Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRM4 | Q14833 | 1/20 | 0.46 |
| ▸ | MEN1 | O00255 | 7/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 7/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.43 |
| ▸ | MAPT | P10636 | 7/20 | 0.43 |
| ▸ | POLB | P06746 | 6/20 | 0.43 |
| ▸ | NPC1 | O15118 | 5/20 | 0.43 |
| ▸ | RAB9A | P51151 | 5/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.43 |
| ▸ | BLM | P54132 | 2/20 | 0.43 |
| ▸ | RECQL | P46063 | 1/20 | 0.43 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.41 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 6/20 | 0.38 |
| ▸ | HTT | P42858 | 4/20 | 0.38 |
| ▸ | LMNA | P02545 | 3/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.38 |
| ▸ | GAA | P10253 | 3/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL499049 | 1.00 | GRM4 (0.46) | GRM4MEN1KMT2AKDM4EMAPT | |
| SCHEMBL30724505 | 0.90 | F2 (0.44) | GRM4MEN1KMT2AKDM4EMAPT | |
| SCHEMBL25801378 | 0.90 | GRM4 (0.41) | GRM4MEN1KMT2AKDM4EMAPT | |
| SCHEMBL21603035 | 0.84 | GRM4 (0.46) | GRM4MEN1KMT2AKDM4EMAPT | |
| SCHEMBL28415178 | 0.81 | GRM4 (0.43) | GRM4MEN1KMT2AKDM4EMAPT | |
| SCHEMBL10227013 | 0.79 | MAPT (0.38) | GRM4MEN1KMT2AKDM4EMAPT | |
| SCHEMBL25301410 | 0.79 | DOT1L (0.36) | GRM4MEN1KMT2AKDM4EMAPT | |
| SCHEMBL28396285 | 0.78 | GRM4 (0.43) | GRM4MEN1KMT2AKDM4EMAPT | |
| SCHEMBL26290674 | 0.75 | MEN1 (0.47) | GRM4MEN1KMT2AKDM4EMAPT | |
| SCHEMBL641747 | 0.73 | ALDH1A1 (0.62) | GRM4MEN1KMT2AKDM4EMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 993 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240168374-A1 | PHOTORESIST COMPOSITION | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-05-23 | — | — | US | claimed |
| US-9244354-B2 | Method for producing thick film photoresist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-01-26 | — | — | US | claimed |
| WO-2026100726-A1 | DECORATIVE FILM, ELECTRONIC MEMBER, AND TOUCH PAD | JSR株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-20260117026-A1 | DIELECTRIC MATERIALS BASED ON HETEROAROMATIC-EXTENDED BISMALEIMIDES | MERCK PATENT GMBH (DE) | 2026-04-30 | — | — | US | disclosed |
| EP-4346935-B1 | COATING FOR MEDICAL DEVICES | SMART REACTORS SERVICE LTD (IE) | 2026-04-22 | — | — | EP | disclosed |
| US-20260098128-A1 | CURABLE BRANCHED ORGANOPOLYSILOXANE, HIGH ENERGY RAY-CURABLE COMPOSITION CONTAINING SAME, AND USE THEREOF | DOW TORAY CO LTD (JP) | 2026-04-09 | — | — | US | disclosed |
| US-20260085194-A1 | OPTICAL PRODUCT | TOKYO OHKA KOGYO CO LTD (JP) | 2026-03-26 | — | — | US | disclosed |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | disclosed |
| US-20260050218-A1 | PHENOLIC HYDROXYL GROUP-CONTAINING BRANCHED ORGANOPOLYSILOXANE, HIGH ENERGY RAY-CURABLE COMPOSITION CONTAINING SAME, AND USE THEREOF | DOW TORAY CO LTD (JP) | 2026-02-19 | — | — | US | disclosed |
| US-20260049187-A1 | CO-MODIFIED BRANCHED ORGANOPOLYSILOXANE, HIGH ENERGY RAY-CURABLE COMPOSITION CONTAINING SAME, AND USE OF SAME | DOW TORAY CO LTD (JP) | 2026-02-19 | — | — | US | disclosed |
