SCHEMBL4989968

SCHEMBL4989968

CCO[SiH](CCC1=CCCCC1)OCC

nearest known ligand 0.42

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.41
ALOX15 P16050 1/20 0.41
RAB9A P51151 4/20 0.39
SMN1; SMN2 Q16637 6/20 0.39
LMNA P02545 1/20 0.38
HPGD P15428 1/20 0.38
ALOX12 P18054 1/20 0.38
PKM P14618 1/20 0.38
GAA P10253 2/20 0.38
KMT2A Q03164 2/20 0.38
NPC1 O15118 3/20 0.37
MEN1 O00255 1/20 0.37
HTT P42858 1/20 0.37
KDM4E B2RXH2 1/20 0.36
TSHR P16473 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3886798 0.90 ALDH1A1 (0.40) ALDH1A1ALOX15RAB9ASMN1; SMN2LMNA
SCHEMBL3893406 0.87 ALDH1A1 (0.40) ALDH1A1ALOX15RAB9ASMN1; SMN2LMNA
SCHEMBL5002876 0.82 ALDH1A1 (0.44) ALDH1A1ALOX15RAB9ASMN1; SMN2PKM
SCHEMBL4999934 0.82 ALDH1A1 (0.37) ALDH1A1ALOX15RAB9ASMN1; SMN2LMNA
Water SCHEMBL28003772 0.74 ALDH1A1 (0.46) ALDH1A1ALOX15RAB9ASMN1; SMN2ALOX12
SCHEMBL10596387 0.74 ALDH1A1 (0.42) ALDH1A1ALOX15RAB9ASMN1; SMN2ALOX12
SCHEMBL68781 0.73
SCHEMBL9451069 0.73 ALDH1A1 (0.45) ALDH1A1ALOX15RAB9ASMN1; SMN2HPGD
SCHEMBL9324074 0.72 ALDH1A1 (0.47) ALDH1A1ALOX15RAB9ASMN1; SMN2HPGD
SCHEMBL28323674 0.72 ALDH1A1 (0.43) ALDH1A1ALOX15RAB9ASMN1; SMN2ALOX12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2584005-B1 TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR PRODUCTION OF SAME, AND USES THEREOF TOSOH CORP (JP) 2018-02-21 EP disclosed
CN-102947393-B Typical metal containing polysiloxane composition, process for production of same, and uses thereof TOSOH CORP 2015-03-11 CN disclosed
US-8907038-B2 Typical metal containing polysiloxane composition, process for its production, and its uses TOSOH CORPORATION (JP) 2014-12-09 US disclosed
EP-2584005-A1 TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR PRODUCTION OF SAME, AND USES THEREOF Tosoh Corporation (JP) 2013-04-24 EP disclosed
US-20130090447-A1 TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR ITS PRODUCTION, AND ITS USES TOSOH CORPORATION (JP) 2013-04-11 US disclosed
US-7413775-B2 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION (JP) 2008-08-19 US disclosed
US-7160625-B2 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION (JP) 2007-01-09 US disclosed
US-20060127683-A1 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION 2006-06-15 US disclosed
US-20030180550-A1 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION 2003-09-25 US disclosed
EP-0652246-B1 Base-catalysed preparation of an hydrogen containing polyorganosiloxane WACKER CHEMIE GMBH (DE) 1997-08-20 EP disclosed
EP-0652246-A1 Base-catalysed preparation of an hydrogen containing polyorganosiloxane Wacker-Chemie GmbH (DE) 1995-05-10 EP disclosed