Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2E1 | P05181 | 1/20 | 0.32 |
| ▸ | CYP2C8 | P10632 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | CYP2B6 | P20813 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | DAO | P14920 | 1/20 | 0.32 |
| ▸ | GRM5 | P41594 | 1/20 | 0.30 |
| ▸ | GABRA1 | P14867 | 2/20 | 0.30 |
| ▸ | GABRB2 | P47870 | 2/20 | 0.30 |
| ▸ | HTR1A | P08908 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4952215 | 0.89 | LIPG (0.36) | CYP2D6CYP2C9 | |
| SCHEMBL16955542 | 0.87 | — | — | |
| SCHEMBL4951389 | 0.84 | GABRA1 (0.41) | GABRA1GABRB2 | |
| SCHEMBL2746384 | 0.82 | FFAR1 (0.39) | CYP2D6CYP2C9CYP2C19GRM5 | |
| SCHEMBL2152995 | 0.82 | CYP2E1 (0.38) | CYP2E1CYP2C8CYP2D6CYP2A6CYP2C9 | |
| SCHEMBL24767383 | 0.79 | CTSL (0.33) | CYP2E1CYP2C8CYP2D6CYP2A6CYP2C9 | |
| SCHEMBL16956454 | 0.77 | DAO (0.33) | DAOGABRA1GABRB2HTR1A | |
| SCHEMBL16951205 | 0.75 | MITF (0.33) | DAOGABRA1GABRB2HTR1A | |
| SCHEMBL28742995 | 0.74 | CLCN2 (0.42) | — | |
| SCHEMBL27518648 | 0.74 | BID (0.48) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7439315-B2 | Polymer film and method for producing the same | NEC CORPORATION (JP) | 2008-10-21 | — | — | US | disclosed |
| US-20060052560-A1 | Polymer film and method for producing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-03-09 | — | — | US | disclosed |
| US-20050059788-A1 | Supplying raw material gas containing acetylenic compound in chamber under low pressure; activation of gas in plasma generated reaction chamber, depositing on surface of semiconductor; addition polymerization; high mechanical strength | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-03-17 | — | — | US | disclosed |