Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16576087 | 0.97 | LMNA (0.38) | LMNA | |
| SCHEMBL16576077 | 0.97 | LMNA (0.38) | LMNA | |
| SCHEMBL19759284 | 0.97 | LMNA (0.38) | LMNA | |
| SCHEMBL16576094 | 0.97 | LMNA (0.38) | LMNA | |
| SCHEMBL16576084 | 0.97 | LMNA (0.38) | LMNA | |
| SCHEMBL13541921 | 0.97 | LMNA (0.38) | LMNA | |
| SCHEMBL16576108 | 0.97 | LMNA (0.38) | LMNA | |
| SCHEMBL16576097 | 0.97 | LMNA (0.38) | LMNA | |
| SCHEMBL16576082 | 0.97 | LMNA (0.38) | LMNA | |
| SCHEMBL26622888 | 0.97 | LMNA (0.38) | LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5275669-A | Degreasing glass, metal, plastic and fiber surfaces | ALLIEDSIGNAL INC. (US) | 1994-01-04 | — | — | US | claimed |
| US-20230337677-A1 | ARYL AND PYRIDYL AMIDE PESTICIDES AND COMPOSITIONS THEREOF | UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INCORPORATED | 2023-10-26 | — | — | US | disclosed |
| CN-106548704-B | Display device and method of manufacturing window assembly | 三星显示有限公司 | 2020-08-04 | — | — | CN | disclosed |
| US-9182674-B2 | Immersion upper layer film forming composition and method of forming photoresist pattern | JSR CORPORATION (JP) | 2015-11-10 | — | — | US | disclosed |
| US-20150218110-A1 | USE OF SUBSTITUTED BENZODIAZEPINONES AND BENZAZEPINONES OR THE SALTS THEREOF AS ACTIVE SUBSTANCES AGAINST ABIOTIC PLANT STRESS | BAYER CROPSCIENCE AG (DE) | 2015-08-06 | — | — | US | disclosed |
| US-20150216168-A1 | USE OF SUBSTITUTED 2-AMIDOBENZIMIDAZOLES, 2-AMIDOBENZOXAZOLES AND 2-AMIDOBENZOTHIAZOLES OR SALTS THEREOF AS ACTIVE SUBSTANCES AGAINST ABIOTIC PLANT STRESS | BAYER CROPSCIENCE AG (DE) | 2015-08-06 | — | — | US | disclosed |
| US-20150218110-A1 | USE OF SUBSTITUTED BENZODIAZEPINONES AND BENZAZEPINONES OR THE SALTS THEREOF AS ACTIVE SUBSTANCES AGAINST ABIOTIC PLANT STRESS | BAYER CROPSCIENCE AG (DE) | 2015-08-06 | — | — | US | disclosed |
| US-20150216168-A1 | USE OF SUBSTITUTED 2-AMIDOBENZIMIDAZOLES, 2-AMIDOBENZOXAZOLES AND 2-AMIDOBENZOTHIAZOLES OR SALTS THEREOF AS ACTIVE SUBSTANCES AGAINST ABIOTIC PLANT STRESS | BAYER CROPSCIENCE AG (DE) | 2015-08-06 | — | — | US | disclosed |
| EP-2468780-B1 | Copolymer and top coating composition | JSR CORP (JP) | 2013-11-13 | — | — | EP | disclosed |
| US-8580482-B2 | Copolymer and top coating composition | JSR CORPORATION (JP) | 2013-11-12 | — | — | US | disclosed |
| US-7709182-B2 | Composition for forming antireflection film, layered product, and method of forming resist pattern | JSR CORPORATION (JP) | 2010-05-04 | — | — | US | disclosed |
| US-20100003615-A1 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2010-01-07 | — | — | US | disclosed |
| EP-1950610-A1 | COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN | JSR Corporation (JP) | 2008-07-30 | — | — | EP | disclosed |
| US-20080124524-A1 | Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern | JSR CORPORATION (JP) | 2008-05-29 | — | — | US | disclosed |
| US-20080038661-A1 | Copolymer and Top Coating Composition | JSR CORPORATION (JP) | 2008-02-14 | — | — | US | disclosed |
| EP-1818723-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR Corporation (JP) | 2007-08-15 | — | — | EP | disclosed |
| EP-1806370-A1 | COPOLYMER AND UPPER FILM-FORMING COMPOSITION | JSR Corporation (JP) | 2007-07-11 | — | — | EP | disclosed |
| EP-1708027-A1 | UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR Corporation (JP) | 2006-10-04 | — | — | EP | disclosed |
| EP-1193309-B1 | Solvent blend for use in high purity precursor removal | AIR PROD & CHEM (US) | 2004-11-03 | — | — | EP | disclosed |
| EP-1193309-A1 | Solvent blend for use in high purity precursor removal | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2002-04-03 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150218110-A1 | USE OF SUBSTITUTED BENZODIAZEPINONES AND BENZAZEPINONES OR THE SALTS THEREOF AS ACTIVE SUBSTANCES AGAINST ABIOTIC PLANT STRESS | GABBR1, GABRA1, GABRA6 | LMNA 4014/4885 |
| US-20230337677-A1 | ARYL AND PYRIDYL AMIDE PESTICIDES AND COMPOSITIONS THEREOF | DDT, ACHE, AHR | LMNA 3407/4885 |
| US-20150216168-A1 | USE OF SUBSTITUTED 2-AMIDOBENZIMIDAZOLES, 2-AMIDOBENZOXAZOLES AND 2-AMIDOBENZOTHIAZOLES OR SALTS THEREOF AS ACTIVE SUBSTANCES AGAINST ABIOTIC PLANT STRESS | ABAT, AAK1, AGXT | LMNA 4583/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.