Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 4/20 | 0.41 |
| ▸ | GABRB2 | P47870 | 4/20 | 0.41 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.31 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.31 |
| ▸ | MGLL | Q99685 | 1/20 | 0.31 |
| ▸ | BRD4 | O60885 | 1/20 | 0.30 |
| ▸ | CREBBP | Q92793 | 1/20 | 0.30 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.30 |
| ▸ | SCN5A | Q14524 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16954864 | 0.86 | GABRA1 (0.38) | GABRA1GABRB2 | |
| SCHEMBL4949097 | 0.84 | CYP2E1 (0.32) | GABRA1GABRB2 | |
| SCHEMBL4952215 | 0.81 | LIPG (0.36) | KCNH2 | |
| SCHEMBL29456692 | 0.80 | GABRA1 (0.46) | GABRA1GABRB2FFAR1MGLL | |
| SCHEMBL4953056 | 0.80 | GABRA1 (0.46) | GABRA1GABRB2FFAR1MGLL | |
| SCHEMBL8950372 | 0.79 | TDP1 (0.31) | — | |
| SCHEMBL1514985 | 0.77 | CYP1A1 (0.32) | BRD4CREBBP | |
| SCHEMBL2910051 | 0.75 | GABRA1 (0.41) | GABRA1GABRB2FFAR1MGLL | |
| SCHEMBL16957408 | 0.75 | GABRA1 (0.42) | GABRA1GABRB2 | |
| SCHEMBL6562962 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7439315-B2 | Polymer film and method for producing the same | NEC CORPORATION (JP) | 2008-10-21 | — | — | US | disclosed |
| US-20060052560-A1 | Polymer film and method for producing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-03-09 | — | — | US | disclosed |
| US-20050059788-A1 | Supplying raw material gas containing acetylenic compound in chamber under low pressure; activation of gas in plasma generated reaction chamber, depositing on surface of semiconductor; addition polymerization; high mechanical strength | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-03-17 | — | — | US | disclosed |
| US-3933957-A | Process for producing shaped articles from an acetylenic polymer | GENERAL ELECTRIC COMPANY (US) | 1976-01-20 | — | — | US | disclosed |