Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | FAAH | O00519 | 1/20 | 0.41 |
| ▸ | ABHD16A | O95870 | 1/20 | 0.41 |
| ▸ | PLA2G7 | Q13093 | 1/20 | 0.41 |
| ▸ | NCEH1 | Q6PIU2 | 1/20 | 0.41 |
| ▸ | DAGLB | Q8NCG7 | 1/20 | 0.41 |
| ▸ | DAGLA | Q9Y4D2 | 1/20 | 0.41 |
| ▸ | MITF | O75030 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | RECQL | P46063 | 1/20 | 0.39 |
| ▸ | NAMPT | P43490 | 4/20 | 0.38 |
| ▸ | RAB9A | P51151 | 2/20 | 0.36 |
| ▸ | RAD52 | P43351 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | ASAH1 | Q13510 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18012879 | 1.00 | LMNA (0.44) | LMNAKMT2AMEN1FAAHABHD16A | |
| SCHEMBL1374699 | 1.00 | LMNA (0.44) | LMNAKMT2AMEN1FAAHABHD16A | |
| SCHEMBL19968525 | 0.95 | LMNA (0.41) | LMNAKMT2AMEN1FAAHABHD16A | |
| SCHEMBL6259978 | 0.95 | LMNA (0.41) | LMNAKMT2AMEN1FAAHABHD16A | |
| SCHEMBL12167253 | 0.93 | TPSAB1 (0.43) | LMNAKMT2AMEN1FAAHABHD16A | |
| SCHEMBL5492822 | 0.93 | KDM4E (0.45) | NAMPTKDM4EASAH1 | |
| SCHEMBL9158519 | 0.93 | KDM4E (0.45) | NAMPTKDM4EASAH1 | |
| SCHEMBL16381786 | 0.93 | KDM4E (0.45) | NAMPTKDM4EASAH1 | |
| SCHEMBL16151989 | 0.91 | KDM4E (0.43) | LMNANAMPTKDM4EASAH1 | |
| SCHEMBL15386148 | 0.90 | LMNA (0.37) | LMNAKMT2AMEN1FAAHABHD16A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9761741-B2 | Film-forming material | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-09-12 | — | — | US | disclosed |
| US-8828651-B2 | Positive-type photosensitive resin composition and cured film manufactured therefrom | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-09-09 | — | — | US | disclosed |
| US-8828651-B2 | Positive-type photosensitive resin composition and cured film manufactured therefrom | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-09-09 | — | — | US | disclosed |
| US-8623745-B2 | Composition for forming gate insulating film for thin-film transistor | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-01-07 | — | — | US | disclosed |
| US-20130284262-A1 | FILM-FORMING MATERIAL | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-10-31 | — | — | US | disclosed |
| US-8168371-B2 | Positive photosensitive resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-05-01 | — | — | US | disclosed |
| US-8168371-B2 | Positive photosensitive resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-05-01 | — | — | US | disclosed |
| US-20110318907-A1 | COMPOSITION FOR FORMING GATE INSULATING FILM FOR THIN-FILM TRANSISTOR | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20100028805-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-02-04 | — | — | US | disclosed |
| US-20100028805-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-02-04 | — | — | US | disclosed |
| EP-2109001-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2009-10-14 | — | — | EP | disclosed |
| US-20070020559-A1 | Positive-type photosensitive resin composition and cured film manufactured therefrom | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-01-25 | — | — | US | disclosed |
| US-20070020559-A1 | Positive-type photosensitive resin composition and cured film manufactured therefrom | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-01-25 | — | — | US | disclosed |