SCHEMBL5067113

SCHEMBL5067113

O=Cc1ccc(Oc2cccc(N3C(=O)C=CC3=O)c2)cc1

nearest known ligand 0.57

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ MGLL Q99685 12/20 0.57
▸ FAAH O00519 4/20 0.53
▸ HSP90AA1 P07900 4/20 0.46
▸ ALDH1A1 P00352 3/20 0.45
▸ PKM P14618 2/20 0.45
▸ HTT P42858 2/20 0.45
▸ ATM Q13315 2/20 0.45
▸ HPN P05981 1/20 0.42
▸ LMNA P02545 2/20 0.41
▸ KDM4E B2RXH2 1/20 0.41
▸ SMN1; SMN2 Q16637 1/20 0.41
▸ PARP10 Q53GL7 1/20 0.41
▸ PARP3 Q9Y6F1 1/20 0.41
▸ MEN1 O00255 1/20 0.37
▸ HPGD P15428 1/20 0.37
▸ CCR6 P51684 1/20 0.37
▸ KMT2A Q03164 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL487151 0.89 MGLL (0.70) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL9491223 0.89 MGLL (0.70) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL29754402 0.89 MGLL (0.70) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL29391228 0.89 MGLL (0.70) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL2120468 0.85 MGLL (0.77) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL2036532 0.85 MGLL (0.66) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL2120164 0.85 MGLL (0.72) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL24119952 0.84 MGLL (0.74) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL30793027 0.84 MGLL (0.64) MGLLFAAHHSP90AA1ALDH1A1PKM
SCHEMBL331306 0.84 MGLL (0.64) MGLLFAAHHSP90AA1ALDH1A1PKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102344816-B Liquid crystal alignment agent, liquid crystal alignment film prepared from same and liquid crystal display element CHI MEI CORP 2014-02-19 — — CN disclosed
WO-2008099904-A1 SILANE COMPOUND, PRODUCTION METHOD THEREOF, AND RESIN COMPOSITION CONTAINING SILANE COMPOUND NIPPON SHOKUBAI CO., LTD. (JP) 2008-08-21 — — WO disclosed
EP-0471522-B1 Resin composition based on polymaleimide and phenolic aralkyl resin MITSUI TOATSU CHEMICALS (JP) 1995-12-13 — — EP disclosed
US-5266654-A Polymaleimide, phenolic resin with xylylene groups, epoxy resin MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1993-11-30 — — US disclosed
US-5134204-A Polymaleimide, Polyepoxide, Phenolic Compound MITSUI TOATSU CHEMICALS, INC. (JP) 1992-07-28 — — US disclosed
EP-0471522-A1 Resin composition based on polymaleimide and phenolic aralkyl resin MITSUI TOATSU CHEMICALS, Inc. (JP) 1992-02-19 — — EP disclosed
EP-0397395-A2 Resin composition for sealing semiconductors MITSUI TOATSU CHEMICALS, Inc. (JP) 1990-11-14 — — EP disclosed
EP-0397396-A2 Resin composition for sealing semiconductors MITSUI TOATSU CHEMICALS, Inc. (JP) 1990-11-14 — — EP disclosed
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