SCHEMBL504556

SCHEMBL504556

COCC(C)(C)O[Si](OC(C)(C)COC)(OC(C)(C)COC)OC(C)(C)COC

nearest known ligand 0.30

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.30
TSHR P16473 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4213064 0.71 ALDH1A1 (0.35) ALDH1A1TSHRTDP1
SCHEMBL252442 0.71
SCHEMBL6551141 0.69 CYP2D6 (0.39)
SCHEMBL9565171 0.69 TSHR (0.47) ALDH1A1TSHRTDP1
SCHEMBL31602089 0.67
SCHEMBL6340903 0.67
SCHEMBL13571386 0.67
SCHEMBL31042221 0.67
SCHEMBL6338522 0.67
SCHEMBL13339802 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2754638-B1 FILM-FORMING MATERIAL, GROUP IV METAL OXIDE FILM AND VINYLENE DIAMIDE COMPLEX TOSOH CORP (JP) 2018-11-07 EP disclosed
US-20120025326-A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF PANASONIC CORPORATION (JP) 2012-02-02 US disclosed
US-7714155-B2 Alkoxide compound, material for thin film formation, and process for thin film formation ADEKA CORPORATION (JP) 2010-05-11 US disclosed
US-20090233429-A1 SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SUBSTRATE PROCESSING APPARATUS HITACHI KOKUSAI ELECTRIC INC. (JP) 2009-09-17 US disclosed
US-20090035464-A1 Alkoxide compound, material for thin film formation, and process for thin film formation ADEKA CORPORATION (JP) 2009-02-05 US disclosed
US-20060240677-A1 Method for manufacturing semiconductor device and substrate processing apparatus HITACHI KOKUSAI ELECTRIC INC., (JP) 2006-10-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090035464-A1 Alkoxide compound, material for thin film formation, and process for thin film formation ALKBH5, ALKBH3, ALK ALDH1A1 744/4885TSHR 4351/4885TDP1 2365/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.