SCHEMBL5870790

SCHEMBL5870790

CCOc1ccc(Nc2ccc(N)c3c2C(=O)C(C#N)=C(C#N)C3=O)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CTDSP1 Q9GZU7 1/20 0.46
▸ P2RY2 P41231 1/20 0.45
▸ MAPT P10636 5/20 0.42
▸ MEN1 O00255 3/20 0.42
▸ KMT2A Q03164 3/20 0.42
▸ GAA P10253 2/20 0.42
▸ TSHR P16473 2/20 0.42
▸ NPSR1 Q6W5P4 1/20 0.42
▸ NPC1 O15118 1/20 0.41
▸ RAB9A P51151 1/20 0.41
▸ ALDH1A1 P00352 4/20 0.40
▸ KDM4E B2RXH2 3/20 0.40
▸ HPGD P15428 3/20 0.40
▸ MAPK1 P28482 2/20 0.40
▸ HTT P42858 2/20 0.40
▸ NSD2 O96028 1/20 0.40
▸ LMNA P02545 1/20 0.40
▸ TDP1 Q9NUW8 1/20 0.40
▸ L3MBTL1 Q9Y468 1/20 0.40
▸ HSD17B10 Q99714 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10874373 0.86 MAPT (0.46) P2RY2MAPTMEN1KMT2AGAA
SCHEMBL10876607 0.82 GAA (0.43) P2RY2MAPTMEN1KMT2AGAA
SCHEMBL10875079 0.81 EGFR (0.44) MAPTMEN1KMT2AGAATSHR
SCHEMBL9620305 0.80 KDM4E (0.52) CTDSP1P2RY2MAPTMEN1KMT2A
SCHEMBL10875619 0.80 HPGD (0.42) MAPTMEN1KMT2ANPSR1NPC1
SCHEMBL4956416 0.79 GAA (0.50) P2RY2MAPTMEN1KMT2AGAA
SCHEMBL8080141 0.79 ALDH3A1 (0.37) MAPTMEN1KMT2AGAATSHR
SCHEMBL10877705 0.79 DHODH (0.37) MAPTMEN1KMT2AGAAALDH1A1
SCHEMBL10732418 0.71 P2RY2 (0.50) P2RY2MAPTMEN1KMT2ANPC1
SCHEMBL14081299 0.71 THRB (0.59) MAPTMEN1KMT2ANPSR1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0211435-B1 OPTICAL INFORMATION STORAGE MEDIUM NEC CORPORATION (JP) 1991-05-15 — — EP claimed
US-4763139-A NICKEL OXIDE AND TIN NEC CORPORATION (JP) 1988-08-09 — — US claimed
EP-0211435-A1 Optical information storage medium NEC CORPORATION (JP) 1987-02-25 — — EP claimed
US-7129021-B2 Polymer system with switchable physical properties and its use in direct exposure printing plates CREO SRL (BB) 2006-10-31 — — US disclosed
EP-0949088-B1 PLATE FOR DIRECT THERMAL LITHOGRAPHY AND PROCESS FOR PRODUCING THE SAME FUJI PHOTO FILM CO LTD (JP) 2005-10-12 — — EP disclosed
EP-1580021-A2 Direct, heat sensitive, lithoprinting plate and process for producing the same FUJI PHOTO FILM CO., LTD. (JP) 2005-09-28 — — EP disclosed
EP-1108534-B1 Polymer system and its use in direct exposure printing plates CREO S R L (IN) 2005-08-24 — — EP disclosed
US-6911298-B2 For computer to plate (CTP) printing system FUJI PHOTO FILM CO., LTD. (JP) 2005-06-28 — — US disclosed
US-20040110082-A1 Used for, printing using oil-based ink FUJIFILM CORPORATION (JP) 2004-06-10 — — US disclosed
US-20040081911-A1 Polymer system with switchable physical properties and its use in direct exposure printing plates CREO SRL (CA) 2004-04-29 — — US disclosed
EP-1375186-A1 HEAT-SENSITIVE PLATE MATERIAL FOR LITHOGRAPHIC PLATE FORMATION, PROCESS FOR PRODUCING THE SAME, COATING FLUID, AND LITHOGRAPHIC PLATE FUJI PHOTO FILM CO., LTD. (JP) 2004-01-02 — — EP disclosed
US-5569573-A Lithographic printing original plates and platemaking process using the same ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1996-10-29 — — US disclosed
CN-1107276-A Lithographic printing original plate and method for making plate using the same ASAHI CHEMICAL IND (JP) 1995-08-23 — — CN disclosed
EP-0646476-A1 LITHOGRAPHIC PRINTING ORIGINAL PLATE AND METHOD FOR PRODUCING THE SAME Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1995-04-05 — — EP disclosed
EP-0211435-B1 OPTICAL INFORMATION STORAGE MEDIUM NEC CORPORATION (JP) 1991-05-15 — — EP disclosed
US-4763139-A NICKEL OXIDE AND TIN NEC CORPORATION (JP) 1988-08-09 — — US disclosed
EP-0211435-A1 Optical information storage medium NEC CORPORATION (JP) 1987-02-25 — — EP disclosed
EP-0097929-B1 OPTICAL INFORMATION RECORDING MEDIUM FOR SEMICONDUCTOR LASER NEC CORPORATION (JP) 1986-10-01 — — EP disclosed
US-4504548-A Optical information recording medium for semiconductor laser NEC CORPORATION (JP) 1985-03-12 — — US disclosed
EP-0097929-A1 Optical information recording medium for semiconductor laser NEC CORPORATION (JP) 1984-01-11 — — EP disclosed
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