SCHEMBL5079537

SCHEMBL5079537

CCC(C)(c1cccc(C)c1O)c1cccc(C)c1O

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 2/20 0.64
GABRB2 P47870 2/20 0.64
ALDH1A1 P00352 3/20 0.50
TRPA1 O75762 2/20 0.50
CA2 P00918 1/20 0.45
ATM Q13315 1/20 0.40
KDM4E B2RXH2 1/20 0.38
HPGD P15428 1/20 0.38
HSD17B10 Q99714 1/20 0.38
ESR1 P03372 2/20 0.36
ESR2 Q92731 2/20 0.36
CYP2C9 P11712 2/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2C19 P33261 1/20 0.35
TSHR P16473 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
AR P10275 1/20 0.34
NLRP3 Q96P20 1/20 0.34
SCN2A Q99250 2/20 0.33
ALOX12 P18054 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL57364 0.84 GABRA1 (0.64) GABRA1GABRB2ALDH1A1TRPA1CA2
SCHEMBL10849701 0.82 CA2 (0.46) GABRA1GABRB2ALDH1A1TRPA1CA2
Butane SCHEMBL27461547 0.80 GABRA1 (0.84) GABRA1GABRB2ALDH1A1TRPA1CA2
SCHEMBL29407049 0.79 GABRA1 (1.00) GABRA1GABRB2ALDH1A1TRPA1CA2
SCHEMBL2120430 0.79 GABRA1 (0.75) GABRA1GABRB2ALDH1A1TRPA1CA2
SCHEMBL29361007 0.79 GABRA1 (0.75) GABRA1GABRB2ALDH1A1TRPA1CA2
SCHEMBL56224 0.79 GABRA1 (1.00) GABRA1GABRB2ALDH1A1TRPA1CA2
SCHEMBL5078048 0.78 CA2 (0.43) GABRA1GABRB2ALDH1A1TRPA1CA2
SCHEMBL5078077 0.78 CA2 (0.43) GABRA1GABRB2ALDH1A1CA2HPGD
SCHEMBL5704783 0.78 GABRA1 (0.56) GABRA1GABRB2ALDH1A1TRPA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080146759-A1 Sulfur-Containing Compound, Method for Producing Same, Sulfur-Containing Polymer, and Optical Material IDEMITSU KOSAN CO., LTD (JP) 2008-06-19 US disclosed