Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 7/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 6/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.50 |
| ▸ | MAPT | P10636 | 7/20 | 0.48 |
| ▸ | MEN1 | O00255 | 5/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.48 |
| ▸ | HTT | P42858 | 3/20 | 0.48 |
| ▸ | LMNA | P02545 | 2/20 | 0.48 |
| ▸ | HPGD | P15428 | 2/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.48 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.42 |
| ▸ | MMP14 | P50281 | 1/20 | 0.42 |
| ▸ | GFER | P55789 | 2/20 | 0.41 |
| ▸ | THRB | P10828 | 2/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
| ▸ | FGR | P09769 | 1/20 | 0.40 |
| ▸ | PIM1 | P11309 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11604108 | 0.86 | THRB (0.52) | GAAKDM4EALDH1A1MAPTMEN1 | |
| SCHEMBL10876607 | 0.86 | GAA (0.43) | GAAKDM4EALDH1A1MAPTMEN1 | |
| SCHEMBL8080141 | 0.82 | ALDH3A1 (0.37) | GAAKDM4EALDH1A1MAPTMEN1 | |
| SCHEMBL10874373 | 0.82 | MAPT (0.46) | GAAKDM4EALDH1A1MAPTMEN1 | |
| SCHEMBL10877705 | 0.82 | DHODH (0.37) | GAAKDM4EALDH1A1MAPTMEN1 | |
| SCHEMBL30918998 | 0.81 | ADORA2A (0.63) | GAAKDM4EALDH1A1MAPTMEN1 | |
| SCHEMBL29527792 | 0.81 | ADORA2A (0.63) | GAAKDM4EALDH1A1MAPTMEN1 | |
| SCHEMBL169365 | 0.81 | ADORA2A (0.63) | GAAKDM4EALDH1A1MAPTMEN1 | |
| SCHEMBL5870790 | 0.79 | CTDSP1 (0.46) | GAAKDM4EALDH1A1MAPTMEN1 | |
| SCHEMBL10875079 | 0.79 | EGFR (0.44) | GAAKDM4EALDH1A1MAPTMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1944332-B1 | Method of modifying surface layer of molded resin | NAT INST OF ADVANCED IND SCIEN (JP) | 2012-08-08 | — | — | EP | disclosed |
| EP-1944332-A2 | Modification method of surface layer of molded resin article, and modification apparatus of surface layer of molded resin article | National Institute of Advanced Industrial Science and Technology (JP) | 2008-07-16 | — | — | EP | disclosed |
| US-20060156986-A1 | Modification method of surface layer of molded resin article, and modification apparatus of surface layer of molded resin article | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2006-07-20 | — | — | US | disclosed |
| US-7078072-B1 | Method of modifying surface layer of molded resin and apparatus for modifying surface layer of molded resin | NATIONAL INSTITUE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2006-07-18 | — | — | US | disclosed |
| US-7041332-B2 | Modification method of surface layer of molded resin article, and modification apparatus of surface layer of molded resin article | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2006-05-09 | — | — | US | disclosed |
| US-20040195206-A1 | Modification method of surface layer of molded resin article, and modification apparatus of surface layer of molded resin article | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2004-10-07 | — | — | US | disclosed |
| EP-1179558-A1 | METHOD OF MODIFYING SURFACE LAYER OF MOLDED RESIN AND APPARATUS FOR MODIFYING SURFACE LAYER OF MOLDED RESIN | Japan as represented by Secretary of Agency of Industrial Science and Technology (JP) | 2002-02-13 | — | — | EP | disclosed |
| US-6136719-A | Method and arrangement for fabricating a semiconductor device | LSI LOGIC CORPORATION (US) | 2000-10-24 | — | — | US | disclosed |
| US-5643700-A | Photoresist composition and method of exposing photoresist | SONY CORPORATION (JP) | 1997-07-01 | — | — | US | disclosed |