Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL501638 | 0.97 | — | — | |
| SCHEMBL244283 | 0.81 | NPSR1 (0.32) | ALDH1A1L3MBTL1 | |
| SCHEMBL30400900 | 0.75 | ALDH1A1 (0.41) | ALDH1A1L3MBTL1TSHRTDP1 | |
| SCHEMBL2759440 | 0.74 | ALDH1A1 (0.36) | ALDH1A1L3MBTL1TSHRTDP1 | |
| SCHEMBL28300999 | 0.73 | — | — | |
| SCHEMBL428997 | 0.73 | — | — | |
| Ethylene Glycol SCHEMBL29006644 | 0.72 | ALDH1A1 (0.35) | ALDH1A1L3MBTL1 | |
| Trifluoroethanol SCHEMBL28432116 | 0.71 | CA5A (0.43) | ALDH1A1L3MBTL1TSHRTDP1 | |
| SCHEMBL3867580 | 0.71 | ALDH1A1 (0.38) | ALDH1A1L3MBTL1TSHRTDP1 | |
| SCHEMBL6207756 | 0.71 | ALDH1A1 (0.38) | ALDH1A1L3MBTL1TSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112661756-A | Sulfonium salt photo-acid generator synthesized from 20-hydroxyduraline and preparation method thereof | 上海博栋化学科技有限公司 | 2021-04-16 | — | — | CN | claimed |
| CN-112631072-A | Sulfonium salt photo-acid generator synthesized from 10-hydroxy climbing mountain orange alkali and preparation method thereof | 上海博栋化学科技有限公司 | 2021-04-09 | — | — | CN | claimed |
| CN-112552298-A | Sulfonium salt photo-acid generator synthesized from 16-epi-NB-methyl Voacarpine base and preparation method thereof | 上海博栋化学科技有限公司 | 2021-03-26 | — | — | CN | claimed |
| CN-111624854-A | Photosensitive semiconductor device | 南京鑫达泰科技有限公司 | 2020-09-04 | — | — | CN | claimed |
| US-8110711-B2 | Processes for production of 2-bromo-2,2-difluoroethanol and 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-02-07 | — | — | US | claimed |
| US-20110015431-A1 | Processes for Production of 2-Bromo-2,2-Difluoroethanol and 2-(Alkylcarbonyloxy)-1,1-Difluoroethanesulfonic Acid Salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-01-20 | — | — | US | claimed |
| EP-4194949-A1 | PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING A PATTERN USING THE PHOTOACID GENERATOR | Samsung Electronics Co., Ltd. (KR) | 2023-06-14 | — | — | EP | disclosed |
| US-20230161245-A1 | PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTOACID GENERATOR | SAMSUNG ELECTRONICS CO LTD (KR) | 2023-05-25 | — | — | US | disclosed |
| CN-113045537-A | Sulfonium sulfonate photo-acid generator synthesized from curcumenol and synthesis method thereof | 上海博栋化学科技有限公司 | 2021-06-29 | — | — | CN | disclosed |
| CN-112679514-A | Sulfonium salt photo-acid generator synthesized from papaya alkali and preparation method thereof | 上海博栋化学科技有限公司 | 2021-04-20 | — | — | CN | disclosed |
| CN-112661755-A | Sulfonium salt photo-acid generator synthesized from isocorynanthine and preparation method thereof | 上海博栋化学科技有限公司 | 2021-04-16 | — | — | CN | disclosed |
| CN-112661756-A | Sulfonium salt photo-acid generator synthesized from 20-hydroxyduraline and preparation method thereof | 上海博栋化学科技有限公司 | 2021-04-16 | — | — | CN | disclosed |
| CN-112661805-A | Sulfonium salt photo-acid generator synthesized from Bromus buxus alkali B and preparation method thereof | 上海博栋化学科技有限公司 | 2021-04-16 | — | — | CN | disclosed |
| US-20110177453-A1 | Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-07-21 | — | — | US | disclosed |
| US-20110034721-A1 | 2-(Alkylcarbonyloxy)-1, 1-Difluoroethanesulfonic Acid Salt and Method for Producing the Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-02-10 | — | — | US | disclosed |
| US-20110015431-A1 | Processes for Production of 2-Bromo-2,2-Difluoroethanol and 2-(Alkylcarbonyloxy)-1,1-Difluoroethanesulfonic Acid Salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-01-20 | — | — | US | disclosed |
| US-20100113818-A1 | Photoacid generator containing aromatic ring | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2010-05-06 | — | — | US | disclosed |
| US-20100075256-A1 | Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2010-03-25 | — | — | US | disclosed |
| US-20090291390-A1 | Acid generating agent for chemically amplified resist compositions | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2009-11-26 | — | — | US | disclosed |
| US-20090234155-A1 | Acid generating agent for chemically amplified resist compositions | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2009-09-17 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090291390-A1 | Acid generating agent for chemically amplified resist compositions | ABCC1, CBR1, ARSA | ALDH1A1 102/4885L3MBTL1 3650/4885TSHR 2103/4885 |
| US-20110177453-A1 | Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same | WASF2, EEF2, IKZF2 | ALDH1A1 2304/4885L3MBTL1 1705/4885TSHR 2715/4885 |
| US-20110034721-A1 | 2-(Alkylcarbonyloxy)-1, 1-Difluoroethanesulfonic Acid Salt and Method for Producing the Same | PFAS, DDAH1, STS | ALDH1A1 421/4885L3MBTL1 3984/4885TSHR 4185/4885 |
| US-20100113818-A1 | Photoacid generator containing aromatic ring | HAO2, PAH, PPOX | ALDH1A1 1112/4885L3MBTL1 3860/4885TSHR 738/4885 |
| US-20110015431-A1 | Processes for Production of 2-Bromo-2,2-Difluoroethanol and 2-(Alkylcarbonyloxy)-1,1-Difluoroethanesulfonic Acid Salt | HAO2, SULT2A1, CYP2F1 | ALDH1A1 28/4885L3MBTL1 2651/4885TSHR 3752/4885 |
| US-20090234155-A1 | Acid generating agent for chemically amplified resist compositions | POLM, CBR1, PFAS | ALDH1A1 346/4885L3MBTL1 3980/4885TSHR 2995/4885 |
| US-20100075256-A1 | Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition | ARF5, ARL1, FGFR2 | ALDH1A1 3581/4885L3MBTL1 3398/4885TSHR 1296/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.