SCHEMBL5520436

SCHEMBL5520436

CCC=C(CCCC)OC(=CCC)CCCC

nearest known ligand 0.36

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
CES1 P23141 2/20 0.36
CES2 O00748 1/20 0.36
ALDH1A1 P00352 2/20 0.33
TP53 P04637 1/20 0.33
CA1 P00915 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5520433 1.00 CES1 (0.36) CES1CES2ALDH1A1TP53CA1
SCHEMBL25438937 0.91 CES2 (0.41) CES1CES2ALDH1A1
SCHEMBL845976 0.91 CES2 (0.41) CES1CES2ALDH1A1
SCHEMBL845975 0.91 CES2 (0.41) CES1CES2ALDH1A1
SCHEMBL4947180 0.91 CES2 (0.41) CES1CES2ALDH1A1
SCHEMBL4433667 0.85 CES1 (0.39) CES1CES2ALDH1A1TP53CA1
SCHEMBL11394611 0.84 ALDH1A1 (0.38) CES1CES2ALDH1A1
SCHEMBL11394615 0.84 ALDH1A1 (0.38) CES1CES2ALDH1A1
SCHEMBL7076109 0.83 ALDH1A1 (0.35) CES1CES2ALDH1A1TP53CA1
SCHEMBL7076108 0.83 ALDH1A1 (0.35) CES1CES2ALDH1A1TP53CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12410333-B2 Inkjet ink NORITAKE CO., LIMITED (JP) 2025-09-09 US disclosed
US-12122860-B2 Photocurable support material composition for inkjet 3D printers, ink for inkjet 3D printers, cartridge for inkjet 3D printers, method for producing support material and method for producing optically shaped article NIPPON SHOKUBAI CO., LTD. (JP) 2024-10-22 US disclosed
US-11981824-B2 Photocurable composition for support materials for inkjet 3D printers, ink, cartridge, method for producing support material, and method for producing optically shaped article NIPPON SHOKUBAI CO., LTD. (JP) 2024-05-14 US disclosed
EP-3760413-B1 PHOTOCURABLE COMPOSITION FOR SUPPORT MATERIALS FOR INKJET 3D PRINTERS, INK, CARTRIDGE, METHOD FOR PRODUCING SUPPORT MATERIAL, AND METHOD FOR PRODUCING OPTICALLY SHAPED ARTICLE NIPPON CATALYTIC CHEM IND (JP) 2023-09-27 EP disclosed
EP-3508335-B1 PHOTOCURABLE SUPPORT MATERIAL COMPOSITION FOR INKJET 3D PRINTERS, INK FOR INKJET 3D PRINTERS, CARTRIDGE FOR INKJET 3D PRINTERS, METHOD FOR PRODUCING SUPPORT MATERIAL AND METHOD FOR PRODUCING OPTICALLY SHAPED ARTICLE NIPPON CATALYTIC CHEM IND (JP) 2023-02-01 EP disclosed
US-20220089893-A1 INKJET INK NORITAKE CO., LIMITED (JP) 2022-03-24 US disclosed
US-20210047530-A1 PHOTOCURABLE COMPOSITION FOR SUPPORT MATERIALS FOR INKJET 3D PRINTERS, INK, CARTRIDGE, METHOD FOR PRODUCING SUPPORT MATERIAL, AND METHOD FOR PRODUCING OPTICALLY SHAPED ARTICLE NIPPON SHOKUBAI CO., LTD. (JP) 2021-02-18 US disclosed
EP-3760413-A1 COMPOSITION FOR PHOTOCURABLE SUPPORT MATERIALS FOR INKJET 3D PRINTERS, INK, CARTRIDGE, METHOD FOR PRODUCING SUPPORT MATERIAL, AND METHOD FOR PRODUCING OPTICALLY SHAPED ARTICLE Nippon Shokubai Co., Ltd. (JP) 2021-01-06 EP disclosed
US-20190241684-A1 PHOTOCURABLE SUPPORT MATERIAL COMPOSITION FOR INKJET 3D PRINTERS, INK FOR INKJET 3D PRINTERS, CARTRIDGE FOR INKJET 3D PRINTERS, METHOD FOR PRODUCING SUPPORT MATERIAL AND METHOD FOR PRODUCING OPTICALLY SHAPED ARTICLE NIPPON SHOKUBAI CO., LTD. (JP) 2019-08-08 US disclosed
EP-3508335-A1 PHOTOCURABLE SUPPORT MATERIAL COMPOSITION FOR INKJET 3D PRINTERS, INK FOR INKJET 3D PRINTERS, CARTRIDGE FOR INKJET 3D PRINTERS, METHOD FOR PRODUCING SUPPORT MATERIAL AND METHOD FOR PRODUCING OPTICALLY SHAPED ARTICLE Nippon Shokubai Co., Ltd. (JP) 2019-07-10 EP disclosed
CN-101196688-B Photosensitive resin composition and spacer for liquid crystal panel TOKYO OHKA KOGYO CO LTD 2012-05-30 CN disclosed
CN-101196688-A Photosensitive resin composition and spacer for liquid crystal panel TOKYO OHKA KOGYO CO LTD (JP) 2008-06-11 CN disclosed
US-7241857-B2 Method for producing allyl compound, and ether or ester compound produced thereby MITSUBISHI CHEMICAL CORPORATION (JP) 2007-07-10 US disclosed
US-7173157-B2 Method for producing an allyl compound MITSUBISHI CHEMICAL CORPORATION (JP) 2007-02-06 US disclosed
US-7119222-B2 Method for producing allyl compound, and ether or ester compound produced thereby MITSUBISHI CHEMICAL CORPORATION (JP) 2006-10-10 US disclosed
US-20060106181-A1 Method for producing allyl compound, and ether or ester compound produced thereby MITSUBISHI CHEMICAL CORPORATION (JP) 2006-05-18 US disclosed
US-20050075518-A1 Method for producing allyl compound, and allyl compound produced thereby MITSUBISHI CHEMICAL CORPORATION (JP) 2005-04-07 US disclosed
US-20040147757-A1 Method for producing allyl compound, and ether or ester compound produced thereby MITSUBISHI CHEMICAL CORPORATION (JP) 2004-07-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20060106181-A1 Method for producing allyl compound, and ether or ester compound produced thereby AGPAT5, TST, AGPAT2 CES1 1607/4885CES2 852/4885ALDH1A1 1665/4885
US-20040147757-A1 Method for producing allyl compound, and ether or ester compound produced thereby AGPAT5, TST, AGPAT2 CES1 1607/4885CES2 852/4885ALDH1A1 1665/4885
US-20050075518-A1 Method for producing allyl compound, and allyl compound produced thereby CCNT1, AOC3, ATL3 CES1 2177/4885CES2 2992/4885ALDH1A1 790/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.