SCHEMBL498588

SCHEMBL498588

CC(Cl)C(Cl)c1ccccc1

nearest known ligand 0.52

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.52
TAAR1 Q96RJ0 4/20 0.42
ADRA2A P08913 1/20 0.41
ADRA2C P18825 1/20 0.41
CYP2D6 P10635 1/20 0.41
LMNA P02545 1/20 0.41
HIF1A Q16665 1/20 0.41
KDM4E B2RXH2 1/20 0.41
NOS2 P35228 1/20 0.40
ALDH1A1 P00352 1/20 0.39
DPP4 P27487 2/20 0.39
F2 P00734 1/20 0.39
TRPA1 O75762 1/20 0.39
MIF P14174 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL306112 1.00 TSHR (0.52) TSHRTAAR1ADRA2AADRA2CCYP2D6
SCHEMBL304645 1.00 TSHR (0.52) TSHRTAAR1ADRA2AADRA2CCYP2D6
SCHEMBL893216 0.83 TSHR (0.52) TSHRTAAR1ADRA2AADRA2CCYP2D6
SCHEMBL6283476 0.82 TSHR (0.65) TSHRTAAR1CYP2D6LMNADPP4
SCHEMBL9750479 0.81 TSHR (0.50) TSHRTAAR1ADRA2AADRA2CCYP2D6
SCHEMBL3280292 0.79 ADRA2A (0.54) TSHRTAAR1ADRA2AADRA2CCYP2D6
SCHEMBL4778223 0.79 LMNA (0.48) TSHRADRA2AADRA2CCYP2D6LMNA
SCHEMBL11887151 0.79 ADRA2A (0.54) TSHRTAAR1ADRA2AADRA2CCYP2D6
Acetone SCHEMBL28777513 0.79 CYP2D6 (0.43) TSHRCYP2D6LMNAALDH1A1
SCHEMBL2240790 0.78 TSHR (0.52) TSHRTAAR1ADRA2AADRA2CCYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020145347-A1 PRODUCTION METHOD FOR α-CHLOROETHYL BENZYL CHLORIDE AND PRODUCTION METHOD FOR CHLOROMETHYLSTYRENE 長瀬産業株式会社 2020-07-16 WO claimed
WO-2020145347-A1 PRODUCTION METHOD FOR α-CHLOROETHYL BENZYL CHLORIDE AND PRODUCTION METHOD FOR CHLOROMETHYLSTYRENE 長瀬産業株式会社 2020-07-16 WO disclosed
CN-104045626-B Compounds based on 4-phenyl-6-(2,2,2-trifluoro-1-phenyl ethoxy) pyrimidine and application method thereof 莱西肯医药有限公司 2017-01-11 CN disclosed
EP-1978411-B1 Toner preparation method and apparatus, and toner prepared thereby RICOH CO LTD (JP) 2015-12-23 EP disclosed
EP-1992993-B1 Method and apparatus for manufacturing toner, and electrophotographic toner manufactured by the method RICOH CO LTD (JP) 2015-12-09 EP disclosed
CN-104045626-A Compounds based on 4-phenyl-6-(2,2,2-trifluoro-1-phenyl ethoxy) pyrimidine and application method thereof LEXICON PHARMACEUTICALS INC 2014-09-17 CN disclosed
CN-101591332-B compounds based on 4-phenyl-6- (2,2, 2-trifluoro-1-phenylethoxy) pyrimidine and methods of use thereof LEXICON PHARMACEUTICALS INC 2014-04-16 CN disclosed
CN-101284817-B Methods of preparing imidazole-based compounds LEXICON PHARMACEUTICALS INC 2013-06-26 CN disclosed
US-20120202912-A1 SURFACE TREATMENT BY PHOTOPOLYMERISATION TO OBTAIN BIOCIDAL PROPERTIES DESARROLLO DEL GRAFTING S.L. (ES) 2012-08-09 US disclosed
US-8137087-B2 Dripping and discharging droplets of toner constituent liquid, solidifying and granulating; dripper comprises thin film with nozzles, and oscillator, and oscillation amplifier; improved fluidity and chargeability RICOH COMPANY, LTD. (JP) 2012-03-20 US disclosed
US-6858374-B2 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2005-02-22 US disclosed
US-20030068575-A1 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. 2003-04-10 US disclosed
JP-2001072619-A INDUSTRIAL PRODUCTION OF CHLOROMETHYLSTYRENES NIPPON LIGHT METAL CO LTD 2001-03-21 JP disclosed
JP-2001072622-A PRODUCTION OF CHLOROMETHYLSTYRENES NIPPON LIGHT METAL CO LTD 2001-03-21 JP disclosed
JP-2001072621-A PRODUCTION OF CHLOROMETHYLSTYRENES NIPPON LIGHT METAL CO LTD 2001-03-21 JP disclosed
EP-0368279-B1 Silane coupling agent and glass fiber product for laminates NITTO BOSEKI CO LTD (JP) 2000-03-15 EP disclosed
US-5149839-A Improved impregnation, solvent resistance, heat resistance and low water absoprtion properties NITTO BOSEKI CO., LTD. (JP) 1992-09-22 US disclosed
US-5069971-A With epoxy resins, printed circuits, diaminoalklyalkoxysilane NITTO BOSEKI CO., LTD. (JP) 1991-12-03 US disclosed
EP-0368279-A1 Silane coupling agent and glass fiber product for laminates NITTO BOSEKI CO., LTD. (JP) 1990-05-16 EP disclosed
US-3962357-A FROM SUBSTITUTED ETHYLTOLUENE, CONTINUOUS, SINGLE STEP ROHM AND HAAS COMPANY (US) 1976-06-08 US disclosed