⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL544030 | 0.97 | ALDH1A1 (0.38) | — | |
| SCHEMBL244283 | 0.83 | NPSR1 (0.32) | — | |
| SCHEMBL30400900 | 0.78 | ALDH1A1 (0.41) | — | |
| SCHEMBL2759440 | 0.77 | ALDH1A1 (0.36) | — | |
| SCHEMBL428997 | 0.75 | — | — | |
| SCHEMBL28300999 | 0.75 | — | — | |
| Ethylene Glycol SCHEMBL29006644 | 0.75 | ALDH1A1 (0.35) | — | |
| Trifluoroethanol SCHEMBL28432116 | 0.73 | CA5A (0.43) | — | |
| SCHEMBL3867580 | 0.73 | ALDH1A1 (0.38) | — | |
| SCHEMBL6207756 | 0.73 | ALDH1A1 (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 261 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8748672-B2 | 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-06-10 | — | — | US | claimed |
| US-8663897-B2 | Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-03-04 | — | — | US | claimed |
| US-20130317250-A1 | 2-(Alkylcarbonyloxy)-1, 1-Difluoroethanesulfonic Acid Salt and Method for Producing the Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-11-28 | — | — | US | claimed |
| US-8110711-B2 | Processes for production of 2-bromo-2,2-difluoroethanol and 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-02-07 | — | — | US | claimed |
| US-20110177453-A1 | Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-07-21 | — | — | US | claimed |
| US-20110034721-A1 | 2-(Alkylcarbonyloxy)-1, 1-Difluoroethanesulfonic Acid Salt and Method for Producing the Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-02-10 | — | — | US | claimed |
| US-20110015431-A1 | Processes for Production of 2-Bromo-2,2-Difluoroethanol and 2-(Alkylcarbonyloxy)-1,1-Difluoroethanesulfonic Acid Salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-01-20 | — | — | US | claimed |
| EP-4451061-A1 | NOVEL PHOTOACID GENERATOR, PHOTORESIST COMPOSITION, AND PHOTORESIST PATTERN FORMATION METHOD | Dongjin Semichem Co., Ltd. (KR) | 2024-10-23 | — | — | EP | disclosed |
| US-20240337929-A1 | PHOTOACID GENERATOR, PHOTORESIST COMPOSITION AND METHOD FOR FORMING PHOTORESIST PATTERN USING THE SAME | DONGJIN SEMICHEM CO., LTD. (KR) | 2024-10-10 | — | — | US | disclosed |
| US-20240291009-A1 | METHOD FOR PURIFYING TREATMENT TARGET SOLUTION | AGC Inc. (JP) | 2024-08-29 | — | — | US | disclosed |
| EP-4417582-A1 | METHOD FOR PURIFYING TREATMENT TARGET SOLUTION | AGC Inc. (JP) | 2024-08-21 | — | — | EP | disclosed |
| CN-118176168-A | Method for purifying liquid to be treated | ＡＧＣ株式会社 | 2024-06-11 | — | — | CN | disclosed |
| WO-2024070091-A1 | ONIUM SALT, PHOTOACID GENERATOR, POLYMER, RESIST COMPOSITION, AND METHOD FOR MANUFACTURING DEVICE USING SAID RESIST COMPOSITION | 東洋合成工業株式会社 | 2024-04-04 | — | — | WO | disclosed |
| US-20090186297-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-07-23 | — | — | US | disclosed |
| US-20090186297-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-07-23 | — | — | US | disclosed |
| US-20090186298-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-07-23 | — | — | US | disclosed |
| US-20090186298-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-07-23 | — | — | US | disclosed |
| EP-2081083-A1 | Positive resist compositions and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-07-22 | — | — | EP | disclosed |
| EP-2081084-A1 | Positive resist compositions and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-07-22 | — | — | EP | disclosed |
| US-20090042128-A1 | Positive resist composition used for semiconductor microfabrication employing a lithography process contains an acid generator comprising a compound generating an acid by irradiation and a monomer having a bulky and acid-labile group | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-02-12 | — | — | US | disclosed |