Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TRPA1 | O75762 | 2/20 | 0.35 |
| ▸ | TRPM8 | Q7Z2W7 | 2/20 | 0.35 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4951221 | 0.78 | EPHX1 (0.31) | EPHX1 | |
| SCHEMBL4946413 | 0.77 | TRPA1 (0.36) | TRPA1TRPM8EPHX1 | |
| SCHEMBL15462830 | 0.71 | TRPA1 (0.46) | TRPA1TRPM8EPHX1 | |
| SCHEMBL11302025 | 0.71 | TRPA1 (0.46) | TRPA1TRPM8EPHX1 | |
| SCHEMBL15454324 | 0.71 | TRPA1 (0.46) | TRPA1TRPM8EPHX1 | |
| SCHEMBL112754 | 0.71 | TRPA1 (0.46) | TRPA1TRPM8EPHX1 | |
| SCHEMBL11304709 | 0.71 | TRPA1 (0.46) | TRPA1TRPM8EPHX1 | |
| SCHEMBL28967853 | 0.70 | TRPM8 (0.47) | TRPM8 | |
| SCHEMBL7488421 | 0.70 | — | — | |
| SCHEMBL3198543 | 0.70 | EPHX1 (0.30) | EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7470499-B2 | Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition | NEC CORPORATION (JP) | 2008-12-30 | — | — | US | disclosed |
| US-7232639-B2 | Monomer having fluorine-containing acetal or ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the same | NEC CORPORATION (JP) | 2007-06-19 | — | — | US | disclosed |
| US-7192682-B2 | Unsaturated monomers, polymers, chemically-amplified resist composition, and process of pattern formation | NEC CORPORATION (JP) | 2007-03-20 | — | — | US | disclosed |
| US-20060073408-A1 | Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition | NEC CORPORATION (JP) | 2006-04-06 | — | — | US | disclosed |
| US-20050164119-A1 | Monomer having fluorine-containing acetalor ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the same | NEC CORPORATION (JP) | 2005-07-28 | — | — | US | disclosed |
| US-20040265732-A1 | Unsaturated monomers, polymers, chemically amplified resist composition, and process of pattern formation | NEC CORPORATION (JP) | 2004-12-30 | — | — | US | disclosed |
| US-6710188-B2 | VINYL COPOLYMER HAVING 3-OXO-4-OXABICYCLO(3.2.1)OCTANE-2-YL GROUP | NEC CORPORATION (JP) | 2004-03-23 | — | — | US | disclosed |
| US-20030224297-A1 | Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer | NEC CORPORATION | 2003-12-04 | — | — | US | disclosed |
| US-6639084-B2 | Comprises vinyl polymer having 3-oxo-4-oxabicyclo(3.2.1) octane-2-yl group; sensitive to far-ultraviolet light; imaging; for use with semiconductor wafers; improved resistance against dry etching and adhesion to substrates | NEC CORPORATION (JP) | 2003-10-28 | — | — | US | disclosed |
| US-20030097008-A1 | Chemical amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer | NEC CORPORATION | 2003-05-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030097008-A1 | Chemical amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer | LIG1, OXGR1, ITGA1 | TRPA1 2015/4885TRPM8 3687/4885EPHX1 3199/4885 |
| US-20030224297-A1 | Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer | LIG1, LIG4, OXGR1 | TRPA1 2614/4885TRPM8 4157/4885EPHX1 2986/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.