SCHEMBL4958672

SCHEMBL4958672

CCc1ccc2c(c1)C(=O)OC2=O

nearest known ligand 0.60

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.60
MAPK1 P28482 2/20 0.60
SMN1; SMN2 Q16637 2/20 0.60
NPC1 O15118 1/20 0.60
LMNA P02545 1/20 0.60
MAPT P10636 1/20 0.60
RAB9A P51151 1/20 0.60
L3MBTL1 Q9Y468 1/20 0.60
ALOX15 P16050 1/20 0.46
TDP1 Q9NUW8 1/20 0.46
CYP1A2 P05177 1/20 0.42
CYP2A6 P11509 1/20 0.42
TSHR P16473 1/20 0.40
TRPA1 O75762 2/20 0.39
MGLL Q99685 1/20 0.38
PARP1 P09874 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Cyclopropane SCHEMBL11642163 0.94 ALDH1A1 (0.55) ALDH1A1MAPK1SMN1; SMN2NPC1LMNA
SCHEMBL19543246 0.85 SMN1; SMN2 (0.53) ALDH1A1MAPK1SMN1; SMN2NPC1LMNA
SCHEMBL19950404 0.84 CNR1 (0.50) ALDH1A1MAPK1SMN1; SMN2NPC1LMNA
SCHEMBL434869 0.83 ALOX15 (0.50) ALDH1A1MAPK1SMN1; SMN2NPC1LMNA
SCHEMBL7599687 0.83 ALOX15 (0.50) ALDH1A1MAPK1SMN1; SMN2NPC1LMNA
SCHEMBL11870844 0.82 BCL2 (0.51) ALDH1A1MAPK1SMN1; SMN2NPC1LMNA
SCHEMBL6412562 0.81 SKP2 (0.43) ALDH1A1MAPK1SMN1; SMN2NPC1LMNA
SCHEMBL20251161 0.79 ALOX15 (0.46) ALDH1A1MAPK1SMN1; SMN2NPC1LMNA
SCHEMBL14511002 0.79 ALOX15 (0.46) ALDH1A1MAPK1SMN1; SMN2NPC1LMNA
SCHEMBL19036066 0.79 ALOX15 (0.46) ALDH1A1MAPK1SMN1; SMN2NPC1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11807758-B2 Siloxane polymer and method of producing siloxane polymer JNC CORPORATION (JP) 2023-11-07 US disclosed
CN-116803970-A 6,6' -disubstituted-3, 3', 4' -biphenyl tetracarboxylic acid and dianhydride thereof and preparation method thereof 中国石油化工股份有限公司 2023-09-26 CN disclosed
CN-116789543-A Preparation method of 4-halogenated-5-substituted phthalic acid and product and application thereof 中国石油化工股份有限公司 2023-09-22 CN disclosed
CN-112898194-A Polyimide-polyarylene polymers 罗门哈斯电子材料有限责任公司 2021-06-04 CN disclosed
WO-2020162693-A1 SELF-HEALING INFRARED TRANSMITTING POLYIMIDE OPTICAL POLYMER MATERIAL HAVING HIGH REFRACTIVE INDEX, AND COMPOSITE THEREOF 연세대학교 산학협력단 2020-08-13 WO disclosed
US-9981905-B2 Aromatic diamine, an intermediate therefor, a method for producing the aromatic diamine, and a method for producing the intermediate therefor SEIKA CORPORATION (JP) 2018-05-29 US disclosed
US-20180072655-A1 AROMATIC DIAMINE, AN INTERMEDIATE THEREFOR, A METHOD FOR PRODUCING THE AROMATIC DIAMINE, AND A METHOD FOR PRODUCING THE INTERMEDIATE THEREFOR SEIKA CORPORATION (JP) 2018-03-15 US disclosed
CN-107531625-A Aromatic diamine and its intermediate and their manufacture method 精化株式会社 2018-01-02 CN disclosed
WO-2017218520-A1 SURFACE-COATED CONTINUOUS GLUCOSE MONITORS MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2017-12-21 WO disclosed
CN-104849962-A Photosensitive polysiloxane composition, protective film and element with protective film CHI MEI CORP 2015-08-19 CN disclosed
WO-2006105193-A2 PERSONAL CARE COMPOSITIONS WITH COLOR CHANGING INDICATOR C2C TECHNOLOGIES LLC (US) 2006-10-05 WO disclosed
US-6395391-B1 MULTILAYER; METAL SUBSTRATE, ADHESIVE LAYERS TOMOEGAWA PAPER CO., LTD. (JP) 2002-05-28 US disclosed
US-6316170-B2 COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT KABUSHIKI KAISHA TOSHIBA (JP) 2001-11-13 US disclosed
US-20010006767-A1 Developing solution and method of forming polyimide pattern by using the developing solution YOSHIAKI KAWAMONZEN 2001-07-05 US disclosed
US-6183934-B1 FOE USE IN FORMATION OF PATTERN OF INSULATION FILM, PASSIVATION FILM, .ALPHA.-RAY SHIELDING FILM, OPTICAL WAVEGUIDE KABUSHIKI KAISHA TOSHIBA (JP) 2001-02-06 US disclosed
US-6159654-A Negative photosensitive polymer composition of a thermosetting polymer precursor curable by cyclodehydration upon heating KABUSHIKI KAISHA TOSHIBA (JP) 2000-12-12 US disclosed
US-6132865-A METAL SUBSTRATE AND ADHESIVE LAYERS TOMOEGAWA PAPER CO., LTD. (JP) 2000-10-17 US disclosed
US-6001517-A A THERMOSETTING POLYMER WHICH CAN BE CURED THROUGH CYCLODEHYDRATION UPON HEATING AND A CURE ACCELERATOR WHICH CAN BE DEACTIVATED OF ITS CURE ACCELERATION PROPERTY BY IRRIDIATION OF LIGHT KABUSHIKI KAISHA TOSHIBA (JP) 1999-12-14 US disclosed
US-5578697-A DIELECTRIC POLYMERS FOR ELECTRONICS KABUSHIKI KAISHA TOSHIBA (JP) 1996-11-26 US disclosed
US-5034493-A Comprising the reaction product obtained by heating a mixture of a zinc carboxylate, a carboxylic anhydride aknd a phenol or glycidyl ether or ester; colorless; storage stability; fast c uring; optics NEW JAPAN CHEMICAL CO., LTD. (JP) 1991-07-23 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180072655-A1 AROMATIC DIAMINE, AN INTERMEDIATE THEREFOR, A METHOD FOR PRODUCING THE AROMATIC DIAMINE, AND A METHOD FOR PRODUCING THE INTERMEDIATE THEREFOR ALDH7A1, ODC1, ASS1 ALDH1A1 173/4885MAPK1 908/4885SMN1; SMN2 3232/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.