Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 3/20 | 0.41 |
| ▸ | CES1 | P23141 | 3/20 | 0.41 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.39 |
| ▸ | PPARG | P37231 | 7/20 | 0.39 |
| ▸ | PPARD | Q03181 | 7/20 | 0.39 |
| ▸ | PPARA | Q07869 | 7/20 | 0.39 |
| ▸ | HDAC11 | Q96DB2 | 5/20 | 0.39 |
| ▸ | TSHR | P16473 | 5/20 | 0.39 |
| ▸ | PTPN1 | P18031 | 3/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | TLR2 | O60603 | 2/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | FABP4 | P15090 | 2/20 | 0.39 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.39 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | ESR1 | P03372 | 1/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | PDE4A | P27815 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL845976 | 1.00 | CES2 (0.41) | CES2CES1GPR84PPARGPPARD | |
| SCHEMBL25438937 | 1.00 | CES2 (0.41) | CES2CES1GPR84PPARGPPARD | |
| SCHEMBL845975 | 1.00 | CES2 (0.41) | CES2CES1GPR84PPARGPPARD | |
| SCHEMBL5520436 | 0.91 | CES1 (0.36) | CES2CES1ALDH1A1 | |
| SCHEMBL5520433 | 0.91 | CES1 (0.36) | CES2CES1ALDH1A1 | |
| SCHEMBL28340663 | 0.88 | CES2 (0.45) | CES2CES1GPR84PPARGPPARD | |
| SCHEMBL28629832 | 0.86 | CES2 (0.43) | CES2CES1GPR84PPARGPPARD | |
| SCHEMBL22660835 | 0.86 | NAAA (0.46) | CES2CES1GPR84PPARGPPARD | |
| SCHEMBL28642380 | 0.86 | GPR84 (0.47) | CES2CES1GPR84PPARGPPARD | |
| SCHEMBL25421551 | 0.86 | NAAA (0.46) | CES2CES1GPR84PPARGPPARD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0565798-B2 | Ultraviolet radiation-curable coatings for optical fibers and optical fibers coated therewith | BORDEN CHEM INC (US) | 2001-03-07 | — | — | EP | claimed |
| US-6174933-B1 | SUITABLE FOR USE IN PRESSURE SENSITIVE ADHESIVES | ISP INVESTMENTS INC. | 2001-01-16 | — | — | US | claimed |
| EP-0565798-B1 | Ultraviolet radiation-curable coatings for optical fibers and optical fibers coated therewith | BORDEN INC (US) | 1998-01-14 | — | — | EP | claimed |
| US-5639846-A | BASED ON A REACTIVELY TERMINATED URETHANE OLIGOMER AND A HYDROCARBON MONOMER TERMINATED WITH AN END GROUP CAPABLE OF REACTING WITH THE TERMINUS OF THE OLIGOMER | BORDEN, INC. (US) | 1997-06-17 | — | — | US | claimed |
| US-5352712-A | Modified polyurethane | BORDEN, INC. (US) | 1994-10-04 | — | — | US | claimed |
| EP-0565798-A1 | Ultraviolet radiation-curable coatings for optical fibers and optical fibers coated therewith | BORDEN, INC. (US) | 1993-10-20 | — | — | EP | claimed |
| US-20180120706-A1 | PATTERN FORMING METHOD, LAMINATE, AND RESIST COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT | FUJIFILM CORPORATION (JP) | 2018-05-03 | — | — | US | disclosed |
| EP-1433832-B1 | PHOSPHORUS-CONTAINING CARBOXYLIC ACID DERIVATIVES,PROCESS FOR PREPARATION THEREOF, AND FLAME RETARDANTS | NOF CORP (JP) | 2013-11-13 | — | — | EP | disclosed |
| US-20110046293-A1 | Light diffusion film, anti-reflection film, polarizing plate and image | FUJIFILM CORPORATION (JP) | 2011-02-24 | — | — | US | disclosed |
| US-20080160449-A1 | Photoresist polymer having nano-smoothness and etching resistance, and resist composition | LION CORPORATION (JP) | 2008-07-03 | — | — | US | disclosed |
| US-7315341-B2 | Liquid crystal display device with retardation layer with different relative humidity | FUJIFILM CORPORATION (JP) | 2008-01-01 | — | — | US | disclosed |
| US-20070148585-A1 | Hyperbranched polymer, production method therefor and resist composition containing hyperbranched polymer | LION CORPORATION. | 2007-06-28 | — | — | US | disclosed |
| US-7186784-B2 | Phosphorus-containing carboxylic acid derivatives process for preparations thereof and flame retardant | NOF CORPORATION (JP) | 2007-03-06 | — | — | US | disclosed |
| US-6090531-A | UNDERGOES NO INTERMIXING WITH THE RESIST LAYER, PROVIDES AN EXCELLENT RESIST PATTERN AND SHOWS A HIGHER DRY ETCHING RATE THAN RESIST AND A RESIST PATTERN FORMATION PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2000-07-18 | — | — | US | disclosed |
| JP-2000044887-A | UV CURABLE PRESSURE SENSITIVE ADHESIVE | NATL STARCH & CHEM INVESTMENT HOLDING CORP | 2000-02-15 | — | — | JP | disclosed |
| EP-0823661-A1 | Composition for anti-reflective coating material | FUJI PHOTO FILM CO., LTD. (JP) | 1998-02-11 | — | — | EP | disclosed |
| US-5705329-A | SUPPORT WITH PHOTOGRAPHIC MATERIAL, POLYMER LAYER AND SILVER HALIDE EMULSION LAYER | KONICA CORPORATION (JP) | 1998-01-06 | — | — | US | disclosed |
| EP-0706082-A1 | A silver halide photographic light-sensitive material | KONICA CORPORATION (JP) | 1996-04-10 | — | — | EP | disclosed |
| US-4542093-A | BUTADIENE-STYRENE POLYMER, GELATIN, MTHYL CELLULOSE, POLYVINYL ALCOHOL | FUJI PHOTO FILM CO., LTD. (JP) | 1985-09-17 | — | — | US | disclosed |
| US-4197132-A | Photopolymer photoresist composition containing rosin tackifier adhesion improver and chlorinated polyolefin | FUJI PHOTO FILM CO., LTD. (JP) | 1980-04-08 | — | — | US | disclosed |