Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.82 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.82 |
| ▸ | MAPT | P10636 | 4/20 | 0.82 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.63 |
| ▸ | NPC1 | O15118 | 1/20 | 0.63 |
| ▸ | TP53 | P04637 | 1/20 | 0.63 |
| ▸ | RAB9A | P51151 | 1/20 | 0.63 |
| ▸ | DRD2 | P14416 | 2/20 | 0.62 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.60 |
| ▸ | HTR1A | P08908 | 2/20 | 0.59 |
| ▸ | HTR2A | P28223 | 1/20 | 0.59 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.59 |
| ▸ | HTR7 | P34969 | 1/20 | 0.59 |
| ▸ | HRH1 | P35367 | 1/20 | 0.59 |
| ▸ | DRD3 | P35462 | 1/20 | 0.59 |
| ▸ | HTR2B | P41595 | 1/20 | 0.59 |
| ▸ | ADRA1D | P25100 | 1/20 | 0.59 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.59 |
| ▸ | ADRA1B | P35368 | 1/20 | 0.59 |
| ▸ | LMNA | P02545 | 1/20 | 0.58 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL321369 | 0.90 | ALDH1A1 (1.00) | ALDH1A1KMT2AMAPTHTR1ALMNA | |
| SCHEMBL16986158 | 0.85 | TSHR (0.70) | ALDH1A1KMT2AMAPTSMN1; SMN2NPC1 | |
| SCHEMBL9595982 | 0.85 | ALDH1A1 (0.64) | ALDH1A1KMT2AMAPTSMN1; SMN2NPC1 | |
| SCHEMBL4008558 | 0.84 | ALDH1A1 (0.63) | ALDH1A1KMT2AMAPTSMN1; SMN2NPC1 | |
| SCHEMBL7645836 | 0.84 | ALDH1A1 (0.81) | ALDH1A1KMT2AMAPTSMN1; SMN2DRD2 | |
| SCHEMBL10603564 | 0.84 | ALDH1A1 (0.81) | ALDH1A1KMT2AMAPTSMN1; SMN2DRD2 | |
| Hydrochloric Acid SCHEMBL16986155 | 0.84 | TSHR (0.72) | ALDH1A1KMT2AMAPTSMN1; SMN2NPC1 | |
| SCHEMBL21643443 | 0.83 | ALDH1A1 (0.62) | ALDH1A1KMT2AMAPTSMN1; SMN2NPC1 | |
| SCHEMBL11828902 | 0.83 | HTR1A (0.68) | DRD2HTR1AHTR2AHTR7HRH1 | |
| Hydrochloric Acid SCHEMBL10606849 | 0.83 | ALDH1A1 (0.82) | ALDH1A1KMT2AMAPTDRD2KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 129 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4630153-A1 | ETCH-FREE PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS | Illumina, Inc. (US) | 2025-10-15 | — | — | EP | claimed |
| WO-2024123748-A1 | ETCH-FREE PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS | ILLUMINA, INC. (US) | 2024-06-13 | — | — | WO | claimed |
| CN-113214593-A | ABS-like resin for 3D printing and preparation method thereof | 深圳永昌和科技有限公司 | 2021-08-06 | — | — | CN | claimed |
| CN-111471140-A | Magnetic control 3D printing ultraviolet curing conductive material and preparation method thereof | 深圳永昌和科技有限公司 | 2020-07-31 | — | — | CN | claimed |
| CN-111138602-A | Ultraviolet-curing elastic resin for 3D printing | 深圳永昌和科技有限公司 | 2020-05-12 | — | — | CN | claimed |
| EP-1779197-A1 | DISPLAY PANEL INCLUDIDNG PATTERNED SPACER | LG Chem, Ltd. (KR) | 2007-05-02 | — | — | EP | claimed |
| WO-2006004364-A1 | DISPLAY PANEL INCLUDIDNG PATTERNED SPACER | LG CHEM, LTD. (KR) | 2006-01-12 | — | — | WO | claimed |
| WO-2026105817-A1 | ADHESIVE FILM AND WOUND BODY | 積水化学工業株式会社 | 2026-05-21 | — | — | WO | disclosed |
| EP-4735958-A1 | PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS | Illumina, Inc. (US) | 2026-05-06 | — | — | EP | disclosed |
| US-12502885-B2 | Dual photoinitiated nanocomposite-ink printing | VADIENT OPTICS, LLC (US) | 2025-12-23 | — | — | US | disclosed |
| EP-4630153-A1 | ETCH-FREE PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS | Illumina, Inc. (US) | 2025-10-15 | — | — | EP | disclosed |
| US-12410330-B2 | Energy curable, heat activated flexographic adhesives for die-less foiling | INX INTERNATIONAL INK CO. (US) | 2025-09-09 | — | — | US | disclosed |
| WO-2025006431-A1 | PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS | ILLUMINA, INC. (US) | 2025-01-02 | — | — | WO | disclosed |
| CN-101109901-A | Curable composition, color filter and process for production thereof | FUJI FILM CORP (JP) | 2008-01-23 | — | — | CN | disclosed |
| CN-101093355-A | Compound, photosensitive combination, solidified combination, solidified combination for filter, color filter and manufacturing method thereof | FUJIFILM CORP (JP) | 2007-12-26 | — | — | CN | disclosed |
| US-20070266869-A1 | Photoinitiators for Use in Intaglio Printing Inks | SUN CHEMICAL CORPORATION (US) | 2007-11-22 | — | — | US | disclosed |
| US-7217743-B2 | Curable white ink | KONICA CORPORATION (JP) | 2007-05-15 | — | — | US | disclosed |
| EP-1751240-A1 | PHOTOINITIATORS FOR USE IN INTAGLIO PRINTING INKS | Sun Chemical Corporation (US) | 2007-02-14 | — | — | EP | disclosed |
| US-7147801-B2 | Ink jet ink composition and method for security marking | VIDEOJET TECHNOLOGIES INC. (US) | 2006-12-12 | — | — | US | disclosed |
| WO-2005097925-A1 | PHOTOINITIATORS FOR USE IN INTAGLIO PRINTING INKS | SUN CHEMICAL CORPORATION (US) | 2005-10-20 | — | — | WO | disclosed |