Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.55 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.55 |
| ▸ | ATM | Q13315 | 1/20 | 0.55 |
| ▸ | NPSR1 | Q6W5P4 | 4/20 | 0.50 |
| ▸ | CHRM4 | P08173 | 4/20 | 0.49 |
| ▸ | CHRM3 | P20309 | 4/20 | 0.49 |
| ▸ | GSK3B | P49841 | 1/20 | 0.47 |
| ▸ | CHRM5 | P08912 | 3/20 | 0.46 |
| ▸ | CHRM1 | P11229 | 3/20 | 0.46 |
| ▸ | MT-CO2 | P00403 | 1/20 | 0.44 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.43 |
| ▸ | MEN1 | O00255 | 3/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | RAB9A | P51151 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | NPC1 | O15118 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13148766 | 0.93 | TDP1 (0.49) | L3MBTL1TDP1ATMNPSR1CHRM4 | |
| SCHEMBL13148723 | 0.93 | TDP1 (0.49) | L3MBTL1TDP1ATMNPSR1CHRM4 | |
| SCHEMBL13148775 | 0.93 | TDP1 (0.49) | L3MBTL1TDP1ATMNPSR1CHRM4 | |
| SCHEMBL30073325 | 0.90 | F2 (0.47) | L3MBTL1TDP1ATMNPSR1CHRM4 | |
| SCHEMBL7928008 | 0.90 | TDP1 (0.46) | L3MBTL1TDP1ATMNPSR1CHRM4 | |
| SCHEMBL27773374 | 0.90 | MT-CO2 (0.58) | L3MBTL1TDP1ATMNPSR1CHRM4 | |
| SCHEMBL28440815 | 0.90 | ATM (0.46) | L3MBTL1TDP1ATMNPSR1CHRM4 | |
| SCHEMBL29966052 | 0.90 | TDP1 (0.46) | L3MBTL1TDP1ATMNPSR1CHRM4 | |
| SCHEMBL5605319 | 0.88 | ATM (0.45) | L3MBTL1TDP1ATMNPSR1CHRM4 | |
| SCHEMBL16965122 | 0.88 | ATM (0.55) | L3MBTL1TDP1ATMNPSR1CHRM4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 244 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026100259-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND COMPOUND | JSR株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100281-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, RADIATION-SENSITIVE ACID GENERATOR, AND COMPOUND | JSR株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100258-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND COMPOUND | JSR株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100524-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMING METHOD, ONIUM SALT COMPOUND, AND POLYMER | JSR株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100282-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMING METHOD, POLYMER, AND ONIUM SALT | JSR株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-20260079396-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND | JSR CORPORATION (JP) | 2026-03-19 | — | — | US | disclosed |
| US-20260063994-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND | JSR CORPORATION (JP) | 2026-03-05 | — | — | US | disclosed |
| US-12517429-B2 | Radiation-sensitive resin composition and method for forming pattern | JSR CORPORATION (JP) | 2026-01-06 | — | — | US | disclosed |
| US-20250377590-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2025-12-11 | — | — | US | disclosed |
| US-20250362596-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN, AND RADIATION-SENSITIVE ACID GENERATOR | JSR CORPORATION (JP) | 2025-11-27 | — | — | US | disclosed |
| US-20020172885-A1 | Novel carbazole derivative and chemically amplified radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-11-21 | — | — | US | disclosed |
| EP-1253470-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-10-30 | — | — | EP | disclosed |
| EP-1238972-A1 | Novel carbazole derivative and chemically amplified radiation-sensitive resin composition | JSR Corporation (JP) | 2002-09-11 | — | — | EP | disclosed |
| US-6194580-B1 | REACTING CARBOXYLIC ACID DERIVATIVE WITH CONDENSING AGENT SUCH AS DICYCLOHEXYCARBODIMIDE FORM ACYL HETEROAROMATIC COMPOUND; REACTING WITH CAMPTOTHECIN AND CAMPTOTHECIN DERIVATIVE IN PRESENCE LANTHANIDE METAL CATALYST TO FORM ESTER COMPOUND | ENZON, INC. | 2001-02-27 | — | — | US | disclosed |
| US-6111107-A | FORMING ESTERS OF CAMPTOTHECIN OR CAMPTOTHECIN DERIVATIVES BY ACYLATION WITH AN ACYL HETEROAROMATIC ION-BASED COMPOUND USING A LANTHANIDE METAL-BASED CATALYST; PRODRUGS; STEREOSELECTIVE | ENZON, INC. (US) | 2000-08-29 | — | — | US | disclosed |
| CN-1050835-C | 1, 5-benzodiazepine * derivatives, their preparation and their pharmaceutical use | GLAXO SPA (IT) | 2000-03-29 | — | — | CN | disclosed |
| CN-1239952-A | 6-phenylpyridyl-2-amine derivatives useful as NOS inhibitors | PFIZER (US) | 1999-12-29 | — | — | CN | disclosed |
| CN-1138853-A | 1,5-benzodiazepine derivatives useful as CCK or gastrin antagonists | GLAXO SPA (IT) | 1996-12-25 | — | — | CN | disclosed |
| EP-0647632-A1 | NOVEL BENZODIAZEPINE DERIVATIVE | YAMANOUCHI PHARMACEUTICAL CO. LTD. (JP) | 1995-04-12 | — | — | EP | disclosed |
| US-5153226-A | Administering as anticholesterol agents, for atherosclerosis | WARNER-LAMBERT COMPANY (US) | 1992-10-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260079396-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND | SRMS, RAD1, SLC11A2 | L3MBTL1 1915/4885TDP1 1266/4885ATM 7/4885 |
| US-20250362596-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN, AND RADIATION-SENSITIVE ACID GENERATOR | RAD1, RER1, RPA1 | L3MBTL1 1809/4885TDP1 521/4885ATM 886/4885 |
| US-20020172885-A1 | Novel carbazole derivative and chemically amplified radiation-sensitive resin composition | ARID2, RAD1, RAD51 | L3MBTL1 2178/4885TDP1 958/4885ATM 1108/4885 |
| US-20260063994-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND | RAD1, RPA1, RAD51 | L3MBTL1 706/4885TDP1 2310/4885ATM 191/4885 |
| US-20250377590-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | RER1, RAD51, RFC2 | L3MBTL1 2439/4885TDP1 1960/4885ATM 523/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.