | 0.58 | SIGMAR1 (0.33) | — | |
| SCHEMBL4376036 | 0.58 | — | — | |
| SCHEMBL1067931 | 0.58 | SIGMAR1 (0.33) | — | |
| SCHEMBL9093836 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3045485-B1 | POLYISOCYANATE MODIFIED WITH SULPHAMIC ACID, PREPARATION METHOD THEREFOR AND USE THEREOF | WANHUA CHEMICAL GROUP CO LTD (CN) | 2020-03-25 | — | — | EP | claimed |
| US-9975985-B2 | Polyisocyanate modified with sulphamic acid, preparation method thereof and use thereof | WANHUA CHEMICAL GROUP CO., LTD. (CN) | 2018-05-22 | — | — | US | claimed |
| US-20160280836-A1 | POLYISOCYANATE MODIFIED WITH SULPHAMIC ACID, PREPARATION METHOD THEREOF AND USE THEREOF | WANHUA CHEMICAL GROUP CO., LTD. (CN) | 2016-09-29 | — | — | US | claimed |
| EP-3045485-A1 | POLYISOCYANATE MODIFIED WITH SULPHAMIC ACID, PREPARATION METHOD THEREFOR AND USE THEREOF | Wanhua Chemical Group Co., Ltd. (CN) | 2016-07-20 | — | — | EP | claimed |
| CN-104448232-A | Sulfamic acid modified polyisocyanate and preparation method and application thereof | WANHUA CHEMICAL GROUP CO LTD | 2015-03-25 | — | — | CN | claimed |
| US-20120149921-A1 | TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2012-06-14 | — | — | US | claimed |
| EP-3045485-B1 | POLYISOCYANATE MODIFIED WITH SULPHAMIC ACID, PREPARATION METHOD THEREFOR AND USE THEREOF | WANHUA CHEMICAL GROUP CO LTD (CN) | 2020-03-25 | — | — | EP | disclosed |
| CN-110003199-A | Novel compound, material for organic electroluminescent element, and electronic device | 出光兴产株式会社 | 2019-07-12 | — | — | CN | disclosed |
| CN-105555785-B | 2, 3-dihydrobenzofuran-5-yl compounds as DYRK kinase inhibitors | 4SC股份公司 | 2019-03-01 | — | — | CN | disclosed |
| CN-104603137-B | Novel compound, material for organic electroluminescent element, and electronic device | 出光兴产株式会社 | 2019-01-04 | — | — | CN | disclosed |
| US-9975985-B2 | Polyisocyanate modified with sulphamic acid, preparation method thereof and use thereof | WANHUA CHEMICAL GROUP CO., LTD. (CN) | 2018-05-22 | — | — | US | disclosed |
| US-20160280836-A1 | POLYISOCYANATE MODIFIED WITH SULPHAMIC ACID, PREPARATION METHOD THEREOF AND USE THEREOF | WANHUA CHEMICAL GROUP CO., LTD. (CN) | 2016-09-29 | — | — | US | disclosed |
| EP-3045485-A1 | POLYISOCYANATE MODIFIED WITH SULPHAMIC ACID, PREPARATION METHOD THEREFOR AND USE THEREOF | Wanhua Chemical Group Co., Ltd. (CN) | 2016-07-20 | — | — | EP | disclosed |
| CN-105555785-A | 2,3-dihydrobenzofuran-5-yl compounds as DYRK kinase inhibitors | 4SC DISCOVERY GMBH | 2016-05-04 | — | — | CN | disclosed |
| CN-104603137-A | Novel compound, material for organic electroluminescent element, and electronic device | IDEMITSU KOSAN CO | 2015-05-06 | — | — | CN | disclosed |
| CN-104448232-A | Sulfamic acid modified polyisocyanate and preparation method and application thereof | WANHUA CHEMICAL GROUP CO LTD | 2015-03-25 | — | — | CN | disclosed |
| US-8541606-B2 | Tertiary alcohol derivative, polymer compound and photoresist composition | KURARAY CO., LTD. (JP) | 2013-09-24 | — | — | US | disclosed |
| US-20120149921-A1 | TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| US-8105746-B2 | Tertiary alcohol derivative, polymer compound and photoresist composition | KURARAY CO., LTD. (JP) | 2012-01-31 | — | — | US | disclosed |
| US-20090029290-A1 | TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2009-01-29 | — | — | US | disclosed |