SCHEMBL499049

SCHEMBL499049

ClC(Cl)(Cl)c1nc(C=Cc2ccco2)nc(C(Cl)(Cl)Cl)n1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GRM4 Q14833 1/20 0.46
MEN1 O00255 7/20 0.43
KMT2A Q03164 7/20 0.43
KDM4E B2RXH2 7/20 0.43
MAPT P10636 7/20 0.43
POLB P06746 6/20 0.43
NPC1 O15118 5/20 0.43
RAB9A P51151 5/20 0.43
TDP1 Q9NUW8 3/20 0.43
L3MBTL1 Q9Y468 3/20 0.43
BLM P54132 2/20 0.43
RECQL P46063 1/20 0.43
MCL1 Q07820 1/20 0.43
ALDH1A1 P00352 8/20 0.41
HCAR2 Q8TDS4 1/20 0.39
HPGD P15428 6/20 0.38
HTT P42858 4/20 0.38
LMNA P02545 3/20 0.38
SMN1; SMN2 Q16637 3/20 0.38
GAA P10253 3/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL499048 1.00 GRM4 (0.46) GRM4MEN1KMT2AKDM4EMAPT
SCHEMBL30724505 0.90 F2 (0.44) GRM4MEN1KMT2AKDM4EMAPT
SCHEMBL25801378 0.90 GRM4 (0.41) GRM4MEN1KMT2AKDM4EMAPT
SCHEMBL21603035 0.84 GRM4 (0.46) GRM4MEN1KMT2AKDM4EMAPT
SCHEMBL28415178 0.81 GRM4 (0.43) GRM4MEN1KMT2AKDM4EMAPT
SCHEMBL10227013 0.79 MAPT (0.38) GRM4MEN1KMT2AKDM4EMAPT
SCHEMBL25301410 0.79 DOT1L (0.36) GRM4MEN1KMT2AKDM4EMAPT
SCHEMBL28396285 0.78 GRM4 (0.43) GRM4MEN1KMT2AKDM4EMAPT
SCHEMBL26290674 0.75 MEN1 (0.47) GRM4MEN1KMT2AKDM4EMAPT
SCHEMBL641747 0.73 ALDH1A1 (0.62) GRM4MEN1KMT2AKDM4EMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1510 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120065626-A Photocurable composition 茂名清荷科技有限公司 2025-05-30 CN claimed
CN-115903376-B Photoresist, photoresist combination product and photoresist patterning method 清华大学 2025-01-14 CN claimed
US-20240168374-A1 PHOTORESIST COMPOSITION TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2024-05-23 US claimed
CN-112335252-B Polycycloolefin monomer as 3D printing material and catalyst activated by compound capable of generating photoacid 住友电木株式会社 2023-07-04 CN claimed
CN-115903376-A Photoresist, photoresist combination product and photoresist patterning method 清华大学 2023-04-04 CN claimed
CN-114507320-B Acrylate prepolymer and preparation method and application thereof 嘉兴金门量子材料科技有限公司 2022-08-23 CN claimed
CN-114507320-A Acrylate prepolymer and preparation method and application thereof 嘉兴金门量子材料科技有限公司 2022-05-17 CN claimed
US-9244354-B2 Method for producing thick film photoresist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2016-01-26 US claimed
CN-116615332-B Optically anisotropic laminate and optical element MITSUBISHI CHEMICAL CORP. (JP) 2026-05-26 CN disclosed
WO-2026100726-A1 DECORATIVE FILM, ELECTRONIC MEMBER, AND TOUCH PAD JSR株式会社 2026-05-15 WO disclosed
CN-122025599-A Silicon-based anode material, preparation method thereof and battery 惠州亿纬锂能股份有限公司 2026-05-12 CN disclosed
CN-116323748-B Ultraviolet curable composition and use thereof 陶氏东丽株式会社 2026-05-12 CN disclosed
US-20260117026-A1 DIELECTRIC MATERIALS BASED ON HETEROAROMATIC-EXTENDED BISMALEIMIDES MERCK PATENT GMBH (DE) 2026-04-30 US disclosed
EP-4346935-B1 COATING FOR MEDICAL DEVICES SMART REACTORS SERVICE LTD (IE) 2026-04-22 EP disclosed
US-5929271-A Compounds for use in a positive-working resist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1999-07-27 US disclosed
EP-0880075-A1 Radiation sensitive resin composition JSR Corporation (JP) 1998-11-25 EP disclosed
US-5817444-A POLYHYDROXYSTYRENE SUBSTITUTED WITH TETRAHYDROPYRAN GROUPS, POLYHYDROXYSTYRENE SUBSTITUTED WITH ALKOXYALKYL GROUPS TOKYO OHKA KOGYO CO., LTD. (JP) 1998-10-06 US disclosed
US-5789136-A Negative-working photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1998-08-04 US disclosed
US-5700625-A Negative-working photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1997-12-23 US disclosed
US-5368783-A Novolak resin or polyhydroxystyrene resin, alkoxymethylated amino resin and triazine TOKYO OHKA KOGYO CO., LTD. (JP) 1994-11-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260117026-A1 DIELECTRIC MATERIALS BASED ON HETEROAROMATIC-EXTENDED BISMALEIMIDES KCNE1, GLRB, PBRM1 GRM4 383/4885MEN1 1824/4885KMT2A 1059/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.