| US-12552888-B2 | Curable resin composition and display device | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2026-02-17 | — | — | US | disclosed |
| US-6268108-B1 | MIXTURE OF COMPOUND FORMING ACID UPON EXPOSURE OF ACTINIC RADIATION, COMPOUND CAPABLE OF CROSSLINKING, DYE AND SOLVENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-07-31 | — | — | US | disclosed |
| US-20010004511-A1 | Pigment-dispersion photo-sensitive coating solution | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2001-06-21 | — | — | US | disclosed |
| EP-1103856-A1 | Positive resist composition & process for forming resist pattern using same | Central Glass Company, Limited (JP) | 2001-05-30 | — | — | EP | disclosed |
| US-6225476-B1 | ACRYLIC ESTER COMPOUND HAVING ALKOXYCARBONYL GROUP OR GROUP DERIVED FROM MOLECULE OF LACTONE COMPOUND BY REMOVING HYDROGEN ATOM BONDED TO CARBON ATOM; MONOMER OF FILM-FORMING RESIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-05-01 | — | — | US | disclosed |
| US-6190833-B1 | (A) A PHENOL RESIN, (B) AN AMINO RESIN, (C) A COMPOUND HAVING TWO OR MORE CROSSLINKING GROUPS IN A MOLECULE, AND (D) A HALOMETHYL-1,3,5-TRIAZINE COMPOUND. | JSR CORPORATION (JP) | 2001-02-20 | — | — | US | disclosed |
| US-6183934-B1 | FOE USE IN FORMATION OF PATTERN OF INSULATION FILM, PASSIVATION FILM, .ALPHA.-RAY SHIELDING FILM, OPTICAL WAVEGUIDE | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-02-06 | — | — | US | disclosed |
| US-6087063-A | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-07-11 | — | — | US | disclosed |
| EP-0915381-A1 | Process of forming a pattern on a substrate | JSR Corporation (JP) | 1999-05-12 | — | — | EP | disclosed |
| US-5368783-A | Novolak resin or polyhydroxystyrene resin, alkoxymethylated amino resin and triazine | TOKYO OHKA KOGYO CO., LTD. (JP) | 1994-11-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260085194-A1 | OPTICAL PRODUCT | PFN1, CFL1, C9 | GRM4 1933/4885MEN1 4243/4885KMT2A 2846/4885 |
| US-12552888-B2 | Curable resin composition and display device | RAD51, LPO, FTO | GRM4 2227/4885MEN1 4823/4885KMT2A 1001/4885 |
| US-20260050218-A1 | PHENOLIC HYDROXYL GROUP-CONTAINING BRANCHED ORGANOPOLYSILOXANE, HIGH ENERGY RAY-CURABLE COMPOSITION CONTAINING SAME, AND USE THEREOF | MSR1, HAO2, HAO1 | GRM4 2607/4885MEN1 1200/4885KMT2A 1660/4885 |
| US-20260049187-A1 | CO-MODIFIED BRANCHED ORGANOPOLYSILOXANE, HIGH ENERGY RAY-CURABLE COMPOSITION CONTAINING SAME, AND USE OF SAME | MSR1, HAO2, COL2A1 | GRM4 1195/4885MEN1 1335/4885KMT2A 1184/4885 |
| US-20260098128-A1 | CURABLE BRANCHED ORGANOPOLYSILOXANE, HIGH ENERGY RAY-CURABLE COMPOSITION CONTAINING SAME, AND USE THEREOF | COL2A1, COL1A1, SEM1 | GRM4 3001/4885MEN1 2656/4885KMT2A 1699/4885 |
| US-20260117026-A1 | DIELECTRIC MATERIALS BASED ON HETEROAROMATIC-EXTENDED BISMALEIMIDES | KCNE1, GLRB, PBRM1 | GRM4 383/4885MEN1 1824/4885KMT2A 1059/4885 |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | PRDM9, ARCN1, PUF60 | GRM4 913/4885MEN1 2185/4885KMT2A 537/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.