SCHEMBL5015274

SCHEMBL5015274

C=CC(C#N)N1CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5728065 0.90 ALDH1A1 (0.32)
SCHEMBL10959047 0.84 ALDH1A1 (0.39)
SCHEMBL10498521 0.84 OPRD1 (0.34)
SCHEMBL11884623 0.78
SCHEMBL10498907 0.77 LMNA (0.41)
SCHEMBL537365 0.65
SCHEMBL3667855 0.65
SCHEMBL19185755 0.63
SCHEMBL21180932 0.61
SCHEMBL2169815 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-2008191631-A COMPOSITION FOR REMOVING RESIST TOSOH CORP 2008-08-21 JP disclosed
WO-2008023614-A1 COMPOSITION FOR REMOVAL OF RESIST COMPRISING POLY(CYANOALKYL)ETHYLENEAMINE AND METHOD FOR REMOVAL OF RESIST USING THE COMPOSITION TOSOH CORPORATION (JP) 2008-02-28 WO disclosed