Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 6/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 6/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.43 |
| ▸ | NPC1 | O15118 | 5/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.43 |
| ▸ | RAB9A | P51151 | 4/20 | 0.43 |
| ▸ | HPGD | P15428 | 3/20 | 0.43 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.43 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.43 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.43 |
| ▸ | RELA | Q04206 | 1/20 | 0.43 |
| ▸ | TP53 | P04637 | 3/20 | 0.42 |
| ▸ | THRB | P10828 | 1/20 | 0.42 |
| ▸ | RECQL | P46063 | 1/20 | 0.40 |
| ▸ | GLA | P06280 | 1/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | TUBB1 | Q9H4B7 | 2/20 | 0.38 |
| ▸ | MAOB | P27338 | 1/20 | 0.38 |
| ▸ | SHMT2 | P34897 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30617248 | 1.00 | MAPT (0.47) | MAPTSMN1; SMN2ALDH1A1NPC1KDM4E | |
| SCHEMBL25960 | 0.87 | ALDH1A1 (0.47) | MAPTSMN1; SMN2ALDH1A1NPC1KDM4E | |
| SCHEMBL29516909 | 0.87 | ALDH1A1 (0.47) | MAPTSMN1; SMN2ALDH1A1NPC1KDM4E | |
| SCHEMBL8040923 | 0.84 | S1PR1 (0.43) | MAPTSMN1; SMN2ALDH1A1NPC1KDM4E | |
| SCHEMBL387905 | 0.77 | CYP19A1 (0.40) | MAPTSMN1; SMN2ALDH1A1NPC1KDM4E | |
| SCHEMBL12196211 | 0.76 | MAOA (0.35) | MAPTALDH1A1MAOBTSHRHSD17B10 | |
| SCHEMBL8634414 | 0.76 | KDM4E (0.44) | MAPTSMN1; SMN2ALDH1A1KDM4EHPGD | |
| SCHEMBL3830957 | 0.75 | CYP19A1 (0.38) | MAPTSMN1; SMN2ALDH1A1NPC1KDM4E | |
| SCHEMBL28447729 | 0.75 | KDM4E (0.38) | MAPTSMN1; SMN2ALDH1A1NPC1KDM4E | |
| SCHEMBL6140308 | 0.75 | NPC1 (0.35) | MAPTSMN1; SMN2ALDH1A1NPC1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 278 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9244354-B2 | Method for producing thick film photoresist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-01-26 | — | — | US | claimed |
| US-6010824-A | Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-01-04 | — | — | US | claimed |
| US-20240239922-A1 | PHOTOCURABLE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-07-18 | — | — | US | disclosed |
| US-20240192593-A1 | PHOTOSENSITIVE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-06-13 | — | — | US | disclosed |
| US-20240191003-A1 | COMPOSITION AND PHOTOSENSITIVE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-06-13 | — | — | US | disclosed |
| US-20240166779-A1 | PHOTOCURABLE COMPOSITION AND PATTERN FORMATION METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-05-23 | — | — | US | disclosed |
| US-20240158541-A1 | PHOTOCURABLE COMPOSITION AND PATTERN-FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-05-16 | — | — | US | disclosed |
| US-11981794-B2 | Curable composition, cured product, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-05-14 | — | — | US | disclosed |
| US-20240153687-A1 | COMPOSITION HAVING MAGNETOSTRICTIVE PROPERTIES, AND CURED PRODUCT THEREOF | TOHOKU UNIVERSITY (JP) | 2024-05-09 | — | — | US | disclosed |
| CN-117999296-A | Composition and photosensitive composition | 东京应化工业株式会社 | 2024-05-07 | — | — | CN | disclosed |
| CN-117980346-A | Composition and photosensitive composition | 东京应化工业株式会社 | 2024-05-03 | — | — | CN | disclosed |
| US-20030039921-A1 | Chemically amplified negative photoresist composition for the formation of thick films, photoresist base material and method of forming bumps using the same | TOKYO OHKA KOGYO CO., LTD. | 2003-02-27 | — | — | US | disclosed |
| US-6506540-B2 | Blend containing photoinitiators | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-01-14 | — | — | US | disclosed |
| US-20020164542-A1 | Photosensitive insulating paste composition and photosensitive film made therefrom | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-11-07 | — | — | US | disclosed |
| US-20020031723-A1 | Photopolymerizable composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-03-14 | — | — | US | disclosed |
| EP-1168080-A2 | Photopolymerizable composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-01-02 | — | — | EP | disclosed |
| US-6010824-A | Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-01-04 | — | — | US | disclosed |
| US-5908734-A | SELECTIVELY EXPOSING A PHOTOSENSITIVE LAYER WITH A VISIBLE LASER BEAM, HEATING THE EXPOSED PHOTOSENSITIVE LAYER AT A TEMPERATURE OF FROM 36 TO 48.DEGREE. C. FOR 10 SECONDS TO 3 MINUTES, AND DEVELOPING THE PHOTOSENSITIVE LAYER. | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-06-01 | — | — | US | disclosed |
| US-5908720-A | CARBON BLACK COATED WITH A RESIN OBTAINED FROM ONE OR MORE POLYMERIZABLE MONOMERS HAVING AT LEAST ONE REACTIVE GROUP SELECTED FROM THE GROUP CONSISTING OF EPOXY, THIOEPOXY, OXAZOLINE, AZILIDINE AND HYDROXYALKYL AMIDE GROUPS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-06-01 | — | — | US | disclosed |
| US-5714286-A | PHOTOPOLYMERIZABLE COMPOUND, PHOTOINITIATOR, LIGHT SHIELDING MATERIAL COMPOSED OF COPPER OXIDE AND IRON, MANGANESE, CHROMIUM, COBALT AND/OR NICKEL OXIDE | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-02-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240192593-A1 | PHOTOSENSITIVE COMPOSITION | PPOX, ERCC1, ERCC5 | MAPT 255/4885SMN1; SMN2 2829/4885ALDH1A1 1414/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.